IP Library Granted Patent US 7,633,989
Granted Patent B2
US 7,633,989 · App. 11/169,203 · Granted Dec 15, 2009

High pulse repetition rate gas discharge laser

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Quick Facts
Patent No.
US 7,633,989
App. No.
11/169,203
Granted
Dec 15, 2009
Kind
B2
Abstract

A pulsed gas discharge laser operating at an output laser pulse repetition rate of greater than 4 kHz and a method of operating same is disclosed which may comprise a high voltage electrode having a longitudinal extent; a main insulator electrically insulating the high voltage electrode from a grounded gas discharge chamber; a preionizer longitudinally extending along at least a portion of the longitudinal extent of the high voltage electrode; a preionization shim integral with the electrode extending toward the preionizer. The preionizer may be formed integrally with the main insulator. The preionization shim may substantially cover the gap between the electrode and the preionizer. The apparatus and method may comprise the high voltage electrode being disposed in an electrode receiving pocket in the main insulator and formed to present an elongated discharge receiving area facing another electrode within the gas discharge chamber, an aerodynamic fairing attached to the high voltage electrode and substantially closing the gas flow disturbance pocket and presenting an aerodynamically smooth surface to the gas flow.

Claims (16)

1. A gas discharge laser device comprising:

a discharge chamber;

a first electrode having a discharge surface;

a second electrode spaced from the first electrode to establish a discharge region therebetween;

a gas flow passing through the discharge region;

a main insulator electrically insulating the high voltage first electrode from the discharge chamber;

a preionizer extending to a terminus portion positioned in the gas flow;

a preionization shim electrode from the discharge surface of the first electrode to an edge in the vicinity of the preionizer terminus portion to present an aerodynamically smooth surface to the gas flow between the preionizer and the discharge surface.

2. A device as recited in claim 1 wherein the preionizer is formed integrally with the main insulator.

3. A device as recited in claim 1 wherein the preionizer shim is formed integrally with the first electrode.

4. A device as recited in claim 1 wherein the first electrode is elongated and the edge extends in the direction of electrode elongation.

5. A device as recited in claim 1 wherein the preionizer shim is a fairing attached to the first electrode.

6. A device as recited in claim 5 wherein the fairing is made of an insulating material.

7. A device as recited in claim 1 wherein the preionizer comprises a cylindrical ceramic tube and a conductive ground rod.

8. A device as recited in claim 1 wherein the preionizer is positioned in the gas flow upstream of the discharge region.

9. A device as recited in claim 1 wherein the preionizer is positioned in the gas flow downstream of the discharge region.

Assignments (2)
MERGER Recorded Mar 12, 2014
From: CYMER, INC.
To: CYMER, LLC
Reel/Frame 032415/0735 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 11, 2005
From: GILLESPIE, WALTER D.; STEIGER, THOMAS D.; UJAZDOWSKI, RICHARD C.; PARTLO, WILLIAM N.
To: CYMER, INC.
Reel/Frame 016633/0896 →