C-shaped dummy gate electrode semiconductor device and method of manufacturing the same
View Patent ↗A semiconductor device has a substrate, a first gate electrode, and a second gate electrode. The substrate has an active region surrounded by an isolation region. The first gate electrode is formed on the active region through a gate insulating film. The second gate electrode is formed on the gate insulating film such that the second gate electrode overlaps at least a part of a boundary between the active region and the isolation region. The first gate electrode and the second gate electrode are separated from each other.
1. A semiconductor device comprising:
a substrate having an active region surrounded by an isolation region;
a first gate electrode formed on said active region through a gate insulating film;
a second gate electrode formed on said gate insulating film, said second gate electrode being located on both opposite sides of said first gate electrode when viewed in cross section and having a bent shape overlapping a boundary between said active region and said isolation region, said second gate electrode being separated from said first gate electrode; and
a source and a drain formed in said active region and located apart from said isolation region,
wherein said second gate electrode includes two C-shaped parts whose apertures face each other, said two C-shaped parts being located on opposite sides of said first gate electrode when viewed in cross section, and
further comprising a first contact to one of said source and drain inside the aperture of one said C-shaped parts and a second contact to one of said source and drain inside the aperture of the opposite one of said C-shaped parts.
2. The semiconductor device according to claim 1 , wherein said first gate electrode has an opening and said opening is located above said active region.
3. The semiconductor device according to claim 1 , wherein said first gate electrode has a ring portion and said ring portion is located above said active region.
4. The semiconductor device according to claim 1 , wherein a substrate potential applied to said substrate is applied to said second gate electrode.
5. The semiconductor device according to claim 1 , wherein a potential applied to said first gate electrode is independent from a potential applied to said second gate electrode.