Substrate cleaning apparatus and substrate cleaning method
View Patent ↗A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During cleaning, it follows that both nozzles discharge detergents while keeping relative layout relation. Therefore, the discharged cleaning mist and rinsing deionized water do not interfere with each other before reaching the substrate but the used detergents are entirely horizontally splashed and recovered in a cup. Thus, the cleaning mist is prevented from scattering and adhering to the periphery.
1. A substrate cleaning method for cleaning a substrate held on a rotary base while rotating said substrate in a substantially horizontal plane, said method comprising steps of:
discharging a first detergent liquid from a first discharge element onto said substrate and forming a liquid film on a prescribed region of said substrate; and
moving a second discharge element for discharging a cleaning mist formed by mixing a second detergent liquid and pressurized gas with each other onto said prescribed region of said substrate provided with said liquid film thereon from said second discharge element by said first discharge element, wherein
said first discharge element is movable to form said liquid film of said first detergent liquid on said prescribed region of said substrate,
said second discharge element is movable so that a reaching point of said cleaning mist on said substrate passes through a rotation center of said substrate, and
said first and second discharge elements are movable so that said first detergent liquid and said cleaning mist do not interfere with each other before reaching said substrate, and
wherein discharge of said first detergent liquid and said cleaning mist is started while said first and second discharge elements are located at the vicinity of a peripheral edge portion of said substrate at a start of cleaning, and said first and second discharge elements are thereafter moved toward the rotation center of said substrate.
2. The substrate cleaning method according to claim 1 , wherein
said first and second discharge elements are moved to reach points on said substrate that are kept at least a prescribed distance from each other.
3. The substrate cleaning method according to claim 2 , wherein
said first discharge element substantially vertically discharges said first detergent liquid.
4. The substrate cleaning method according to claim 1 , wherein
after said first and second discharge elements reach the rotation center of said substrate, said first and second discharge elements are reciprocally moved between said peripheral edge portion and said rotation center while causing discharge of said first detergent liquid and said cleaning mist.
5. The substrate cleaning method according to claim 1 , wherein
said first detergent liquid is selected from a group consisting of deionized water and functional water.
6. The substrate cleaning method according to claim 5 , wherein
said second detergent liquid is selected from a group consisting of deionized water, an acid solution, an alkaline solution and a liquid that removes organic matter adhering to said substrate.
7. The substrate cleaning method according to claim 1 , wherein
said first detergent liquid and said second detergent liquid are liquids of a same type.