Donor substrate for laser induced thermal imaging method, method of fabricating the donor substrate, and method of fabricating organic light emitting display using the donor substrate

1. A donor substrate for a laser induced thermal imaging method, comprising:

a base layer;

a light-to-heat conversion layer formed on an entire surface of the base layer;

an anti-static layer formed on the light-to-heat conversion layer over an entire surface of the base layer; and

a transfer layer formed on the anti-static layer and patterned to expose a predetermined portion of the anti-static layer,

wherein the anti-static layer is made of a conductive material and is grounded.

2. The donor substrate according to claim 1 , wherein the conductive material is made of one material selected from an organic material, an inorganic material, and an organic-inorganic composite material.

3. The donor substrate according to claim 2 , wherein the organic material is one material selected from a group consisting of polyaniline, polypyrole, polythiophene and poly(3,4-ethylenedioxythiophene).

4. The donor substrate according to claim 2 , wherein the inorganic material is one material selected from a group consisting of ATO (antimony tin oxide), ITO (indium tin oxide), IZO (indium zinc oxide), Nb 2 O 3 , ZnO and TiN.

5. The donor substrate according to claim 2 , wherein the organic-inorganic composite material is one material selected from a group consisting of ATO sol, ITO sol, Ag—Pd and Ag—Ru.

6. The donor substrate according to claim 1 , further comprising an interlayer formed between the anti-static layer and the transfer layer to expose a predetermined portion of the anti-static layer.

7. The donor substrate according to claim 6 , wherein the interlayer is made of at least one layer selected from a gas generation layer, a buffer layer and a metal reflection layer.

8. The donor substrate according to claim 1 , wherein the transfer layer is made of a single layer or a stacked layer selected from a group consisting of an organic emission layer, a hole-injection organic layer, a hole-transport organic layer, a hole-blocking organic layer, an electron-injection organic layer and an electron-transport organic layer.

9. A method of fabricating a donor substrate for a laser induced thermal imaging method, comprising:

providing a base layer;

forming a light-to-heat conversion layer on an entire surface of the base layer;

forming an anti-static layer on the light-to-heat conversion layer over an entire surface of the base layer; and

forming a transfer layer on the anti-static layer and patterning the transfer layer to expose a predetermined portion of the anti-static layer,

wherein the anti-static layer is made of a conductive material and is grounded.

10. A method of fabricating an organic light emitting display, comprising:

forming a first electrode on a substrate through patterning;

sucking and fixing the substrate to a grounded stage;

laminating a donor substrate according to claim 1 having a exposed anti-static layer on the substrate;

selectively irradiating a laser on the donor substrate to transfer an organic layer including at least an emission layer;

delaminating the donor substrate from the substrate after transferring the organic layer on the substrate; and

forming a second electrode on the organic layer.

11. The method according to claim 10 , wherein the exposed anti-static layer of the donor substrate is electrically connected to the grounded stage.

12. The method according to claim 10 , wherein the organic layer further comprises at least one selected from a group consisting of a hole-injection organic layer, a hole-transport organic layer, a hole-blocking organic layer, an electron-injection organic layer, and an electron-transport organic layer.