IP Library › Granted Patent US 7,442,316
Granted Patent B2
US 7,442,316 · App. 11/062,559 · Granted Oct 28, 2008

Microcontact printing method using imprinted nanostructure and nanostructure thereof

Assignee: Korea Institute of Machinery & Materials
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Quick Facts
Patent No.
US 7,442,316
App. No.
11/062,559
Granted
Oct 28, 2008
Kind
B2
Abstract

A microcontact printing method using an imprinted nanostructure is provided, wherein the microcontact printing is introduced to a nanoimprint lithography process to pattern a self-assembled monolayer (SAM). The method includes forming a nanostructure on a substrate by using the nanoimprint lithography process; and patterning the nanostructure with the microcontact printing method. The operation of patterning includes: depositing a metal thin film on the nanostructure; contacting a plate with the nanostructure to selectively print the SAM on the nanostructure, wherein the SAM is inked on the plate and the metal thin film is deposited on the nanostructure; selectively removing the metal thin film by using the SAM as a mask; removing the SAM from the nanostructure; and patterning the substrate by using the remaining metal thin film on the nanostructure as a mask.

Claims (41)

1. A microcontact printing method using an imprinted nanostructure wherein microcontact printing is introduced to a nanoimprint lithography process to pattern a SAM (self-assembled monolayer), the method comprising steps of:

forming a nanostructure on a substrate by using the nanoimprint lithography process; and

patterning the nanostructure with a microcontact printing method, wherein the step of patterning comprises steps of

depositing a metal thin film on the nanostructure,

contacting a plate with the nanostructure to selectively print the SAM on the nanostructure wherein the SAM is inked on the plate and the metal thin film is deposited on the nanostructure,

selectively removing the metal thin film by using the SAM as a mask,

removing the SAM from the nanostructure, and

patterning the substrate by using the remaining metal thin film on the nanostructure as a mask,

wherein the step of selectively removing the metal thin film from the nanostructure by using the SAM as a mask is performed by selectively removing only the metal thin film deposited in channels between the embossed portions of the nanostructure.

2. The microcontact printing method using an imprinted nanostructure of claim 1 , wherein the step of forming a nanostructure comprises steps of:

preparing a stamp, wherein a pattern corresponding to the nanostructure to be formed is provided to the stamp;

coating a resist on a substrate or the stamp;

contacting the stamp with the substrate to press the stamp against the resist between the substrate and the stamp; and

curing the resist.

3. The microcontact printing method using an imprinted nanostructure of claim 1 , wherein the step of contacting the plate with the nanostructure to selectively print the SAM on the nanostructure is performed by contacting the plate with ends of the embossed portions of the nanostructure.

4. The microcontact printing method using an imprinted nanostructure of claim 3 , wherein the plate has a flat surface on the side for contacting the nanostructure, and the SAM is deposited on the flat surface.

5. The microcontact printing method using an imprinted nanostructure of claim 1 , wherein the step of patterning the substrate is performed by selectively patterning the substrate to channel floors between the embossed portions of the nanostructure through anisotropic etching.

6. The microcontact printing method using an imprinted nanostructure of claim 2 , wherein the resist is a UV curing resin.

7. The microcontact printing method using an imprinted nanostructure of claim 1 , wherein the metal thin film is deposited on the nanostructure through sputtering or evaporation by direct heating.

8. The microcontact printing method using an imprinted nanostructure of claim 7 , wherein the metal thin film deposited on the nanostructure is a metal selected from a group containing Au, Ag, and Pd.

9. The microcontact printing method using an imprinted nanostructure of claim 1 , wherein the stamp is made of PDMS (polydimethylsiloxane).

10. A microcontact printing method using an imprinted nanostructure wherein microcontact printing is introduced to a nanoimprint lithography process to pattern a bio device, the method comprising steps of:

forming a nanostructure on a substrate by using the nanoimprint lithography process; and

patterning the nanostructure with the microcontact printing method, wherein the step of patterning comprises steps of

depositing a metal thin film on the nanostructure,

contacting a plate with the nanostructure to selectively print bio thin film on the nanostructure, wherein the bio thin film is inked on the plate and the metal thin film is deposited on the nanostructure, and

selectively removing the metal thin film by using the bio thin film as a mask,

wherein the step of selectively removing the metal thin film by using the bio thin film as a mask is performed by selectively removing only the metal thin film deposited in channels between the embossed portions of the nanostructure.

11. The microcontact printing method using an imprinted nanostructure of claim 10 , wherein the step of forming a nanostructure comprises steps of:

preparing a stamp, wherein a pattern corresponding to the nanostructure to be formed is provided to the stamp;

coating a resist on the substrate or the stamp;

contacting the stamp with the substrate to press the stamp against the resist between the substrate and the stamp; and

curing the resist.

12. The microcontact printing method using an imprinted nanostructure of claim 10 , wherein the step of contacting the plate with the nanostructure to selectively print the bio thin film on the nanostructure is performed by contacting the plate with ends of the embossed portions of the nanostructure.

13. The microcontact printing method using an imprinted nanostructure of claim 12 , wherein the plate has a flat surface on the side for contacting the nanostructure, and the bio thin film is deposited on the flat surface.

14. The microcontact printing method using an imprinted nanostructure of claim 11 , wherein the resist is a UV curing resin.

15. The microcontact printing method using an imprinted nanostructure of claim 10 , wherein the metal thin film is deposited on the nanostructure through sputtering or evaporation by direct heating.

16. The microcontact printing method using an imprinted nanostructure of claim 15 , wherein the metal thin film deposited on the nanostructure is a metal selected from a group containing Au, Ag, and Pd.

17. The microcontact printing method using an imprinted nanostructure of claim 10 , wherein the stamp is made of PDMS (polydimethylsiloxane).

18. The microcontact printing method using an imprinted nanostructure of claim 2 , wherein the resist is a thermosetting resin.

19. The microcontact printing method using an imprinted nanostructure of claim 11 , wherein the resist is a thermosetting resin.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 23, 2005
From: JEONG, JUN-HO; SOHN, HYONKEE; SIM, YOUNG-SUK; SHIN, YOUNG-JAE; LEE, EUNG-SUG; WHANG, KYUNG-HYUN
To: KOREA INSTITUTE OF MACHINERY & MATERIALS
Reel/Frame 016316/0695 →
Priority Claims (1)
KR 10-2004-0012192 · Feb 24, 2004 · national
Continuity (1)
Related Publication 20050186405A1 · Aug 25, 2005