IP Library Granted Patent US 7,205,596
Granted Patent B2
US 7,205,596 · App. 11/117,713 · Granted Apr 17, 2007

Adiabatic rotational switching memory element including a ferromagnetic decoupling layer

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Quick Facts
Patent No.
US 7,205,596
App. No.
11/117,713
Granted
Apr 17, 2007
Kind
B2
Abstract

A magnetoresistive memory element includes a stacked structure with a ferromagnetic reference region including a fixed magnetization; a ferromagnetic free region including a free magnetization that is free to be switched between oppositely aligned directions with respect to an easy axis thereof; and a tunneling barrier made of a non-magnetic material. The ferromagnetic reference and free regions and the tunneling barrier together form a magnetoresistive tunneling junction. The ferromagnetic free region includes a plurality of N ferromagnetic free layers being magnetically coupled such that magnetizations of adjacent ferromagnetic free layers are in antiparallel alignment, where N is an integer greater than or equal to two. The ferromagnetic free region further includes at least one ferromagnetic decoupling layer including frustrated magnetization in orthogonal alignment to ferromagnetic free layer magnetizations and being arranged in between adjacent ferromagnetic free layers.

Claims (13)

1. A magnetoresistive memory element including a stacked structure comprising:

a ferromagnetic reference region including a fixed magnetization;

a ferromagnetic free region including a free magnetization that is free to be switched between oppositely aligned directions with respect to an easy axis thereof; and

a tunneling barrier comprising a non-magnetic material; wherein:

the ferromagnetic reference and free regions and the tunneling barrier together form a magnetoresistive tunneling junction;

the ferromagnetic free region comprises a plurality of N ferromagnetic free layers being magnetically coupled such that magnetizations of adjacent ferromagnetic free layers are in antiparallel alignment, where N is an integer greater than or equal to two; and

the ferromagnetic free region further comprises at least one ferromagnetic decoupling layer including frustrated magnetization in orthogonal alignment to ferromagnetic free layer magnetizations and being arranged in between adjacent ferromagnetic free layers.

2. The magnetoresistive memory element of claim 1 , further comprising at least one spacer layer in between adjacent ferromagnetic free layers.

3. The magnetoresistive memory element of claim 2 , wherein the decoupling layer is sandwiched in between adjacent spacer layers.

4. The magnetoresistive memory element of claim 3 , wherein the adjacent spacer layers sandwiching the decoupling layer have approximately the same thickness.

5. The magnetoresistive memory element of claim 1 , wherein the decoupling layer has a thickness that is smaller than a total thickness of the ferromagnetic free layers.

6. The magnetoresistive memory element of claim 1 , wherein the decoupling layer has a thickness that is smaller than a minimum thickness of each of the ferromagnetic free layers.

7. The magnetoresistive memory element of claim 1 , further comprising a ferromagnetic offset field layer including a magnetization configured to shift a toggling point for switching of the free magnetization toward a smaller spin-flop magnetic field (H sf ).

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 13, 2010
From: INFINEON TECHNOLOGIES AG
To: QIMONDA AG
Reel/Frame 023828/0001 →