IP Library Granted Patent US 7,405,416
Granted Patent B2
US 7,405,416 · App. 11/067,124 · Granted Jul 29, 2008

Method and apparatus for EUV plasma source target delivery

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Quick Facts
Patent No.
US 7,405,416
App. No.
11/067,124
Granted
Jul 29, 2008
Kind
B2
Abstract

An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

Claims (20)

1. An EUV plasma formation target delivery system comprising:

a target droplet formation mechanism comprising a magneto-strictive or electro-strictive material cooperating with a target droplet delivery capillary and/or output orifice in the formation of liquid target material droplets.

2. The apparatus of claim 1 further comprising:

the target droplet formation mechanism comprises a modulator modulating the application of magnetic or electric stimulation to, respectively, the magneto-strictive or electro-strictive material.

3. The apparatus of claim 2 further comprising:

the modulator is modulated to produce an essentially constant stream of droplets for irradiation at a plasma initiation site.

4. The apparatus of claim 2 further comprising:

the modulator is modulated to produce droplets on demand for irradiation at a plasma initiation site.

5. The apparatus of claim 3 further comprising:

the magneto-strictive or electro-strictive material is arranged such that longitudinal expansion and contraction interacts with the capillary.

6. The apparatus of claim 4 further comprising:

the magneto-strictive or electro-strictive material is arranged such that longitudinal expansion and contraction interacts with the capillary.

7. The apparatus of claim 3 further comprising:

the magneto-strictive or electro-strictive material is arranged such that radial expansion and contraction interacts with the capillary.

8. The apparatus of claim 4 further comprising:

the magneto-strictive or electro-strictive material is arranged such that radial expansion and contraction interacts with the capillary.

9. The apparatus of claim 5 further comprising:

the magneto-strictive or electro-strictive material is arranged such that radial expansion and contraction interacts with the capillary.

10. The apparatus of claim 6 further comprising:

the magneto-strictive or electro-strictive material is arranged such that radial expansion and contraction interacts with the capillary.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 10, 2014
From: CYMER, LLC
To: ASML NETHERLANDS B.V.
Reel/Frame 032659/0256 →
MERGER Recorded Mar 10, 2014
From: CYMER, INC.
To: CYMER, LLC
Reel/Frame 032397/0280 →
CORRECTIVE ASSIGNMENT TO CORRECT THE RECORDATION FORM COVER SHEET, 2. NAME AND ADDRESS OF RECEIVING PARTY(IES): PREVIOUSLY RECORDED ON REEL 016190 FRAME 0177. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT FROM INVENTORS TO CYMER, INC. Recorded Apr 23, 2012
From: ALGOTS, J. MARTIN; FOMENKOV, IGOR V.; ERSHOV, ALEXANDER I.; PARTLO, WILLIAM N.; SANDSTROM, RICHARD L.; HEMBERG, OSCAR; BYKANOV, ALEXANDER N.; COBB, DENNIS W.
To: CYMER, INC.
Reel/Frame 028093/0075 →