System for detection of wafer defects
View Patent ↗Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.
1. A method of inspecting an object, comprising the steps of:
providing an objective optical element disposed to form an image of said object at an image plane, said objective optical element laying a back focal plane;
disposing a detector at said image plane to detect said image of said object;
disposing an auxiliary lens between said objective optical element and said detector, such that said auxiliary lens projects an image of said back focal plane onto said detector; and
utilizing said image of said back focal plane to determine optical information at said back focal plane relating to said object.
2. A method of inspecting an object according to claim 1 , and also comprising the steps of:
using said optical information relating to said object to construct a mask for optically blocking predetermined parts of said optical information; and
disposing said mask at said back focal plane such that features of said object related to said optical information are eliminated from said image.
3. A method of inspecting an object according to claim 2 , and wherein said features are repetitive features of said object.
4. A method of inspecting an object according to claim 3 , and wherein said mask is generated in a spatial light modulator.
5. A method of inspecting an object according to claim 4 , and wherein said spatial light modulator is a pixilated liquid crystal device, and also comprising blocking elements, wherein said blocking elements are pixels of said pixilated liquid crystal device which are activated to be opaque.
6. A method of inspecting an object according to claim 2 , and wherein said step of determining said optical information comprises sequentially determining optical information related to said features for a plurality of different areas of said object, utilizing at least part of said back focal plane.
7. A method of inspecting an object according to claim 2 , and wherein said determining of said optical information is performed in real time during inspection imaging of said object.
8. An apparatus for inspecting an object, comprising:
an objective optical element disposed to form an image of said object at an image plane, said objective optical element having a back focal plane;
a detector disposed at said image plane to detect said image of said object;
an auxiliary lens disposed intermediate said objective optical element and said detector, such that said auxiliary lens projects an image of said back focal plane onto said detector; and
circuitry configured to determine optical information relating to an area of said object based on said image of said back focal plane at said back focal plane.
9. An apparatus according to claim 8 , and also comprising a mask for optically blocking predetermined parts of said optical information, disposed at said back focal plane, such that features of said object related to said optical information are eliminated from said image.
10. An apparatus according to claim 9 , and wherein said features are repetitive features of said object.
11. An apparatus according to claim 10 , and also comprising a spatial light modulator configured to generate said mask.
12. An apparatus according to claim 11 , and wherein said spatial light modulator is a pixilated liquid crystal device including blocking elements, wherein said blocking elements are pixels of said pixelated liquid crystal device which are activated to be opaque.