IP Library Granted Patent US 7,192,654
Granted Patent B2
US 7,192,654 · App. 11/062,751 · Granted Mar 20, 2007

Multilayered construction for resistor and capacitor formation

Assignees: Oak-Mitsui Inc.; Ohmega Technologies Inc.
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Quick Facts
Patent No.
US 7,192,654
App. No.
11/062,751
Granted
Mar 20, 2007
Kind
B2
Abstract

The invention concerns multilayered constructions useful for forming resistors and capacitors, for the manufacture of printed circuit boards or other microelectronic devices. The multilayered constructions comprise sequentially attached layers comprising: a first electrically conductive layer, a first thermosetting polymer layer, a heat resistant film layer, a second thermosetting polymer layer, and a nickel-phosphorus electrical resistance material layer electroplated onto a second electrically conductive layer.

Claims (20)

1. A multilayered construction suitable for forming resistors and capacitors, which multilayered construction comprises sequentially attached layers comprising: a first electrically conductive layer, a first thermosetting polymer layer, a heat resistant film layer, a second thermosetting polymer layer, and a nickel-phosphorus electrical resistance material layer electroplated onto a second electrically conductive layer.

2. The multilayered construction of claim 1 which further comprises an additional nickel-phosphorus electrical resistance material layer electroplated onto the first electrically conductive layer such that the additional nickel-phosphorus electrical resistance material layer is attached between the first thermosetting polymer layer and the first electrically conductive layer.

3. The multilayered construction of claim 1 wherein the electrical resistance material layer has a resistance ranging from about 5 ohms/square to about 500 ohms/square.

4. The multilayered construction of claim 1 wherein the first electrically conductive layer and the second electrically conductive layer independently comprise a material selected from the group consisting of copper, zinc, brass, chrome, nickel, tin, aluminum, stainless steel, iron, gold, silver, titanium, platinum and combinations thereof.

5. The multilayered construction of claim 1 wherein the first electrically conductive layer and the second electrically conductive layer comprise copper.

6. The multilayered construction of claim 1 wherein the first electrically conductive layer and the second electrically conductive layer comprise copper foils having a surface roughness Rz in the range of from about 0.5 μm to about 7 μm.

7. The multilayered construction of claim 1 wherein at least one of the first electrically conductive layer and the second electrically conductive layer are provided with a bond enhancing treatment on one or both sides thereof.

8. The multilayered construction of claim 1 wherein at least one of the first electrically conductive layer and the second electrically conductive layer are provided with a bond enhancing treatment which comprises treatment with metal nodules, nickel, chromium, chromates, zinc, a silane coupling agent or combinations thereof.

9. The multilayered construction of claim 1 wherein one or both of the first thermosetting polymer layer and the second thermosetting polymer layer comprise an epoxy, a melamine, an unsaturated polyester, a urethane, alkyd, a bis-maleimide triazine, a polyimide, an ester, an allyated polyphenylene ether or combinations thereof.

10. The multilayered construction of claim 1 wherein the heat resistant film layer comprises a polyethylene terephthalate, a polyethylene naphthalate, a polyvinyl carbazole, a polyphenylene sulfide, an aromatic polyamide, a polyimide, a polyamide-polyimide, a polyether-nitrile, a polyether-ether-ketone, of combinations thereof.

11. The multilayered construction of claim 1 wherein the electrical resistance material layer contains up to about 30 percent by weight of phosphorus.

12. The multilayered construction of claim 1 wherein at least about the top ten atomic layers of the electrical resistance material layer are free of sulfur.

13. The multilayered construction of claim 1 further comprising a barrier layer adhered between said electrical resistance material layer and said second electrically conductive layer, wherein said barrier layer has a thickness of less than about 0.1 μm, is different in composition from said electrical resistance material layer, and is capable of protecting said electrical resistance material layer from attack by alkaline ammoniacal copper etchants.

14. A capacitor which comprises sequentially attached layers comprising: a first electrically conductive layer, a first thermosetting polymer layer, a heat resistant film layer, a second thermosetting polymer layer, and a nickel-phosphorus electrical resistance material layer electroplated onto a second electrically conductive layer.

15. The capacitor of claim 14 which further comprises an additional nickel-phosphorus electrical resistance material layer electroplated onto the first electrically conductive layer such that the additional nickel-phosphorus electrical resistance material layer is attached between the first thermosetting polymer layer and the first electrically conductive layer.

16. A printed circuit board comprising the capacitor of claim 14 .

17. An electronic device comprising the printed circuit board of claim 16 .

18. An electronic device comprising the capacitor of claim 14 .

19. A method of forming a multilayered construction which comprises attaching a first thermosetting polymer layer to a surface of a first electrically conductive layer; electroplating a nickel-phosphorus electrical resistance material layer onto a surface of a second electrically conductive layer; attaching a second thermosetting polymer layer to a surface the electrical resistance material layer; and then attaching the first and second thermosetting polymer layers to opposite surfaces of a heat resistant film layer.

20. The method of claim 19 wherein the attaching of the first and second thermosetting polymer layers to opposite surfaces of the heat resistant film layer is by lamination.

Assignments (4)
RELEASE OF SECURITY INTEREST Recorded Feb 27, 2025
From: ADAMS STREET CREDIT ADVISORS LP, AS ADMINISTRATIVE AGENT
To: OHMEGA TECHNOLGIES, LLC
Reel/Frame 070355/0589 →
PATENT SECURITY AGREEMENT Recorded Dec 28, 2020
From: OHMEGA TECHNOLOGIES, LLC
To: ADAMS STREET CREDIT ADVISORS LP, AS COLLATERAL AGENT
Reel/Frame 054859/0966 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 22, 2018
From: OAK-MITSUI, INC.
To: MITSUI MINING & SMELTING CO., LTD.
Reel/Frame 045308/0469 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 20, 2005
From: ANDRESAKIS, JOHN A.; PRAMANIK, PRANABES K.; MAHLER, BRUCE; BRANDLER, DANIEL
To: OAK-MITSUI INC.; OHMEGA TECHNOLOGIES INC.
Reel/Frame 016625/0021 →
Continuity (1)
Related Publication 20060188701A1 · Aug 24, 2006