EUV light source
View Patent ↗An EUV light source apparatus and method for producing EUV light, which includes a plasma generation chamber for generating EUV plasma; an EUV light collector having a reflective portion irradiated by EUV light produced in the EUV plasma; a target sample having reflective portion comprised of the same materials as the EUV light collector reflective portion; a first EUV detector for detecting EUV light produced in the EUV plasma; and a second EUV detector for detecting EUV light reflected from the target sample.
1. An apparatus comprising:
an EUV light source comprising:
an EUV light source EUV plasma generation chamber;
an EUV light collector having a reflective portion irradiated by EUV light produced in the EUV plasma;
an EUV light collector sample having a reflective portion comprised of the same materials as the EUV light collector reflective portion;
a first EUV detector detecting EUV light produced in the EUV light source plasma; and
a second EUV detector detecting EUV light reflecting from the EUV light collector sample.
2. The apparatus of claim 1 further comprising:
a comparator comparing the output of the first EUV detector and the second EUV detector and providing a signal indicative of the difference in the output of the first and second EUV detectors.
3. The apparatus of claim 2 further comprising:
the EUV light collector comprises debris mitigation apparatus deterring debris formed in the EUV plasma generation chamber from detracting from the reflectivity of the EUV light collector; and,
EUV light collector debris mitigation apparatus deterring debris formed in the EUV plasma generation chamber from detracting from the reflectivity of the EUV light collector sample in essentially the same manner and degree as the debris mitigation apparatus deterring debris from detracting from the reflectivity of the EUV light collector.
4. The apparatus of claim 3 further comprising:
the difference between the output of the first EUV detector and the second EUV detector indicating the impact of adverse effects on the reflectivity of the collector due to debris from plasma formation.
5. The apparatus of claim 2 further comprising:
the second EUV detector comprising calibration to account for differences between the effects of debris mitigation on the reflectivity of the collector and the collector sample.
6. The apparatus of claim 5 further comprising:
the difference between the output of the first EUV detector and the second EUV detector indicating the impact of adverse effects on the reflectivity of the collector due to debris from plasma formation.
7. The apparatus of claim 2 further comprising:
the second EUV detector comprising:
protection from debris which simulate the debris mitigation protection implemented to protect the collector reflecting surfaces from plasma produced debris.
8. The apparatus of claim 7 further comprising:
the difference between the output of the first EUV detector and the second EUV detector indicating the impact of adverse effects on the reflectivity of the collector due to debris from plasma formation.
9. The apparatus of claim 2 further comprising:
the difference between the output of the first EUV detector and the second EUV detector indicating the impact of adverse effects on the reflectivity of the collector due to debris from plasma formation.
10. The apparatus of claim 2 further comprising:
the difference between an output of the first EUV detector and the second EUV detector comprising a calibration for at least one other EUV light detector.
11. The apparatus of claim 2 further comprising the first and second EUV detectors comprising part of an array of detectors.
12. The apparatus of claim 11 further comprising:
an array of EUV detectors.
13. The apparatus of claim 12 further comprising:
the array of EUV detector comprising a mechanism for measuring the geometric balance of the EUV energy generated at the plasma initiation site.
14. The apparatus of claim 13 further comprising:
the measured geometric balance comprising feedback to control at least in part the timing and/or positioning of the output of a drive laser initiating plasma formation.
15. The apparatus of claim 1 further comprising:
the EUV light collector comprises debris mitigation apparatus deterring debris formed in the EUV plasma generation chamber from detracting from the reflectivity of the EUV light collector; and,
an EUV light collector debris mitigation apparatus deterring debris formed in the EUV plasma generation chamber from detracting from the reflectivity of the EUV light collector sample in essentially the same manner and degree as the debris mitigation apparatus deterring debris from detracting from the reflectivity of the EUV light collector.
16. The apparatus of claim 15 further comprising:
the debris mitigation apparatus comprising:
an EUV light source collector debris shield comprising:
a plurality of light passages aligned with the light emanating from a first focus of the collector mirror and reflected to a second focus of the collector mirror;
the light passages formed by adjacent thin foil separators at least some of which foil separators extend radially a shorter distance than others of the foil separators.
17. The apparatus of claim 1 further comprising:
the second EUV detector comprising calibration to account for differences between the effects of debris mitigation on the reflectivity of the collector and the collector sample.
18. The apparatus of claim 1 further comprising:
the second EUV detector comprising:
protection from debris which simulate the debris mitigation protection implemented to protect the collector reflecting surfaces from plasma produced debris.
19. The apparatus of claim 1 further comprising:
the difference between an output of the first EUV detector and the second EUV detector comprising a calibration for at least one other EUV light detector.
20. The apparatus of claim 1 further comprising the first and second EUV detectors comprising part of an array of EUV light detectors.
21. The apparatus of claim 20 further comprising:
an array of EUV detectors.
22. The apparatus of claim 21 further comprising:
the array of EUV detector comprising a mechanism for measuring the geometric balance of the EUV energy generated at the plasma initiation site.
23. The apparatus of claim 22 further comprising:
the measured geometric balance comprising feedback to control at least in part the timing and/or positioning of the output of a drive laser initiating plasma formation.
24. A method comprising:
operating an EUV light source comprising the steps of:
providing an EUV light source comprising:
an EUV light source EUV plasma generation chamber;
an EUV light collector having a reflective portion irradiated by EUV light produced in the EUV plasma;
an EUV light collector sample having a reflective portion comprised of the same materials as the EUV light collector reflective portion;
utilizing a first EUV detector, detecting EUV light produced in the EUV light source plasma; and
utilizing a second EUV detector, detecting EUV light reflecting from the EUV light collector sample.
25. The method of claim 24 further comprising:
utilizing a comparator, comparing the output of the first EUV detector and the second EUV detector and providing a signal indicative of the difference in the output of the first and second EUV detectors.
26. The apparatus of claim 25 further comprising:
the EUV light collector comprises debris mitigation apparatus deterring debris formed in the EUV plasma generation chamber from detracting from the reflectivity of the EUV light collector; and,
utilizing an EUV light collector debris mitigation apparatus, deterring debris formed in the EUV plasma generation chamber from detracting from the reflectivity of the EUV light collector sample in essentially the same manner and degree as the debris mitigation apparatus deterring debris from detracting from the reflectivity of the EUV light collector.