IP Library Granted Patent US 7,525,111
Granted Patent B2
US 7,525,111 · App. 11/471,434 · Granted Apr 28, 2009

High repetition rate laser produced plasma EUV light source

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Quick Facts
Patent No.
US 7,525,111
App. No.
11/471,434
Granted
Apr 28, 2009
Kind
B2
Abstract

An EUV light source and method include a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of a target ignition site to confine the plasma to the vicinity of the target ignition site, which is controlled using outputs from a target tacking system.

Claims (24)

1. An EUV light source comprising a moving target plasma source and a pulsed laser beam plasma formation mechanism, wherein the respective target and the pulsed laser beam intersect at a desired target ignition plasma initiation site with an accuracy of about ±10 μm, to create a plasma comprising:

a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition plasma initiation site to confine the plasma to the vicinity of target ignition initiation site.

2. The apparatus of claim 1 further comprising:

a target tracking system providing information enabling the control of the magnetic plasma confinement mechanism.

3. An EUV light source comprising a moving target plasma source and a pulsed laser beam plasma beam formation mechanism, wherein the respective target and the pulsed laser beam must intersect at a desired target ignition plasma initiation site with an accuracy of about ±10 μm, to create a plasma, comprising:

a pulsed magnetic plasma containment mechanism creating a magnetic field in the vicinity of the target ignition plasma initiation site substantially coinciding with the existence of the plasma to contain the plasma to the vicinity of target ignition the plasma initiation site during the existence of the plasma.

4. An EUV light source comprising a moving target plasma source and a pulsed laser beam plasma beam formation mechanism, wherein the respective target and the pulsed laser beam intersect at a desired target ignition plasma initiation site with an accuracy of about ±10 μm, to create a plasma comprising:

a magnetic plasma confinement means for creating a magnetic field in the vicinity of the target ignition plasma initiation site to confine the plasma to the vicinity of the plasma initiation target ignition site.

5. The apparatus of claim 4 further comprising:

a target tracking system providing information enabling the control of the magnetic plasma confinement mechanism.

6. An EUV light source comprising a moving target plasma source and a pulsed laser beam plasma beam formation mechanism, wherein the respective target and the pulsed laser beam must intersect at a desired target ignition plasma initiation site with an accuracy of about ±10 μm, to create a plasma, comprising:

a pulsed magnetic plasma containment means for creating a magnetic field in the vicinity of the target ignition plasma initiation site substantially coinciding with the existence of the plasma to contain the plasma to the vicinity of the plasma initiation target ignition site during the existence of the plasma.

7. The apparatus of claim 6 further comprising:

a target tracking system providing information enabling the control of the magnetic plasma confinement mechanism.

8. A method comprising:

EUV light producing EUV light by a method comprising using a moving target plasma source and a pulsed laser beam plasma beam formation mechanism, wherein the respective target and the pulsed laser beam intersect at a desired target ignition plasma initiation site with an accuracy of about ±10 μm, to create a plasma comprising:

utilizing a magnetic plasma confinement mechanism, creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the vicinity of the plasma initiation target ignition site.

9. The method of claim 8 further comprising:

utilizing a target tracking system, providing information enabling the control of the magnetic plasma confinement mechanism.

10. A method comprising:

An EUV light producing EUV light by a method comprising using a moving target plasma source and a pulsed laser beam plasma beam formation mechanism, wherein the respective target and the pulsed laser beam must intersect at a desired target ignition site with an accuracy of about ±10 μm, to create a plasma, comprising:

utilizing a pulsed magnetic plasma containment mechanism, creating a magnetic field in the vicinity of the plasma initiation target ignition site substantially coinciding with the existence of the plasma to contain the plasma to the vicinity of the plasma initiation target ignition site during the existence of the plasma.

11. The apparatus of claim 10 further comprising:

utilizing a target tracking system providing information enabling the control of the magnetic plasma confinement mechanism.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 10, 2014
From: CYMER, LLC
To: ASML NETHERLANDS B.V.
Reel/Frame 032659/0256 →
MERGER Recorded Mar 10, 2014
From: CYMER, INC.
To: CYMER, LLC
Reel/Frame 032397/0280 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 9, 2006
From: AKINS, ROBERT P.; SANDSTROM, RICHARD L.; PARTLO, WILLIAM N.; FOMENKOV, IGOR V.; STEIGER, THOMAS D.; ALGOTS, JOHN MARTIN; BOWERING, NORBERT; JACQUES, ROBERT N.; PALENSCHAT, FREDERICK; SONG, JUN
To: CYMER, INC.
Reel/Frame 018364/0545 →