Pattern generator mirror configurations
View Patent ↗The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus comprises a source for emitting electromagnetic radiation, a spatial modulator having multitude of modulating elements (pixels), adapted to being illuminated by said radiation, and a projection system creating an image of the modulator on the workpiece. It further comprises an electronic data processing and delivery system receiving a digital description of the pattern to be written, extracting from it a sequence of partial patterns, converting said partial patterns to modulator signals, and feeding said signals to the modulator, a precision mechanical system for moving said workpiece and/or projection system relative to each other and an electronic control system coordinating the movement of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is stitched together from the partial images created by the sequence of partial patterns. According to the invention the drive signals can set a modulating element to a number of states larger than two.
1. An apparatus for creating a pattern on a workpiece sensitive to exposing radiation, such as photomask, a display panel on a microoptical device, including:
a source for exposing radiation;
a spatial light modulator (SLM) having a multitude of modulating elements (pixels), adapted to be illuminated by said radiation;
a projection system that projects said radiation from the modulator onto the workpiece;
the modulating elements of the SLM being driven to induce a controlled phase difference between portions of the radiations modulated by adjacent modulating elements of the SLM.
2. The apparatus of claim 1 , wherein the controlled phase difference produces an extra contrast between areas on the workpiece that correspond to the modulating elements.
3. The apparatus of claim 1 , wherein the controlled phase difference is affected by modulating elements having phase position of 0 and +/−90 degrees, relative to a wavelenght of the exposing radiation.
4. The apparatus of claim 1 , wherein the controlled phase difference is affected by modulating elements having phase position of 90 degrees, relative to a wavelenght of the exposing radiation.
5. The apparatus of claim 1 , wherein the SLM is a phase type SLM.
6. The apparatus of claim 1 , wherein the SLM is a deflection type SLM.
7. An apparatus for creating a pattern on a workpiece sensetive to exposing radiation, such as a photomask, a display panel or a microoptical device, including:
a source for exposing radiation;
a spatial light modulator (SLM) having a multitude of modulating elements (pixels), adapted to be illuminated by said radiation,
a projection system that projects said radiation from the modulator onto corresponding areas of the workpiece;
the modulating elements of the SLM being driven to include a controlled phase difference between radiation reaching adjacent areas of the workpiece corresponding to adjacent modulating elements of the SLM.
8. The apparatus of claim 7 , wherein the SLM is a phase type SLM.
9. The apparatus of claim 7 , wherein the SLM is a deflection type SLM.