Stage control method, a stage control system, and a semiconductor manufacturing equipment

1. A method of controlling a stage, which comprises:

a first step for acquiring a first moving velocity of the stage based upon position information from a laser interferometer for measuring a position of the stage;

a second step for controlling the first moving velocity of the stage based upon the first moving velocity;

a third step for determining a second moving velocity of the stage based upon the rotation speed of a motor for driving the stage;

a fourth step for controlling the second moving velocity of the stage based upon the second moving velocity; and

a fifth step for acquiring a ratio of the second moving velocity to the first moving velocity based upon the first moving velocity.

2. The method of controlling the stage according to claim 1 , wherein the second step or the fourth step controls the moving velocity of the stage by acquiring a deviation between a predetermined target velocity and the moving velocity acquired in the first or second step.

3. The method of controlling the stage according to claim 1 , wherein the fifth step selects, in accordance with a moving velocity of the stage, one of a case where the control according to the second step and the control according to the fourth step coexist and a case where one of the controls of the second step and the fourth step is performed.

4. The method of controlling the stage according to claim 1 , the fifth step gradually changes a ratio of a gain of the moving velocity of the second step to a gain of the moving velocity in the fourth step.

5. A stage control system comprising: a controller for acquiring a first stage moving velocity based upon position information measured by a laser interferometer, for acquiring a second stage moving velocity based upon a rotating velocity of a motor for driving the stage, the rotating speed being detected by a rotation speed detector, and for controlling the stage moving velocity based upon one or both of the first stage moving velocity and the second stage moving velocity, and an allotter for determining a ratio of the first stage moving velocity to the second stage moving velocity based upon the first stage moving velocity or the second stage moving velocity.

6. The stage control system according to claim 5 , wherein the control device further controls the stage moving velocity based upon a deviation between a predetermined target velocity and the first stage moving velocity or the second stage moving velocity.

7. The stage control apparatus according to claim 5 , wherein the allotter selects, in accordance with a moving velocity of the stage, one of a case where the control according to the second step and the control according to the fourth step coexist and a case where one of the controls of the second step and the fourth step is performed.

8. A semiconductor manufacturing equipment comprising:

a stage for mounting a working specimen;

a laser intereferometer for measuring a stage position;

a rotation detector for detecting a rotation speed of a motor for driving the stage;

a control system for acquiring a first stage moving velocity based on the stage position information measured by a laser interferometer, for acquiring a second stage moving velocity based on the rotation speed detected by the rotation detector, for determining a ratio of the first stage velocity to the second stage velocity based on the first and second stage velocities, and for controlling the stage moving velocity, and a column for exposing the specimen while moving the stage.