IP Library Granted Patent US 7,381,631
Granted Patent B2
US 7,381,631 · App. 11/174,798 · Granted Jun 3, 2008

Use of expanding material oxides for nano-fabrication

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Quick Facts
Patent No.
US 7,381,631
App. No.
11/174,798
Granted
Jun 3, 2008
Kind
B2
Abstract

This invention relates to a method of fabricating nano-dimensional structures, comprising: depositing at least one deformable material upon a substrate such that the material includes at least one portion; and creating an oxidizable layer located substantially adjacent to the deposited deformable material such that at least a portion of the oxidized portion of the oxidizable layer interacts with the at least one portion of the deformable material to apply a localized pressure upon the at least one portion of the deformable material.

Claims (24)

1. A method of fabricating nano-dimensional structures, comprising:

depositing at least one deformable material upon a substrate such that the deformable material includes at least one portion; and

creating an oxidizable layer located substantially adjacent to the deposited deformable material such that at least a portion of the oxidizable layer is configured to expand and interact with the at least one portion of the deformable material in response to an oxidation process to apply a localized pressure upon the at least one portion of the deformable material which results in a physical deformation of the at least one portion or the deformable material.

2. The method, as in claim 1 , wherein the deformable material comprises a material selected from the list consisting of: platinum (Pt), aluminum oxide (Al 2 O 3 ), zinc oxide (ZnO), indium tin oxide (ITO), SnO 2 , mixtures, and combinations thereof.

3. The method, as in claim 1 , wherein the substrate comprises a material selected from the list consisting of: glass; quartz; alumina; stainless steel; silicon along with its oxides, nitrides; various plastics; mixtures, and combinations thereof.

4. The method, as in claim 1 , wherein the oxidized layer comprises an oxide of a material selected from the list consisting of: aluminum (Al), tantalum (Ta), niobium (Nb), tungsten (W), bismuth (Bi), antimony (Sb), silver (Ag), cadmium (Cd), iron (Fe), magnesium (Mg), tin (Sn), zinc (Zn), titanium (Ti), copper (Cu), molybdenum (Mo), hafnium (Hf), zirconium (Zr), titanium (Ti), vanadium (V), gold (Au), cobalt (Co), iridium (Ir), rhenium (Re), uranium (U), chromium (Cr), and combinations thereof.

5. The method, as in claim 1 , wherein the oxidized layer is created by electrochemical oxidation.

6. The method, as in claim 1 , wherein the oxidized layer is created by thermal oxidation.

7. The method, as in claim 1 , wherein the creating step is further comprised of the step of:

deforming the at least one portion of the deformable material by initiating the oxidation process to cause the at least a portion of the oxidizable layer to expand.

8. The method, as in claim 1 , wherein the creating step is further comprised of the step of:

extruding the at least one portion of the deformable material to create an edge.

9. The method, as in claim 1 , wherein the creating step is further comprised of the step of:

extruding the at least one portion of the deformable material to create a tip.

10. A program storage medium readable by computer, tangibly embodying a program of instructions executable by the computer to perform method steps for a method of fabricating nano-dimensional structures, comprising:

depositing at least one deformable material upon a substrate such that the deformable material includes at least one portion; and

creating an oxidizable layer located substantially adjacent to the deposited deformable material such that at least a portion of the oxidizable layer is configured to expand and interact with the at least one portion of the deformable material in response to an oxidation process to apply a localized pressure upon the at least one portion of the deformable material which results in a physical deformation of the at least one portion of the deformable material.

11. The method, as in claim 10 , wherein the deformable material comprises a material selected from the list consisting of: platinum (Pt), aluminum oxide (Al 2 O 3 ), zinc oxide (ZnO), indium tin oxide (ITO), SnO 2 , along with their oxidizable alloys, mixtures, and combinations thereof.

12. The method, as in claim 10 , wherein the creating step is further comprised of the step of:

deforming the at least one portion of the deformable material by initiating the oxidation process to cause the at least a portion of the oxidizable layer to expand.

13. The method, as in claim 10 , wherein the creating step is further comprised of the step of:

extruding the at least one portion of the deformable material to create an edge.

14. The method, as in claim 10 , wherein the creating step is further comprised of the step of:

extruding the at least one portion of the deformable material to create a tip.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 26, 2011
From: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.; HEWLETT-PACKARD COMPANY
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 026198/0139 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 7, 2007
From: MARDILOVICH, PETER; KORNILOVION, PAVEL; HOFFMAN, RANDY
To: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Reel/Frame 018978/0715 →