IP Library › Granted Patent US 7,198,544
Granted Patent B2
US 7,198,544 · App. 11/190,274 · Granted Apr 3, 2007

Polishing pad with window

Assignee: Applied Materials, Inc.
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Quick Facts
Patent No.
US 7,198,544
App. No.
11/190,274
Granted
Apr 3, 2007
Kind
B2
Abstract

Polishing pads with a window, systems containing such polishing pads, and processes that use such polishing pads are disclosed.

Claims (8)

1. A method of making a polishing pad comprising:

securing a solid transparent window in an aperture in the polishing pad, the window being formed of a polymer material that provides the window with at least 80% transmission to light having a wavelength of about 400 to 410 nm, wherein the polymer material is a polyurethane substantially free of additives and substantially free of internal defects.

2. The method of claim 1 , wherein the polymer material is a non-ambering urethane elastomer.

3. The method of claim 1 , wherein the polymer material is polychlorotrifluoroethylene.

4. The method of claim 1 , wherein the polymer material is hydrophilic.

5. The method pad of claim 1 , wherein the polymer material has a hardness between 40 and 80 Shore D.

6. The method of claim 1 , further comprising depositing an antireflective coating on a bottom surface of the window.

7. The method of claim 1 , wherein securing the window includes recessing the a top surface of the window relative to the polishing surface.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 26, 2005
From: WISWESSER, ANDREAS NORBERT
To: APPLIED MATERIALS, INC.
Reel/Frame 016807/0054 →
Continuity (6)
Division 1046442300 · Jun 18, 2003
Continuation In Part 1003539100 · Dec 28, 2001
Continuation In Part 1028273000 · Oct 28, 2002
Provisional Application 6040241600 · Aug 9, 2002
Provisional Application 6039067900 · Jun 21, 2002
Related Publication 20050266771A1 · Dec 1, 2005