IP Library Assignment 032397/0280
Patent Assignment
Reel/Frame 032397/0280

Merger

Recorded: 2014-03-10 Pages: 23
Assignor
CYMER, INC.
Executed: 2013-05-30
Assignee
CYMER, LLC
17075 THORNMINT COURT, INTELLECTUAL PROP DEPT - MS/4-2D, SAN DIEGO, CALIFORNIA, 92127
Covered Properties (23)
Optical Mountings for Gas Discharge Mopa Laser Spectral Analysis Module
Patent: 6,873,418 →
Application: 10/676,224 →
Publication: US 2005/0068542
Long Delay and High Tis Pulse Stretcher
Patent: 6,928,093 →
Application: 10/712,545 →
Publication: US 2004/0136417
Discharge Produced Plasma Euv Light Source
Patent: 7,180,081 →
Application: 10/742,233 →
Publication: US 2004/0160155
Method and Apparatus for Bandwidth Measurement and Bandwidth Parameter Calculation for Laser Light
Patent: 7,304,748 →
Application: 10/789,328 →
Publication: US 2004/0263861
High Repetition Rate Laser Produced Plasma Euv Light Source
Patent: 7,087,914 →
Application: 10/803,526 →
Publication: US 2005/0205810
Very High Repetition Rate Narrow Band Gas Discharge Laser System
Patent: 7,006,547 →
Application: 10/815,386 →
Publication: US 2005/0226300
Gas Discharge Laser Chamber Improvements
Patent: 7,522,650 →
Application: 10/815,387 →
Publication: US 2005/0226301
Laser Output Light Pulse Stretcher
Patent: 7,369,597 →
Application: 10/847,799 →
Publication: US 2005/0105579
Laser Output Beam Wavefront Splitter for Bandwidth Spectrum Control
Patent: 7,154,928 →
Application: 10/875,662 →
Publication: US 2005/0286598
Halogen Gas Discharge Laser Electrodes
Patent: 7,301,980 →
Application: 10/877,737 →
Publication: US 2005/0047471
Euv Light Source
Patent: 7,164,144 →
Application: 10/900,839 →
Publication: US 2005/0199829
Euv Light Source Optical Elements
Patent: 7,193,228 →
Application: 11/021,261 →
Publication: US 2005/0199830
Method and Apparatus for Euv Plasma Source Target Delivery
Patent: 7,405,416 →
Application: 11/067,124 →
Publication: US 2006/0192154
High Repetition Rate Laser Produced Plasma Euv Light Source
Patent: 7,361,918 →
Application: 11/471,258 →
Publication: US 2007/0029511
High Repetition Rate Laser Produced Plasma Euv Light Source
Patent: 7,525,111 →
Application: 11/471,434 →
Publication: US 2008/0197297
Discharge Produced Plasma Euv Light Source
Patent: 7,291,853 →
Application: 11/493,945 →
Publication: US 2007/0023711
Collector for Euv Light Source
Patent: 7,288,777 →
Application: 11/603,471 →
Publication: US 2007/0114468
Collector for Euv Light Source
Patent: 7,288,778 →
Application: 11/603,670 →
Publication: US 2007/0114469
Collector for Euv Light Source
Patent: 7,309,871 →
Application: 11/603,732 →
Publication: US 2007/0114470
Euv Light Source
Patent: 7,388,220 →
Application: 11/646,938 →
Publication: US 2007/0125970
Euv Light Source
Patent: 7,323,703 →
Application: 11/647,007 →
Publication: US 2007/0158596
Euv Light Source
Patent: 7,411,203 →
Application: 11/647,016 →
Publication: US 2007/0158597
Euv Light Source
Patent: 7,449,704 →
Application: 11/647,024 →
Publication: US 2008/0017801
Related Assignments (2)
Other recorded transfers of the patents in this record — the chain of ownership.
Corrective Assignment to Correct the Recordation Form Cover Sheet, 2. Name and Address of Receiving Party(Ies): Previously Recorded on Reel 016190 Frame 0177. Assignor(S) Hereby Confirms the Assignment from Inventors to Cymer, Inc. Apr 23, 2012
From: ALGOTS, J. MARTIN; FOMENKOV, IGOR V.; ERSHOV, ALEXANDER I.; PARTLO, WILLIAM N.
To: CYMER, INC.
Reel/Frame 028093/0075 →
Assignment of Assignor's Interest Apr 10, 2014
From: CYMER, LLC
To: ASML NETHERLANDS B.V.
Reel/Frame 032659/0256 →