IP Library Granted Patent US 7,332,539
Granted Patent B2
US 7,332,539 · App. 11/029,105 · Granted Feb 19, 2008

Plastisol composition

Assignees: Sunstar Giken Kabushiki Kaisha; Sunstar Suisse SA
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Quick Facts
Patent No.
US 7,332,539
App. No.
11/029,105
Granted
Feb 19, 2008
Kind
B2
Abstract

The present invention provides a plastisol composition which combines low temperature baking property and storage stability which are comparable to those of the prior polyvinyl chloride plastisols and has a low-temperature flexibility. The plastisol composition according to the present invention comprises an acrylic plastisol consisting of a plasticizer having acrylic resin particles and a filler dispersed therein and therewith formulated a blocked urethane prepolymer wherein free isocyanate groups of a terminal isocyanate containing urethane prepolymers have been blocked or a blocked polyisocyanate compound and a latent curing agent which is particulate solid at normal temperature, has a melt point of 60° C. or higher, and is insoluble in the plasticizer at 40° C. or lower.

Claims (6)

1. A plastisol composition which comprises an acrylic plastisol consisting of a plasticizer having acrylic resin particles and a filler dispersed therein and therewith formulated a blocked urethane prepolymer wherein free isocyanate groups of a terminal isocyanate containing urethane prepolymer have been blocked or a blocked polyisocyanate compound and a latent curing agent which is particulate solid at normal temperature, has a melt point of 60° C. or higher, and is insoluble in the plasticizer at 40° C. or lower,

wherein said latent curing agent is at least one of

a reaction product of an aliphatic polyamine and a cyclic amine or aromatic polyamine having at least one NH 2 or NH group and a diisocyanate compound, and

those obtained by allowing an addition reaction product of an epoxy compound and one or more selected from the group consisting of aliphatic polyamines, cyclic amines and aromatic polyamines to react with a phenol compound and/or a polycarboxylic acid compound to mask the amino group to be inactive.

2. The plastisol composition according to claim 1 , wherein the ratio by weight of said acrylic resin particle to said blocked urethane prepolymer or blocked polyisocyanate compound is 20/1 to 1/20.

3. The plastisol composition according claim 1 , wherein said latent curing agent is present at an amount of from 1 to 50 parts by weight to 100 parts by weight of said blocked urethane prepolymer or blocked polyisocyanate compound.

Assignments (8)
CORRECTIVE ASSIGNMENT TO CORRECT THE PATENT NUMBER 7,332,529 PREVIOUSLY RECORDED AT REEL: 027682 FRAME: 0310. ASSIGNOR(S) HEREBY CONFIRMS THE CORRECTIVE ASSIGNMENT. Recorded Oct 23, 2015
From: SUNSTAR GIKEN KABUSHIKI KAISHA
To: HOSEI ASSET INC.
Reel/Frame 036932/0969 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 4, 2012
From: STARLECS INC.
To: SUNSTAR GIKEN KABUSHIKI KAISHA
Reel/Frame 027984/0262 →
CHANGE OF NAME Recorded Feb 28, 2012
From: HOSEI ASSET INC.
To: STARLECS INC.
Reel/Frame 027771/0589 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNEE NAME PREVIOUSLY RECORDED ON REEL 027623 FRAME 0223. ASSIGNOR(S) HEREBY CONFIRMS THE CHANGE OF NAME. Recorded Feb 9, 2012
From: SUNSTAR GIKEN KABUSHIKI KAISHA
To: HOSEI ASSET INC.
Reel/Frame 027682/0310 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 9, 2012
From: SUNSTAR SUISSE SA
To: SUNSTAR ENGINEERING PTE. LTD.
Reel/Frame 027679/0214 →
CHANGE OF NAME Recorded Feb 7, 2012
From: HOSEI ASSET CO., LTD
To: STARLECS CO., LTD
Reel/Frame 027661/0356 →
CHANGE OF NAME Recorded Jan 31, 2012
From: SUNSTAR GIKEN KABUSHIKI KAISHA
To: HOSEI ASSET CO., LTD.
Reel/Frame 027623/0223 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 3, 2005
From: NAKAYAMA, KENTA; OHNO, HITOSHI; MINAMIHORI, TAKASHI
To: SUNSTAR GIKEN KABUSHIKI KAISHA; SUNSTAR SUISSE SA
Reel/Frame 016152/0061 →
Continuity (2)
Continuation In Part 1027527100
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