Substrate treating apparatus
View Patent ↗A substrate treating apparatus for performing a predetermined treatment of substrates includes a treating tank for storing a treating solution, a holder for holding a plurality of substrates arranged in one direction inside the treating tank, and a bubble generating device for generating bubbles in the treating solution stored in the treating tank. The bubble generating device includes a plurality of cylindrical bodies extending in the one direction and arranged in a direction perpendicular to the one direction. Each of the cylindrical bodies is at least partly formed of a porous member extending in the one direction.
1. A substrate treating apparatus for treating substrates, comprising:
a treating tank for storing a treating solution;
a holder for holding a plurality of substrates arranged in one direction inside said treating tank;
a plurality of bubblers arranged in the direction of arrangement of said substrates for introducing a gas into said treating solution stored in said treating tank, and supplying the gas to said substrates; and
a gas feeder disposed in one of two spaces between said bubblers and said treating tank corresponding to opposite ends in the direction of arrangement of said substrates, for feeding the gas into said treating solution stored in said treating tank.
2. An apparatus as defined in claim 1 , wherein said gas feeder has a higher flow rate of the gas than said bubblers.
3. A substrate treating apparatus for treating substrates, comprising:
a treating tank for storing a treating solution;
a holder for holding a plurality of substrates arranged in one direction inside said treating tank;
a plurality of bubblers arranged in the direction of arrangement of said substrates for introducing a gas into said treating solution stored in said treating tank, and supplying the gas to said substrates;
a first gas feeder disposed in one of two spaces between said bubblers and said treating tank corresponding to opposite ends in the direction of arrangement of said substrates, for feeding the gas into said treating solution stored in said treating tank; and
a second gas feeder disposed in the other of the two spaces for feeding the gas into said treating solution stored in said treating tank.
4. An apparatus as defined in claim 3 , wherein said first gas feeder and said second gas feeder have a higher flow rate of the gas than said bubblers.
5. An apparatus as defined in claim 1 , wherein said holder includes a back plate lying along an inner wall of said treating tank, said back plate being vertically movable between a position inside said treating tank and a position above said treating tank, and support members extending horizontally from lower positions of said back plate for supporting the plurality of substrates in upstanding posture.
6. An apparatus as defined in claim 2 , wherein said holder includes a back plate lying along an inner wall of said treating tank, said back plate being vertically movable between a position inside said treating tank and a position above said treating tank, and support members extending horizontally from lower positions of said back plate for supporting the plurality of substrates in upstanding posture.
7. An apparatus as defined in claim 3 , wherein said holder includes a back plate lying along an inner wall of said treating tank, said back plate being vertically movable between a position inside said treating tank and a position above said treating tank, and support members extending horizontally from lower positions of said back plate for supporting the plurality of substrates in upstanding posture.
8. An apparatus as defined in claim 4 , wherein said holder includes a back plate lying along an inner wall of said treating tank, said back plate being vertically movable between a position inside said treating tank and a position above said treating tank, and support members extending horizontally from lower positions of said back plate for supporting the plurality of substrates in upstanding posture.