Semiconductor device with heterojunction
An aspect of the present invention provides a semiconductor device that includes a semiconductor base made of a first semiconductor material of a first conductivity type, a hetero-semiconductor region forming a heterojunction with the semiconductor base and made of a second semiconductor material having a different band gap from the first semiconductor material, a first gate electrode arranged in the vicinity of the heterojunction, a first gate insulating film configured to insulate the first gate electrode from the semiconductor base, a source electrode formed in contact with the hetero-semiconductor region, a drain electrode formed in contact with the semiconductor base, and an electric field extending region partly facing the first gate electrode, the first gate insulating film and hetero-semiconductor region interposed between the electric field extending region and the first gate electrode, the electric field extending region extending a built-in electric field into the hetero-semiconductor region.
1. A semiconductor device comprising:
a semiconductor base made of a first semiconductor material of a first conductivity type;
a hetero-semiconductor region forming a heterojunction with the semiconductor base and made of a second semiconductor material having a different band gap from the first semiconductor material;
a first gate electrode arranged in the vicinity of the heterojunction;
a first gate insulating film configured to insulate the first gate electrode from the semiconductor base;
a source electrode formed in contact with the hetero-semiconductor region;
a drain electrode formed in contact with the semiconductor base; and
an electric field extending region at least partly facing the first gate electrode, the first gate insulating film and hetero-semiconductor region interposed between the electric field extending region and the first gate electrode, the electric field extending region extending a built-in electric field into the hetero-semiconductor region.
2. The semiconductor device as clamed in claim 1 , wherein the electric field extending region is at least partly in the semiconductor base.
3. The semiconductor device as clamed in claim 1 , wherein the thickness of the hetero-semiconductor region between the first gate electrode and the electric field extending region is smaller than a sum of a distance for which an electric field of the first gate electrode extends from a junction interface between the gate insulating film and the hetero-semiconductor region into the hetero-semiconductor region, and a distance for which an electric field of the part extends from a junction interface between the part and the hetero-semiconductor region into the hetero-semiconductor region.
4. The semiconductor device as clamed in claim 1 , wherein the electric field extending region comprises:
a second gate insulating film arranged in contact with the hetero-semiconductor region; and
a second gate electrode arranged in contact with the second gate insulating film.
5. The semiconductor device as clamed in claim 4 , wherein the electric field extending region further comprises:
a field oxide film arranged between the semiconductor base and the second gate electrode and in contact with them.
6. The semiconductor device as clamed in claim 1 , wherein the electric field extending region is arranged in contact with the hetero-semiconductor region and is made of metal whose work function is greater than that of the first semiconductor material having the first conductivity type and that of the second semiconductor material.
7. The semiconductor device as clamed in claim 1 , wherein the electric field extending region is made of the first semiconductor material having a second conductivity type and arranged in contact with the hetero-semiconductor region.
8. The semiconductor device as clamed in claim 7 , wherein the first semiconductor material is silicon carbide.
9. The semiconductor device as clamed in claim 1 , wherein the second semiconductor material is made of at least one selected from the group consisting of polycrystalline silicon, monocrystalline silicon, and amorphous silicon.
10. A semiconductor device comprising:
a semiconductor base made of a first semiconductor material of a first conductivity type;
a hetero-semiconductor region forming a heterojunction with the semiconductor base and made of a second semiconductor material having a different band gap from the first semiconductor material;
a trench formed through the hetero-semiconductor region to reach the semiconductor base;
a first gate insulating film formed in the trench
a first gate electrode formed in the trench and insulated from the semiconductor base by the first gate insulating film;
a source electrode formed in contact with the hetero-semiconductor region;
a drain electrode formed in contact with the semiconductor base; and
an electric field extending region at least partly facing the first gate electrode, the first gate insulating film and the hetero-semiconductor region interposed between the electric field extending region and the first gate electrode, the electric field extending region extending a built-in electric field into the hetero-semiconductor region.
11. The semiconductor device as clamed in claim 10 , wherein the electric field extending region is at least partly in the semiconductor base.
12. The semiconductor device as clamed in claim 10 , wherein the thickness of the hetero-semiconductor region between the first gate electrode and the electric field extending region is smaller than the sum of a distance for which an electric field of the first gate electrode extends from a junction interface between the gate insulating film and the hetero-semiconductor region into the hetero-semiconductor region, and a distance for which an electric field of the part extends from a junction interface between the part and the hetero-semiconductor region into the hetero-semiconductor region.
13. The semiconductor device as clamed in claim 10 , wherein the electric field extending region comprises:
a second gate insulating film arranged in contact with the hetero-semiconductor region; and
a second gate electrode arranged in contact with the second gate insulating film.
14. The semiconductor device as clamed in claim 13 , wherein the electric field extending region further comprises:
a field oxide film arranged between the semiconductor base and the second gate electrode and in contact with them.
15. The semiconductor device as clamed in claim 10 , wherein the electric field extending region is arranged in contact with the hetero-semiconductor region and is made of metal whose work function is greater than that of the first semiconductor material having the first conductivity type and that of the second semiconductor material.
16. The semiconductor device as clamed in claim 10 , wherein the electric field extending region is made of the first semiconductor material having a second conductivity type and arranged in contact with the hetero-semiconductor region.
17. The semiconductor device as clamed in claim 16 , wherein the first semiconductor material is silicon carbide.
18. The semiconductor device as clamed in claim 10 , wherein the second semiconductor material is made of at least one selected from the group consisting of polycrystalline silicon, monocrystalline silicon, and amorphous silicon.