IP Library Granted Patent US 7,362,786
Granted Patent B2
US 7,362,786 · App. 11/073,521 · Granted Apr 22, 2008

Semiconductor laser element having tensile-strained quantum-well active layer

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Quick Facts
Patent No.
US 7,362,786
App. No.
11/073,521
Granted
Apr 22, 2008
Kind
B2
Abstract

In a semiconductor laser element, a lower cladding layer of AlGaInP of the first conductive type, a lower optical waveguide layer of AlGaInP, a quantum-well active layer of InGaP, an upper optical waveguide layer of AlGaInP, and an upper cladding layer of AlGaInP of the second conductive type are formed in this order on a substrate of GaAs of the first conductive type. The degree of mismatch Δa/a with the substrate and the thickness dw of the quantum-well active layer satisfy the conditions, −0.6%≦Δa/a≦−0.3% and 10 nm≦dw≦20 nm. In addition, the resonator length Lc and the reflectances Rf and Rr of the opposite end facets satisfy the conditions, Lc≧400 μm and Rf×Rr≧0.5.

Claims (14)

1. A semiconductor laser element comprising:

a substrate made of GaAs of a first conductive type;

a lower cladding layer formed above said substrate and made of AlGaInP of said first conductive type;

a lower optical waveguide layer formed above said lower cladding layer and made of AlGaInP;

a quantum-well active layer formed above said lower optical waveguide layer and made of InGaP;

an upper optical waveguide layer formed above said quantum-well active layer and made of AlGaInP; and

an upper cladding layer formed above said upper optical waveguide layer and made of AlGaInP of a second conductive type;

wherein said substrate has an intrinsic lattice constant a, and said quantum-well active layer has a thickness dw, an intrinsic lattice constant a+Δa, and a degree of mismatch Δa/a with said substrate, and the thickness dw and the degree of mismatch satisfy conditions,

−0.6%≦Δ a/a ≦−0.3%, and

10 nm≦dw≦20 nm; and

said semiconductor laser element has a resonator length Lc, a light-emission end facet exhibiting a first reflectance Rf, and an end facet being located opposite to the light-emission end facet and exhibiting a second reflectance Rr, and the resonator length Lc and the first and second reflectances Rf and Rr satisfy conditions,

Lc≧400 μm, and

Rf×Rr ≧0.5.

2. A semiconductor laser element according to claim 1 , wherein said thickness dw, said degree of mismatch Δa/a, said resonator length Lc, and said first and second reflectances Rf and Rr are determined so that an oscillation wavelength of the semiconductor laser element is 645 to 650 nm at an ambient temperature of 25° C. when optical output power of the semiconductor laser element is 1 mW.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 24, 2012
From: FUJIFILM CORPORATION
To: NICHIA CORPORATION
Reel/Frame 028094/0493 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 15, 2007
From: FUJIFILM HOLDINGS CORPORATION (FORMERLY FUJI PHOTO FILM CO., LTD.)
To: FUJIFILM CORPORATION
Reel/Frame 018904/0001 →