Method for manufacturing a liquid crystal display device
A method for manufacturing an LCD including at least two stacked thin layers in which the upper thin film smoothly and completely covers the lower thin film includes the steps of coating a photo-resist on a patterned layer, patterning the photo-resist by exposing and developing the photo-resist with a mask which has lines and spaces in which a distance between the lines is smaller than a resolution of an exposure system used and etching the metal layer using the patterned photo-resist as a mask. The resulting photo-resist pattern has a comb shape.
1. A method of manufacturing a semiconductor device comprising the steps of:
providing a substrate;
forming a first metal layer on the substrate;
forming a photoresist on the first metal layer; and
exposing and developing the photoresist using an exposure system and only a single mask having lines and spaces, and a ratio of a width of a line to a resolution of the exposure system ranges between approximately 3/10 and ½, and a ratio of a width of a space to a resolution of the exposure system ranges between approximately 1/10 and ½, the lines being branched out from a side portion of the mask, such that the photoresist has a pattern including a thick portion and a thin portion, the pattern being a comb shape.
2. The method of claim 1 , wherein the exposure system's resolution is 1 μm or less.
3. The method of claim 1 , wherein a ratio of a width of a line to a resolution of the exposure system is 1/3, and a ratio of a width of a space to a resolution of the exposure system is approximately 1/6.
4. A method of manufacturing a semiconductor device comprising the steps of:
providing a substrate;
forming a layer on the substrate;
forming a photoresist on the layer; and
performing a single masking step using an exposure system and a mask having lines and spaces, wherein a ratio of a width of a line to a resolution of the exposure system ranges between approximately 3/10 and ½ and a ratio of a width of a space to a resolution of the exposure system ranges between approximately 1/10 and ½, the lines being branched out from a side portion of the mask, the masking step being used to develop the photoresist such that the photoresist has a thick portion and a thin portion, the photoresist having a comb shape.
5. The method of claim 4 , wherein the exposure system's resolution is 1 μm or less.
6. The method of claim 4 , wherein a ratio of a width of a line to a resolution of the exposure system is 1/3, and a ratio of a width of a space to a resolution of the exposure system is approximately 1/6.
7. A method of manufacturing a liquid crystal display comprising the steps of:
providing a substrate;
forming a layer on the substrate;
forming a photoresist on the layer; and
exposing and developing the photoresist using an exposure system and only a single mask having lines and spaces, and a ratio of a width of a line to a resolution of the exposure system ranges between approximately 3/10 and ½, and a ratio of a width of a space to a resolution of the exposure system ranges between approximately 1/10 and ½, the lines being branched out from a side portion of the mask such that the photoresist has a pattern including a thick portion and a thin portion, the pattern being a comb shape.
8. The method of claim 7 , wherein the exposure system's resolution is 1 μm or less.
9. The method of claim 7 , wherein a ratio of a width of a line to a resolution of the exposure system is 1/3, and a ratio of a width of a space to a resolution of the exposure system is approximately 1/6.
10. A method of manufacturing a liquid crystal display comprising the steps of:
providing a substrate;
forming a layer on the substrate;
forming a photoresist on the layer; and
performing a single masking step using an exposure system and a mask having lines and spaces, and ratio of a width of a line to a resolution of the exposure system ranges between approximately 3/10 and ½, and a ratio of a width of a space to a resolution of the exposure system ranges between approximately 1/10 and ½, the lines being branched out from a side portion of the mask to develop the photoresist such that the photoresist has a thick portion and a thin portion, the photoresist being a comb shape.
11. The method of claim 10 , wherein the exposure system's resolution is 1 μm or less.
12. The method of claim 10 , wherein a ratio of a width of a line to a resolution of the exposure system is 1/3, and a ratio of a width of a space to a resolution of the exposure system is approximately 1/6.
13. A method of manufacturing a semiconductor device comprising the steps of:
providing a substrate;
forming a first metal layer on the substrate;
forming a photoresist on the first metal layer; and
exposing and developing the photoresist using an exposure system and only a single mask having lines and spaces, and a ratio of a width of a line to a resolution of the exposure system ranges between approximately 3/10 and ½, and a ratio of a width of a space to a resolution of the exposure system ranges between approximately 1/10 and ½, the lines being branched out from a side portion of the mask such that the photoresist has a pattern including a thick portion and a thin portion.
14. The method of claim 13 , wherein the exposure system's resolution is 1 μm or less.
15. The method of claim 13 , wherein a ratio of a width of a line to a resolution of the exposure system is 1/3, and a ratio of a width of a space to a resolution of the exposure system is approximately 1/6.
16. A method of manufacturing a semiconductor device comprising the steps of:
providing a substrate;
forming a layer on the substrate;
forming a photoresist on the layer; and
performing a single masking step using an exposure system and a mask having lines and spaces, and a ratio of a width of a line to a resolution of the exposure system ranges between approximately 3/10 and ½, and a ratio of a width of a space to a resolution of the exposure system ranges between approximately 1/10 and ½, the lines being branched out from a side portion of the mask, the masking step being used to develop the photoresist such that the photoresist has a thick portion and a thin portion.
17. The method of claim 16 , wherein the exposure system's resolution is 1 μm or less.
18. The method of claim 16 , wherein a ratio of a width of a line to a resolution of the exposure system is 1/3, and a ratio of a width of a space to a resolution of the exposure system is approximately 1/6.
19. A method of manufacturing a liquid crystal display comprising the steps of:
providing a substrate;
forming a layer on the substrate;
forming a photoresist on the layer; and
exposing and developing the photoresist using an exposure system and only a single mask having lines and spaces, and a ratio of a width of a line to a resolution of the exposure system ranges between approximately 3/10 and ½, and a ratio of a width of a space to a resolution of the exposure system ranges between approximately 1/10 and ½, the lines being branched out from a side portion of the mask such that the photoresist has a pattern including a thick portion and a thin portion.
20. The method of claim 19 , wherein the exposure system's resolution is 1 μm or less.
21. The method of claim 19 , wherein a ratio of a width of a line to a resolution of the exposure system is 1/3, and a ratio of a width of a space to a resolution of the exposure system is approximately 1/6.
22. A method of manufacturing a liquid crystal display comprising the steps of:
providing a substrate;
forming a layer on the substrate;
forming a photoresist on the layer; and
performing a single masking step using an exposure system and a mask having lines and spaces, and a ratio of a width of a line to a resolution of the exposure system ranges between approximately 3/10 and ½, and a ratio of a width of a space to a resolution of the exposure system ranges between approximately 1/10 and ½, the lines being branched out from a side portion of the mask to develop the photoresist such that the photoresist has a thick portion and a thin portion.
23. The method of claim 22 , wherein the exposure system's resolution is 1 μm or less.
24. The method of claim 22 , wherein a ratio of a width of a line to a resolution of the exposure system is 1/3, and a ratio of a width of a space to a resolution of the exposure system is approximately 1/6.