IP Library Granted Patent US 7,628,898
Granted Patent B2
US 7,628,898 · App. 11/198,905 · Granted Dec 8, 2009

Method and system for idle state operation

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Quick Facts
Patent No.
US 7,628,898
App. No.
11/198,905
Granted
Dec 8, 2009
Kind
B2
Abstract

Methods and systems for electrochemically processing microfeature workpieces are described herein. In one embodiment, a process for electrochemically treating a surface of a plurality of microfeature workpieces in an electrochemical treating chamber that includes a processing unit separated from an electrode unit by an ion-permeable barrier is described. The process involves an idle stage wherein during the idle stage, processing fluid components are prevented from transferring between the first processing fluid and the second processing fluid. The described system includes a flow control system for controlling the flow of processing fluid to achieve separation of a processing fluid from the barrier during the idle stage.

Claims (14)

1. A system for electrochemically treating a microfeature workpiece comprising:

a chamber including:

a processing unit for receiving a first processing fluid;

an electrode unit for receiving a second processing fluid;

an ion-permeable barrier between the processing unit and the electrode unit;

a first processing fluid circulation system;

a second processing fluid circulation system; and

a flow control system controlling the first processing fluid circulation system or the second processing fluid circulation system to cause processing fluid to separate from the barrier during an idle stage between a first electrochemical treatment stage and a second electrochemical treatment stage.

2. The system of claim 1 , wherein the flow control system controls the first processing fluid circulation system or the second processing fluid circulation system to cause processing fluid separated from the ion-permeable barrier during the idle stage to contact the barrier during the idle stage.

3. The system of claim 1 , wherein the electrode unit of the chamber includes an anolyte inlet, first anolyte outlet spaced above the anolyte inlet, and a second anolyte outlet spaced above the first anolyte outlet.

4. The system of claim 3 , wherein the first anolyte outlet is in fluid communication with a source of anolyte.

5. The system of claim 4 , further comprising a flow control device between the first anolyte outlet and the source of anolyte.

6. The system of claim 3 , wherein the anolyte inlet is in fluid communication with a source of anolyte.

7. The system of claim 3 , wherein the second anolyte outlet is in fluid communication with a source of anolyte.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 1, 2011
From: SEMITOOL INC
To: APPLIED MATERIALS INC.
Reel/Frame 027155/0035 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 30, 2005
From: KLOCKE, JOHN; HANSON, KYLE M.; BASKARAN, RAJESH
To: SEMITOOL, INC.
Reel/Frame 017178/0823 →