IP Library Granted Patent US 7,536,660
Granted Patent B2
US 7,536,660 · App. 11/062,513 · Granted May 19, 2009

OPC simulation model using SOCS decomposition of edge fragments

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Quick Facts
Patent No.
US 7,536,660
App. No.
11/062,513
Granted
May 19, 2009
Kind
B2
Abstract

A system for estimating image intensity within a window area of a wafer using a SOCS decomposition to determine the horizontal and vertical edge fragments that correspond to objects within the window area. Results of the decomposition are used to access lookup tables that store data related to the contribution of the edge fragment to the image intensity. Each lookup table stores data that are computed under a different illumination and feature fabrication or placement conditions.

Claims (30)

1. A computer-implemented method for estimating image intensity expected on a wafer when the wafer is exposed to an image of a reticle or mask, the method comprising:

dividing, by a computer, layout data for the reticle or mask into windows, wherein each window includes one or more features;

determining, by the computer, an estimate of image intensity associated with the area of the features in at least one respective window by:

applying a decomposition algorithm to the features in the respective window to define primitives representative of the area;

for each primitive, accessing area lookup tables, each storing pre-calculated data for a convolution of a sum of coherent systems (SOCS) kernel and the primitive; and

using the data from the area lookup tables to determine the estimate of the image intensity associated with the area of the features in the respective window;

determining, by the computer, an estimate of image intensity associated with the edges of the features in the at least one respective window by:

applying a decomposition algorithm to the features in the respective window to define a number of edge segments;

for each edge segment, accessing edge lookup tables, each storing pre-calculated data for a convolution of a SOCS kernel and the edge segment; and

using the pre-calculated data from the edge lookup tables to determine the estimate of the image intensity associated with the edges of the features in the respective window; and

combining the estimate of the image intensity associated with the area of the features with the estimate of the image intensity associated with the edges of the features to determine an overall estimate of image intensity in the at least one respective window.

2. The method of claim 1 , wherein the data in the edge lookup tables is pre-calculated assuming a polarized light.

3. The method of claim 1 , wherein the data in the edge lookup tables is pre-calculated assuming an edge segment is below a feature or portion thereof.

4. The method of claim 1 , wherein the data in the edge lookup tables is pre-calculated assuming an edge segment is above a feature or portion thereof.

5. The method of claim 1 , wherein the data in the edge lookup tables is pre-calculated assuming an edge segment is to the left of a feature or portion thereof.

6. The method of claim 1 , wherein the data in the edge lookup tables is pre-calculated assuming an edge segment is to the right of a feature or portion thereof.

7. A computer readable medium storing a sequence of instructions that are executable by a computer to perform the method of any of claims 1 - 6 .

8. A file that can be read by a computer system that includes image intensities determined according to the method of any of claims 1 - 6 .

9. A computer-implemented method for estimating image intensity expected on a wafer when the wafer is exposed to an image of a reticle or mask, the method comprising:

determining, by a computer, an estimate of image intensity due to the area of features defined in a layout of the reticle or mask by:

decomposing the features to define primitives representative of the area occupied by the features;

for each primitive, accessing pre-calculated area data for a convolution of a sum of coherent systems (SOCS) kernel and the respective primitive; and

using the pre-calculated area data to estimate the image intensity due to the area of the features;

determining, by the computer, an estimate of image intensity due to the edges of the features defined in the layout by:

decomposing the features to define a number of edge segments;

for each edge segment, accessing pre-calculated edge data for a convolution of a SOCS kernel and the respective edge segment; and

using the pre-calculated edge data to estimate the image intensity due to the edges of the features; and

combining, by the computer, the estimate of image intensity due to the area of the features with the estimate of image intensity due to the edges of the features to determine an overall estimate of image intensity.

10. The method of claim 9 , wherein the pre-calculated area data and the pre-calculated edge data are stored in lookup tables.

11. A computer readable medium storing a sequence of instructions that are executable by a computer to perform the method of any of claims 9 - 10 .

Assignments (2)
MERGER AND CHANGE OF NAME Recorded Jun 2, 2021
From: MENTOR GRAPHICS CORPORATION; SIEMENS INDUSTRY SOFTWARE INC.
To: SIEMENS INDUSTRY SOFTWARE INC.
Reel/Frame 056510/0240 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 19, 2005
From: ADAM, KONSTANTINOS
To: MENTOR GRAPHICS CORPORATION, AN OREGON CORPORATION
Reel/Frame 016424/0234 →