IP Library Granted Patent US 7,505,155
Granted Patent B2
US 7,505,155 · App. 11/038,030 · Granted Mar 17, 2009

Apparatus and method for inspecting poly-silicon

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Quick Facts
Patent No.
US 7,505,155
App. No.
11/038,030
Granted
Mar 17, 2009
Kind
B2
Abstract

An apparatus and method for inspecting polycrystalline silicon (Poly-Si) that illuminates light onto protrusions in the Poly-Si in order to determine a distance between them using intensity and reflection angle of reflected light. The Poly-Si inspection apparatus includes a light source that illuminates light, and a reflected light detector for receiving reflected light, wherein a distance between protrusions is measured by an incident angle of the light illuminated into the protrusion from the light source, a detection angle of the reflected light detector, and a wavelength of the detected reflected light.

Claims (34)

1. An apparatus for inspecting polycrystalline silicon (Poly-Si), comprising:

a light source to illuminate a protrusion; and

a reflected light detector for receiving reflected light,

wherein a distance between protrusions is determined using an incident angle of light illuminated onto the protrusions, a detection angle of the reflected light detector, and a wavelength of detected reflected light.

2. The apparatus of claim 1 , wherein the distance between the protrusions is calculated by the following equation:

mλ=d (sin α+sin β)

where m is an integer, λ is a wavelength of reflected light, d is a distance between protrusions, α is an incident angle, and β is a detection angle.

3. The apparatus of claim 1 , further comprising:

a light source controller for controlling an incident angle of the light source; and

a detection angle controller for controlling the detection angle of the reflected light detector.

4. The apparatus of claim 1 , wherein an average value of distances between the protrusions is measured by a peak center in an intensity spectrum over a wavelength of light reflected and diffracted from the protrusions.

5. The apparatus of claim 1 , wherein a distribution of distances between the protrusions is measured by peak full width at half maximum in an intensity spectrum over a wavelength of light reflected and diffracted from the protrusions.

6. The apparatus of claim 1 , wherein the incident angle of the light illuminated from the light source onto the protrusions is at least 43°.

7. An apparatus for inspecting polycrystalline silicon (Poly-Si) with a plurality of protrusions, comprising:

a measuring member having a light source to emit light that illuminates a protrusion, a light source controller for controlling an incident angle of the light, a reflected light detector for receiving reflected light, a detection angle controller for controlling a detection angle of the reflected light detector, and a measuring substrate on which the Poly-Si is loaded; and

a support member comprising a first support for supporting the measuring substrate and a first fastener for fixing the first support to support the measuring member,

wherein distances between protrusions are calculated by the following equation:

mλ=d (sin α+sin β)

where m is an integer, λ is a wavelength of reflected light, d is a distance between protrusions, α is an incident angle, and β is a detection angle.

8. The apparatus of claim 7 , wherein the measuring member further comprises an angle meter for measuring a view angle of the reflected light detector and the light source.

9. The apparatus of claim 7 , wherein the light source emits white light.

10. The apparatus of claim 7 , wherein an average value of the distances between the protrusions is measured by a peak center in an intensity spectrum over a wavelength of light reflected and diffracted from the protrusions.

11. The apparatus of claim 7 , wherein a distribution of the distances between the protrusions is measured by peak full width at half maximum in an intensity spectrum over a wavelength of light reflected and diffracted from the protrusions.

12. The apparatus of claim 7 , wherein the incident angle of the light illuminated from the light source to the protrusions is at least 43°.

13. A method for inspecting polycrystalline silicon (Poly-Si), comprising:

determining a distance between protrusions in the Poly-Si by illuminating light onto the protrusions,

wherein the distance between protrusions is determined using an incident angle of the light illuminated onto the protrusions, a detection angle of reflected light, and a wavelength of the reflected light.

14. The method of claim 13 , wherein the distance between protrusions is calculated by the following equation:

mλ=d (sin α+sin β)

where m is an integer, λ is the wavelength of the reflected light, d is the distance between protrusions, α is the incident angle, β is the detection angle.

15. The method of claim 14 , further comprising:

measuring an average value of the distances between the protrusions through a peak center in an intensity spectrum over a wavelength of light reflected and diffracted from the protrusions; and

measuring a distribution of the distances between the protrusions through peak full width at half maximum in the intensity spectrum over the wavelength of the light reflected and diffracted from the protrusions.

16. The method of claim 14 , wherein the incident angle of the light illuminated onto the protrusion is at least 43°.

Assignments (3)
MERGER Recorded Aug 29, 2012
From: SAMSUNG MOBILE DISPLAY CO., LTD.
To: SAMSUNG DISPLAY CO., LTD.
Reel/Frame 028868/0387 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 15, 2008
From: SAMSUNG SDI CO., LTD.
To: SAMSUNG MOBILE DISPLAY CO., LTD.
Reel/Frame 022024/0026 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 21, 2005
From: JANG, KEUN-HO; KIM, HYUN-GUE
To: SAMSUNG SDI CO., LTD.
Reel/Frame 016198/0981 →