Discharge produced plasma EUV light source
View Patent ↗An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis or rotation and an ellipse in another. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members.
1. A discharge produced plasma EUV light source comprising:
a collector comprising a plurality of nested shell members arranged in relation to a plasma pinch location to form grazing angle of incidence reflectors of EUV light emitted from the plasma pinch; and
a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members.
2. The apparatus of claim 1 further comprising:
the temperature control mechanism comprises a heater.
3. The apparatus of claim 2 further comprising:
each nested shell member comprising:
a first grazing angle of incidence reflector element collecting the EUV light emitted from the plasma pinch; and
a second grazing angle of incidence reflector clement collecting EUV light emitted from the first grazing angle of incidence reflector element.
4. The apparatus of claim 1 further comprising:
the temperature control mechanism comprises a heat remover.
5. The apparatus of claim 4 further comprising:
each nested shell member comprising:
a first grazing angle of incidence reflector element collecting the EUV light emitted from the plasma pinch; and
a second grazing angle of incidence reflector element collecting the EUV light emitted from the first grazing angle of incidence reflector element.
6. The apparatus of claim 1 further comprising:
each nested shell member comprising:
a first grazing angle of incidence reflector element collecting the EUV light emitted from the plasma pinch; and
a second grazing angle of incidence reflector element collecting the EUV light emitted from the first grazing angle of incidence reflector element.