Gray level imaging masks, optical imaging apparatus for gray level imaging masks and methods for encoding mask and use of the masks
View Patent ↗A grayscale mask for imaging operations, including a substrate layer and a mask layer having a plurality of apertures forming a mask pattern to form a grayscale image. Each edge of each aperture includes a plurality segments forming a serrated edge, resulting in mixed edge diffraction. The apertures may be in an irregular and non-symmetric pattern and may be of variable size. A random diffusing layer may be in proximity to or integral with the substrate layer. The grayscale mask may be used for generating an optical element by printing the initial grayscale mask onto a photoresist layer and transferring the photoresist pattern onto a transparent layer and the mask may include areas or layers of variable transmission. Also described are methods for diffractive intensity averaging, diffractive error diffusion, diffractive spatial dithering, and diffractive intensity averaging.
1. A method for generating an optical element, comprising the steps of:
generating a desired grayscale pattern of an initial grayscale mask, and forming a mask layer on a transparent layer of a substrate by
printing the grayscale pattern of the initial grayscale mask onto the transparent layer of the substrate as a photoresist layer by one of proximity exposure, contact exposure and optical imaging to generate a corresponding photoresist pattern, wherein
the mask layer has a plurality of apertures therethrough forming a mask pattern for the transmission of radiation through the mask to form a grayscale image on a workpiece, each edge of each aperture including a plurality segments forming a serrated edge, the segments being dimensioned to result in mixed edge diffraction of the radiation being transmitted through the apertures.
2. The method of claim 1 , wherein the optical element is a refractive optical element.
3. The method of claim 1 for generating an optical element, wherein:
the substrate further includes an absorptive layer and at least a part of the photoresist pattern is transferred into the absorptive layer.
4. The method of claim 1 for generating an optical element, wherein:
the substrate further include a reflective layer and at least a part of the photoresist pattern is transferred into the reflective layer.
5. The method of claim 1 for generating an optical element, wherein:
the substrate further includes an absorptive layer and a reflective layer and at least a first part of the photoresist pattern is transferred into the absorptive layer and at least a second part of the photoresist pattern is transferred into the reflective layer.
6. The method for generating an optical element of claim 1 , wherein the method further comprises a transferring step for etching the photoresist pattern into the substrate.
7. The method of claim 1 for generating an optical element further comprising the step of:
forming a random diffusing layer located on a side of the substrate opposite to the mask layer for diffusing at least one of linear edge diffraction and mixed edge diffraction effects in the radiation passing through the mask layer, the substrate layer and the diffusing layer.
8. A method for generating an optical element, comprising the steps of:
forming a mask layer by generating a desired grayscale pattern in a layer of mask material on an initial grayscale mask, wherein
the layer of mask material has a variable amplitude transmission in accordance with a desired continuous level phase transmittance function, and
the mask layer has a plurality of apertures therethrough forming a mask pattern for the transmission of radiation through the mask to form a grayscale image on a workpiece, each edge of each aperture including a plurality segments forming a serrated edge, the segments being dimensioned to result in mixed edge diffraction of the radiation being transmitted through the apertures,
printing the grayscale pattern of the initial grayscale mask onto a photoresist layer by one of contact exposure or proximity exposure to generate a photoresist pattern, and
transferring the photoresist pattern into a selected substrate to form an optical element having the grayscale pattern.
9. The method for generating an optical element of claim 8 , wherein the transferring step includes etching the photoresist pattern into the substrate.
10. The method for generating an optical element of claim 8 , wherein:
the transferring step includes the step of generating a master element from the photoresist pattern, and
the step of forming the optical element includes injection molding of the substrate with the master element.
11. The method of claim 8 for generating an optical element further comprising the step of:
forming a random diffusing layer located on a side of the substrate opposite to the mask layer for diffusing at least one of linear edge diffraction and mixed edge diffraction effects in the radiation passing through the mask layer, the substrate layer and the diffusing layer.