IP Library › Granted Patent US 7,244,858
Granted Patent B2
US 7,244,858 · App. 11/037,085 · Granted Jul 17, 2007

Organometallic precursor compounds

Assignee: Praxair Technology, Inc.
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Quick Facts
Patent No.
US 7,244,858
App. No.
11/037,085
Granted
Jul 17, 2007
Kind
B2
Abstract

This invention relates to organometallic precursor compounds represented by the formula (L)M(L′) 2 (NO) wherein M is a Group 6 metal, L is a substituted or unsubstituted anionic ligand and L′ is the same or different and is a π acceptor ligand, a process for producing the organometallic precursor compounds, and a method for producing a film, coating or powder from the organometallic precursor compounds.

Claims (40)

1. An organometallic precursor compound represented by the formula (RL)Mo(CO) 2 (NO) wherein L is a substituted cyclopentadienyl ligand and R is an alkyl having from 2 to about 8 carbon atoms.

2. The organometallic precursor compound of claim 1 wherein R is selected from ethyl, propyl, isopropyl, butyl, tert-butyl and SiMe 3 .

3. The organometallic precursor compound of claim 1 which is selected from (EtCp)Mo(CO) 2 (NO), (PrCp)Mo(CO) 2 (NO), (iPrCp)Mo(CO) 2 (NO), (BuCp)Mo(CO) 2 (NO), (tBuCp)Mo(CO) 2 (NO), and the like, wherein Et is ethyl, Pr is propyl, iPr is isopropyl, Bu is butyl and tBu is tert-butyl.

4. A process for producing an organometallic precursor compound which comprises reacting a Group 6 metal-carbonyl or alkene source compound, a hydrocarbon or heteroatom-containing compound and a nitrosyl source compound under reaction conditions sufficient to produce said organometallic precursor compound, wherein the organometallic precursor compound is selected from (EtCp)Mo(CO) 2 (NO), (PrCp)Mo(CO) 2 (NO), (iPrCp)Mo(CO) 2 (NO), (BuCp)Mo(CO) 2 (NO), (tBuCp)Mo(CO) 2 (NO) and the like, wherein Et is ethyl, Pr is propyl, iPr is isopropyl, Bu is butyl and tBu is tert-butyl.

5. An organometallic precursor compound represented by the formula (RL)M(L′) 2 (NO) wherein M is a Group 6 metal, L is a substituted cyclopentadienyl ligand, L′ is the same or different and is a π acceptor ligand, and R is an alkyl having from 2 to about 8 carbon atoms or SiMe3.

6. The organometallic precursor compound of claim 5 wherein R is selected from ethyl, propyl, isopropyl, butyl, tert-butyl.

7. The organometallic precursor compound of claim 5 wherein M is selected from molybdenum, chromium or tungsten.

8. The organometallic precursor compound of claim 5 which is selected from (EtCp)Mo(CO) 2 (NO), (PrCp)Mo(CO) 2 (NO), (iPrCp)Mo(CO) 2 (NO), (BuCp)Mo(CO) 2 (NO), (tBuCp)Mo(CO) 2 (NO), and the like, wherein Et is ethyl, Pr is propyl, iPr is isopropyl, Bu is butyl and tBu is tert-butyl.

9. An organometallic precursor compound represented by the formula (RL)M(CO) 2 (NO) wherein M is a Group 6 metal, L is a substituted cyclopentadienyl ligand and R is an alkyl having from 2 to about 8 carbon atoms.

10. The organometallic precursor compound of claim 9 wherein R is selected from ethyl, propyl, isopropyl, butyl, tert-butyl and SiMe 3 .

11. The organometallic precursor compound of claim 9 wherein M is selected from molybdenum, chromium or tungsten.

12. The organometallic precursor compound of claim 9 which is selected from (EtCp)Mo(CO) 2 (NO), (PrCp)Mo(CO) 2 (NO), (iPrCp)Mo(CO) 2 (NO), (BuCp)Mo(CO) 2 (NO), (tBuCp)Mo(CO) 2 (NO), and the like , wherein Er is ethyl, Pr is propyl, iPr is isopropyl, Bu is butyl and tBu is tert-butyl.

13. An organometallic precursor compound represented by the formula (L)M(L′) 2 (NO) wherein M is a Group 6 metal, L is a substituted or unsubstituted anionic ligand selected from a diketonate, amide, cyclic amide, alkoxide, halide or imide, and L′ is the same or different and is a π acceptor ligand.

14. The organometallic precursor compound of claim 13 represented by the formula (L)M(CO) 2 (NO) wherein M is a Group 6 metal and L is a substituted or unsubstituted anionic ligand selected from a diketonate, amide, cyclic amide, alkoxide, halide or imide.

15. The organometallic precursor compound of claim 13 wherein M is selected from molybdenum, chromium or tungsten.

16. An organometallic precursor compound represented by the formula (L)Mo(L′)(NO) wherein L is a substituted or unsubstituted anionic ligand selected from a diketonate, amide, cyclic amide, alkoxide, halide or imide, and L′ is the same or different and is a π acceptor ligand.

17. The organometallic precursor compound of claim 16 represented by the formula (L)Mo(CO) 2 (NO) wherein L is a substituted or unsubstituted anionic ligand selected from a diketonate, amide, cyclic amide, alkoxide, halide or imide.

18. A process for producing an organometallic precursor compound which comprises reacting a Group 6 metal-carbonyl or alkene source compound, a hydrocarbon or heteroatom-containing compound and a nitrosyl source compound under reaction conditions sufficient to produce said organometallic precursor compound, wherein said organometallic precursor compound is represented by the formula (RL)M(L′) 2 (NO) in which M is a Group 6 metal, L is a substituted cyclopentadienyl ligand, L′ is the same or different and is a π acceptor ligand, and R is an alkyl having from 2 to about 8 carbon atoms or SiMe3.

19. The process of claim 18 wherein said hydrocarbon or heteroatom-containing compound comprises a lithiated cyclopentadienide.

20. The process of claim 18 wherein R is selected from ethyl, propyl, isopropyl, butyl, tert-butyl.

21. The process of claim 18 wherein M is selected from molybdenum, chromium or tungsten.

22. The process of claim 18 wherein the organometallic precursor compound is selected from (EtCp)Mo(CO) 2 (NO), (PrCp)Mo(CO) 2 (NO), (iPrCp)Mo(CO) 2 (NO), (BuCp)Mo(CO) 2 (NO), (tBuCp)Mo(CO) 2 (NO), and the like, wherein Et is ethyl, Pr is propyl, iPr is isopropyl, Bu is butyl and tBu is tert-butyl.

23. A process for producing an organometallic precursor compound which comprises reacting a Group 6 metal-carbonyl or alkene source compound, a hydrocarbon or heteroatom-containing compound and a nitrosyl source compound under reaction conditions sufficient to produce said organometallic precursor compound, wherein said organometallic precursor compound is represented by the formula (RL)M(CO) 2 (NO) in which M is a Group 6 metal, L is a substituted cyclopentadienyl ligand and R is an alkyl having from 2 to about 8 carbon atoms or SiMe3.

24. The process of claim 23 wherein said hydrocarbon or heteroatom-containing compound comprises a lithiated cyclopentadienide.

25. The process of claim 23 wherein R is selected from ethyl, propyl, isopropyl, butyl, tert-butyl.

26. The process of claim 23 wherein M is selected from molybdenum, chromium or tungsten.

27. The process of claim 23 wherein the organometallic precursor compound is selected from (EtCp)Mo(CO) 2 (NO), (PrCp)Mo(CO 2 (NO), (iPrCp)Mo(CO) 2 (NO), (BuCp)Mo(CO) 2 (NO), (tBuCp)Mo(CO) 2 (NO), and the like, wherein Et is ethyl, Pr is propyl, iPr is isopropyl, Bu is butyl and tBu is tert-butyl.

28. A process for producing an organometallic precursor compound which comprises reacting a Group 6 metal-carbonyl or alkene source compound, a hydrocarbon or heteroatom-containing compound and a nitrosyl source compound under reaction conditions sufficient to produce said organometallic precursor compound, wherein said organometallic precursor compound is represented by the formula (RL)Mo(CO) 2 (NO) wherein L is a substituted cyclopentadienyl ligand and R is an alkyl having from 2 to about 8 carbon atoms or SiMe3.

29. The process of claim 28 wherein said hydrocarbon or heteroatom-containing compound comprises a lithiated cyclopentadienide.

30. The process of claim 28 wherein R is selected from ethyl, propyl, isopropyl, butyl, tert-butyl.

31. The process of claim 28 wherein the organometallic precursor compound is selected from (EtCp)Mo(CO) 2 (NO), (PrCp)Mo(CO) 2 (NO), (iPrCp)Mo(CO) 2 (NO), (BuCp)Mo(CO) 2 (NO), (tBuCp)Mo(CO) 2 (NO), and the like, wherein Et is ethyl, Pr is propyl, ipr is isopropyl, Bu is butyl and tBu is ten-butyl.

32. A process for producing an organometallic precursor compound which comprises reacting a Group 6 metal-carbonyl or alkene source compound, a hydrocarbon or heteroatom-containing compound and a nitrosyl source compound under reaction conditions sufficient to produce said organometallic precursor compound, wherein said organometallic precursor compound is represented by the formula (L)M(L′) 2 (NO) in which M is a Group 6 metal, L is a substituted or unsubstituted anionic ligand selected from a diketonate, amide, cyclic amide, alkoxide, halide or imide, and L′ is the same or different and is a π acceptor ligand.

33. The process of claim 32 wherein said organometallic precursor compound is represented by the formula (L)M(CO) 2 (NO) in which M is a Group 6 metal and L is a substituted or unsubstituted anionic ligand selected from a diketonate, amide, cyclic amide, alkoxide, halide or imide.

34. The process of claim 32 wherein said hydrocarbon or heteroatom-containing compound comprises a lithiated diketonate, amide, cyclic amide, alkoxide, halide or imide.

35. The process of claim 32 wherein M is selected from molybdenum, chromium or tungsten.

36. The process of claim 32 wherein the organometallic precursor compound is selected from (EtCp)Mo(CO) 2 (NO), (PrCp)Mo(CO) 2 (NO), (iPrCp)Mo(CO) 2 (NO), (BuCp)Mo(CO) 2 (NO), (tBuCp)Mo(CO) 2 (NO), and the like, wherein Et is ethyl, Pr is propyl, iPr is isopropyl, Bu is butyl and tBu is tert-butyl.

37. A process for producing art organometallic precursor compound which comprises reacting a Group 6 metal-carbonyl or alkene source compound, a hydrocarbon or heteroatom-containing compound and a nitrosyl source compound under reaction conditions sufficient to produce said organometallic precursor compound, wherein said organometallic precursor compound is represented by the formula (L)Mo(L′) 2 (NO) wherein L is a substituted or unsubstituted anionic ligand selected from a diketonate, amide, cyclic amide, alkoxide, halide or imide, and L′ is the same or different and is a π acceptor ligand.

38. The process of claim 37 represented wherein said organometallic precursor compound is by the formula (L)Mo(CO) 2 (NO) in which L is a substituted or unsubstituted anionic ligand selected from a diketonate, amide, cyclic amide, alkoxide, halide or imide.

39. The process of claim 37 wherein said hydrocarbon or heteroatom-containing compound comprises a lithiated diketonate, amide cyclic amide, alkoxide, halide or imide.

40. The process of claim 37 wherein the organometallic precursor compound is selected from (EtCp)Mo(CO) 2 (NO), (PrCp)Mo(CO) 2 (NO), (iPrCp)Mo(CO) 2 (NO), (BuCp)Mo(CO) 2 (NO), (tBuCp)Mo(CO) 2 (NO), and the like, wherein Et is ethyl, Pr is propyl, iPr is isopropyl, Bu is butyl and tBu is tert-butyl.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 20, 2021
From: LINDE INC.
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 057850/0468 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 1, 2021
From: PRAXAIR TECHNOLOGY, INC.
To: LINDE INC.
Reel/Frame 057353/0328 →
Continuity (1)
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