Patent Assignment
Reel/Frame 022917/0810
Termination of License Agreement
Recorded: 2009-07-08
Received: 2009-07-08
Pages: 21
Assignor
ASML NETHERLANDS B.V.
Executed: 2009-07-07
Assignee
MICRONIC LASER SYSTEMS AB (PUBL)
NYTORPSVAGEN 9, TABY, SEX, 183 03, SWEDEN
Covered Properties
(52)
Methods and Systems for Improved Boundary Contrast
Application:
11/272,925 →
Extracting and propagating design intent from mask data preparation to lithography write systems
Application:
60/719,974 →
Pattern Generation Methods and Apparatuses
Application:
11/206,197 →
Slm Addressing Methods and Apparatuses
Application:
11/188,876 →
Method and Apparatus for Printing Large Data Flows
Application:
10/508,463 →
Hidden Hinge Mems Device
Application:
11/174,568 →
Pattern Generator Mirror Configurations
Application:
11/157,043 →
Mask blank and a method for producing the same
Application:
10/510,059 →
Ret for Optical Maskless Lithography
Application:
11/066,828 →
Method and device for coherence reduction
Application:
11/061,931 →
Lithographic Apparatus and Device Manufacturing Method
Application:
11/061,754 →
Method and Device for Data Integrity Checking
Application:
11/030,728 →
Method and Apparatus for Patterning a Workpiece and Methods of Manufacturing the Same
Application:
11/008,566 →
Method and Device for Correcting Slm Stamp Image Imperfections
Application:
10/987,589 →
Device for protecting a chip and method for operating a chip
Application:
10/976,548 →
Method and Apparatus for Controlling Exposure of a Surface of a Substrate
Application:
10/977,394 →
Method and Apparatus for Personalization of Semiconductor
Application:
10/953,560 →
Addressing Method of Movable Elements in a Spatial Light Modulator (Slm)
Application:
10/507,554 →
Bonding Method
Application:
10/488,353 →
Image Forming Method and Apparatus
Application:
10/505,564 →
Psm Alignment Method and Device
Application:
10/911,218 →
Further Method to Pattern a Substrate
Application:
10/911,412 →
Method and Apparatus for Patterning a Workpiece
Application:
10/498,713 →
Method and Apparatus for Image Formation
Application:
10/498,590 →
Addressing of an Slm
Application:
10/829,679 →
Method for Error Reduction in Lithography
Application:
10/827,530 →
Data Path for High Performance Pattern Generator
Application:
10/782,863 →
Pattern Generator
Application:
10/776,192 →
Method to Detect a Defective Element
Application:
10/757,351 →
Dual Layer Workpiece Masking and Manufacturing Process
Application:
10/704,957 →
Method and Device for Immersion Lithography
Application:
10/679,701 →
Defective Pixel Compensation Method
Application:
10/657,526 →
Method and a Device for Reducing Hysteresis or Imprinting in a Movable Micro-Element
Application:
10/467,184 →
Method to Pattern a Substrate
Application:
10/634,152 →
Methods and Systems for Improved Boundary Contrast
Application:
10/462,010 →
Method for High Precision Printing of Patterns
Application:
10/460,765 →
Pattern Generator Mirror Configurations
Application:
10/449,661 →
Methods and systems for process control of corner feature embellishment
Application:
10/410,874 →
High Energy, Low Energy Density, Radiation-Resistant Optics Used with Micro-Electromechanical Devices
Application:
10/335,981 →
Alignment Sensor
Application:
10/310,637 →
Homogenizer
Application:
10/308,917 →
Method and apparatus of calibrating multi-position SLM elements
Application:
10/238,220 →
Homogenization of a Spatially Coherent Radiation Beam and Printing and Inspection, Respectively, of a Pattern on a Workpiece
Application:
10/238,177 →
Pattern Generation System Using a Spatial Light Modulator
Application:
10/130,070 →
Method and Apparatus for Personalization of Semiconductor
Application:
10/129,364 →
Data Path for High Performance Pattern Generator
Application:
10/049,286 →
Defective Pixel Compensation Method
Application:
09/995,526 →
Reticle and Direct Lithography Writing Strategy
Application:
09/992,653 →
Laser Writer
Application:
09/869,922 →
Graphics Engine for High Precision Lithography
Application:
09/954,721 →
Pattern Generator
Application:
09/824,670 →
Method and Apparatus for Microlithography
Application:
09/765,084 →