Method of making a textured surface
A method of micro- and nanotexturing of various solid surfaces in plasma where carbon nanotubes are used as an etch mask. The method allows obtaining textures with feature sizes that can be controlled with the nanotube dimensions and the density of coating the treated surface.
1. A method for texturing a surface of a multicrystalline silicon (mc-Si) substrate, comprising the steps of:
applying a layer of nano-sized particles onto the surface of the mc-Si substrate; and
bombarding the surface of the mc-Si substrate with plasma ions over a period of time so that the plasma ions that pass through openings in the layer of nano-sized particles etch the surface of the mc-Si substrate more substantially than the surface of the mc-Si substrate lying beneath the nano-sized particles resulting in a texturing of the surface of the mc-Si substrate to thereby increase light scattering properties of the mc-Si substrate, wherein the nano-sized particles comprise fullerenes.
2. The method as recited in claim 1 , wherein the nano-sized particles comprise nanotubes.
3. The method as recited in claim 1 , wherein the nano-sized particles comprise carbon nanotubes.
4. The method as recited in claim 1 , wherein the nano-sized particles comprise boron nitride.
5. The method as recited in claim 1 , wherein the nano-sized particles comprise silicon carbide.
6. The method as recited in claim 1 , wherein the nano-sized particles comprise silicon.
7. The method as recited in claim 1 , wherein the nano-sized particles comprise oxides.
8. The method as recited in claim 1 , wherein the nano-sized particles comprise carbon fibers.
9. The method as recited in claim 1 , wherein the nano-sized particles comprise graphite powders.
10. The method as recited in claim 1 , further comprising the step of removing the layer of nano-sized particles.
11. The method as recited in claim 1 , wherein the step of applying a layer of nano-sized particles onto the surface of the mc-Si substrate comprises spraying the layer onto the mc-Si substrate surface.
12. The method as recited in claim 1 , wherein the surface of the mc-Si substrate is textured with a random pattern resulting in a Lambertian surface.