IP Library Granted Patent US 7,400,030
Granted Patent B2
US 7,400,030 · App. 11/042,533 · Granted Jul 15, 2008

Schottky diode with silver layer contacting the ZnO and Mg

Assignee: Rutgers, the State University of New Jersey
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Quick Facts
Patent No.
US 7,400,030
App. No.
11/042,533
Granted
Jul 15, 2008
Kind
B2
Abstract

In the present invention, there is provided semiconductor devices such as a Schottky UV photodetector fabricated on n-type ZnO and Mg x Zn 1-x O epitaxial films. The ZnO and Mg x Zn 1-x O films are grown on R-plane sapphire substrates and the Schottky diodes are fabricated on the ZnO and Mg x Zn 1-x O films using silver and aluminum as Schottky and ohmic contact metals, respectively. The Schottky diodes have circular patterns, where the inner circle is the Schottky contact, and the outside ring is the ohmic contact. Ag Schottky contact patterns are fabricated using standard liftoff techniques, while the Al ohmic contact patterns are formed using wet chemical etching. These detectors show low frequency photoresponsivity, high speed photoresponse, lower leakage current and low noise performance as compared to their photoconductive counterparts. This invention is also applicable to optical modulators, Metal Semiconductor Field Effect Transistors (MESFETs) and more.

Claims (35)

1. A semiconductor Schottky contact comprising:

a Mg x Zn 1-x O semiconductor epitaxial film having a ( 11 2 0 ) family of planes, grown on a single crystal substrate having an orientation wherein primary symmetric axis ( 0001 ) of said Mg x Zn 1-x O semiconductor epitaxial film lies on the surface of said substrate, thereby resulting in zero net charge on said Mg x Zn 1-x O film and zero net dipole moment perpendicular to surface of said Mg x Zn 1-x O film;

a metal layer deposited on said Mg x Zn 1-x O film to form a Schottky contact, wherein said substrate is R-plane sapphire, ( 11 2 0 ) Al 2 O 3 .

2. The Schottky contact of claim 1 wherein said metal layer is silver, Ag.

3. The Schottky contact of claim 2 wherein energy bandgap of the Mg x Zn 1-x O film varies with Mg content.

4. A semiconductor Schottky diode, comprising:

a ZnO semiconductor epitaxial film having ( 11 2 0 ) family of planes, grown on a single crystal substrate having an orientation wherein primary symmetric axis ( 0001 ) of said ZnO semiconductor epitaxial film lies on the surface of said substrate, and wherein the lattice mismatch between said substrate and said ZnO semiconductor film is small, thereby resulting in zero net charge on said ZnO film and zero net dipole moment perpendicular to surface of said ZnO film, wherein the said substrate is R-plane sapphire, ( 01 1 2 ) Al 2 O 3 ;

a metal deposited on said ZnO film to form a Schottky contact;

an ohmic metal deposited on said ZnO film to form an ohmic contact; and having means to being applied as a low leakage and high speed ultraviolet photodetector, wherein said ultraviolet photodetector comprises a circular metal-semiconductor-metal structure having an inner circle pattern of the Schottky contact deposited on said ZnO film having ( 11 2 0 ) family of planes and an outer ring pattern of the ohmic electrode deposited on said ZnO film.

5. The Schottky diode of claim 4 wherein said metal is silver.

6. The Schottky diode of claim 4 wherein said ohmic metal is aluminum.

7. The Schottky diode of claim 4 wherein said Schottky contact is formed with a silver layer.

8. The Schottky diode of claim 4 wherein said ohmic electrode is formed with an aluminum layer.

9. The Schottky diode of claim 4 wherein said ultraviolet photodetector comprises:

a metal-semiconductor-metal structure with an interdigital (IDT) pattern, wherein the semiconductor is said ZnO film having ( 11 2 0 ) family of planes grown on said single crystal substrate, and the metal is the Schottky metal deposited on said ZnO film.

10. The Schottky diode of claim 4 wherein said substrate is R-plane sapphire, ( 01 1 2 ) Al 2 O 3 .

11. The Schottky diode of claim 4 wherein said Schottky metal is silver.

12. A semiconductor Schottky diode, comprising:

a Mg x Zn 1-x O semiconductor film having ( 11 2 0 ) family of planes, grown on a single crystal substrate having an orientation wherein primary symmetric axis ( 0001 ) of said Mg x Zn 1-x O semiconductor epitaxial film lies on the surface of said substrate, thereby resulting in zero net charge on said Mg x Zn 1-x O film and zero net dipole moment perpendicular to surface of said Mg x Zn 1-x O film;

a metal deposited on said Mg x Zn 1-x O film to form a Schottky contact; and

an ohmic metal deposited on said Mg x Zn 1-x O film to form an ohmic contact wherein energy bandgap of the Mg x Zn 1-x O film varies with Mg content.

13. The Schottky diode of claim 12 wherein said substrate is R-plane sapphire, ( 01 1 2 ) Al 2 O 3 .

14. The Schottky diode of claim 12 wherein said Schottky metal is silver.

15. The Schottky diode of claim 12 wherein said ohmic metal is aluminum.

16. The Schottky diode of claim 12 having means to being applied as a low leakage and high speed ultraviolet photodetector.

17. The Schottky diode of claim 16 wherein said ultraviolet photodetector comprises:

a circular metal-semiconductor metal structure having an inner circle pattern of the Schottky contact deposited on said Mg x Zn 1-x O film having ( 11 2 0 ) family of planes and an outer ring pattern of the ohmic electrode deposited on said Mg x Zn 1-x O film.

18. The Schottky diode of claim 17 wherein wavelength of said photodetector varies with Mg content.

19. The Schottky diode of claim 18 wherein said Schottky contact is formed with a silver layer deposited on said Mg x Zn 1-x O film.

20. The Schottky diode of claim 18 wherein said ohmic electrode is formed with an aluminum layer deposited on said Mg x Zn 1−x O film.

21. The Schottky diode of claim 16 wherein said ultraviolet photodetector comprises:

a metal-semiconductor-metal structure with an interdigital (IDT) pattern, wherein the semiconductor is said Mg x Zn 1-x O film having ( 11 2 0 ) family of planes grown on the single crystal substrate, and the metal is the Schottky metal deposited on said Mg x Zn 1-x O film.

22. The Schottky diode of claim 21 wherein said substrate is R-plane sapphire, ( 01 1 2 ) Al 2 O 3 .

23. The Schottky diode of claim 21 wherein said Schottky metal is silver.

24. The Schottky diode of claim 21 wherein wavelength of said photodetector varies with Mg content.

Assignments (4)
CONFIRMATORY LICENSE Recorded Dec 12, 2024
From: RUTGERS, THE STATE UNIV OF N.J.
To: NATIONAL SCIENCE FOUNDATION
Reel/Frame 069618/0019 →
CONFIRMATORY LICENSE Recorded May 3, 2021
From: RUTGERS, THE STATE UNIVERSITY OF N.J.
To: NSF - DEITR
Reel/Frame 056115/0783 →
CONFIRMATORY LICENSE Recorded Apr 26, 2021
From: RUTGERS, THE STATE UNIVERSITY OF N.J.
To: NSF - DEITR
Reel/Frame 056042/0022 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 12, 2005
From: LIANG, SHAOHUA
To: RUTGERS, THE STATE UNIVERSITY OF NEW JERSEY
Reel/Frame 016971/0177 →
Continuity (3)
Continuation 1015854000 · May 30, 2002
Provisional Application 6034433700 · Jan 4, 2002
Related Publication 20050145970A1 · Jul 7, 2005