IP Library Granted Patent US 7,229,672
Granted Patent B2
US 7,229,672 · App. 11/021,048 · Granted Jun 12, 2007

Insulating film composition having improved mechanical property

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Quick Facts
Patent No.
US 7,229,672
App. No.
11/021,048
Granted
Jun 12, 2007
Kind
B2
Abstract

An insulating film forming composition having good mechanical and insulating properties comprises a silica sol having a good dispersion stability, an organic siloxane polymer and a hydrophobic organic solvent, wherein the silica sol has primary-particles having an average particle size of 5 to 15 nm and secondary-particles having an average particle size of 70 to 100 nm, and the combined amount of said primary and secondary silica particles is in the range of 2 to 50% by weight based on the sum of the silica particles and organic siloxane polymer.

Claims (8)

1. A composition for forming an insulating film, comprising a silica sol, an organic siloxane polymer and a hydrophobic organic solvent, wherein the silica sol has primary-particles having an average particle size of 5 to 15 nm and secondary-particles having an average particle size of 70 to 100 nm, the combined amount of said primary and secondary silica particles is in the range of 2 to 50 % by weight based on the sum of the silica particles and organic siloxane polymer, and the hydrophobic organic solvent has at least one carbonyl group (C═O), a carbon number of 5 to 20 and a boiling point ranging from 100 to 200° C.

2. The composition according to claim 1 , wherein the silica sol is obtained by mixing a silica sol dispersed in an alcohol with a hydrophobic organic solvent and removing the alcohol therefrom.

3. The composition according to claim 1 , wherein the solvent is selected from the group consisting of propyleneglycol monomethylether acetate (PGMEA), methylisobutylketone (MIBK), diethylketone, methylpropylketone, ethylpropylketone, dipropylketone, butylethylketone, methylisoamylketone, butylisopropylketone and a mixture thereof.

4. The composition according to claim 1 , wherein the silica sol contains less than 2% by weight of residual organic materials adsorbed on the silica particles and less than 10 ppm of metal.

5. The composition according to claim 1 , wherein the organic siloxane polymer is selected from a siloxane homopolymer; a copolymer of a siloxane monomer and other monomer; and a polymer obtained from at least one compound selected from the group consisting of methylsilsesquinoxane (MSQ), hydrosilsesquinoxane (HSQ) and a derivative thereof.

6. The composition according to claim 1 , which further comprises a porogen in an amount of 0.1 to 50% by weight based on the sum of the silica particles and organic siloxane polymer.

7. The composition according to claim 6 , wherein the porogen is at least one selected from cyclodextrin, polycaprolactone and a derivative thereof.

8. An insulating film obtained by coating the composition according to any one of claims 1 , 2 , 3 – 5 , 6 and 7 on a substrate and curing and calcining the coated film.

Assignments (5)
CHANGE OF NAME Recorded Jan 16, 2015
From: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
To: CORNING PRECISION MATERIALS CO., LTD.
Reel/Frame 034774/0676 →
CHANGE OF NAME Recorded Aug 6, 2010
From: SAMSUNG CORNING PRECISION GLASS CO., LTD.
To: SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
Reel/Frame 024804/0238 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNEE/ASSIGNOR PREVIOUSLY RECORDED ON REEL 020624 FRAME 0240. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER. Recorded May 16, 2008
From: SAMSUNG CORNING CO., LTD.
To: SAMSUNG CORNING PRECISION GLASS CO., LTD.
Reel/Frame 020956/0832 →
MERGER Recorded Mar 10, 2008
From: SAMSUNG CORNING PRECISION GLASS CO., LTD.
To: SAMSUNG CORNING CO., LTD.
Reel/Frame 020624/0240 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 22, 2004
From: KIM, TAEWAN; RHEE, JIHOON; PARK, DAECHUL; SEON, JONGBAEK; LEE, KWANGHEE; JUNG, HYUNDAM
To: SAMSUNG CORNING CO., LTD.
Reel/Frame 016129/0592 →