Cyanoadamantyl compounds and polymers
View Patent ↗Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 nm.
1. A polymer that comprises an adamantyl moiety that comprises a cyano group at the 2 or 4 ring positions of the adamantyl moiety.
2. The polymer of claim 1 wherein the adamantyl moiety comprises a cyano group at the 2 ring position of the adamantly moiety.
3. The polymer of claim 1 wherein the adamantyl moiety comprises a cyano group at the 4 ring position of the adamantly moiety.
4. The polymer of claim 1 wherein the polymer is at least substantially free of aromatic groups.
5. The polymer of claim 1 wherein the polymer is at least substantially free of fluorine atoms.
6. The polymer of claim 1 wherein the polymer comprises photoacid-labile groups.
7. A polymer that comprises (i) phenolic groups and (ii) an adamantyl moiety that comprises a cyano group.
8. The polymer of claim 7 wherein the polymer is at least substantially free of fluorine atoms.
9. The polymer of claim 7 wherein the polymer comprises photoacid-labile groups.
10. A polymer that comprises an adamantyl moiety that comprises a cyano group at the 2 or 4 ring positions of the adamantyl moiety,
the polymer being at least substantially free of aromatic groups and fluorine atoms; and
the polymer comprising photoacid-labile groups.
11. The polymer of claim 10 wherein the adamantyl moiety comprises a cyano group at the 2 ring position of the adamantly moiety.
12. The polymer of claim 10 wherein the adamantyl moiety comprises a cyano group at the 4 ring position of the adamantly moiety.