IP Library Granted Patent US 7,355,259
Granted Patent B2
US 7,355,259 · App. 11/207,449 · Granted Apr 8, 2008

Photodiode array and optical receiver device including the same

Assignee: Sumitomo Electric Industries, Ltd.
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Quick Facts
Patent No.
US 7,355,259
App. No.
11/207,449
Granted
Apr 8, 2008
Kind
B2
Abstract

Disclosed is a photodiode array which includes a plurality of p-i-n photodiodes arrayed on a semi-insulative semiconductor substrate, each photodiode including an n-type semiconductor layer grown on the substrate, an i-type semiconductor layer grown on the n-type semiconductor layer, a p-type semiconductor layer grown on the i-type semiconductor layer, an n-type electrode provided on the n-type semiconductor layer in a region exposed by partially removing the p-type semiconductor layer and the i-type semiconductor layer, and a p-type electrode provided on the p-type semiconductor layer. A trench is provided between the two adjacent photodiodes by partially removing the p-type semiconductor layer, the i-type semiconductor layer, and the n-type semiconductor layer. Consequently, the size and pitch of the photodiodes can be decreased and crosstalk between the photodiodes can be reduced. Also disclosed is an optical receiver device including the photodiode array.

Claims (14)

1. A photodiode array comprising a plurality of p-i-n photodiodes arrayed on a substrate, each photodiode comprising:

a semi-insulative semiconductor substrate comprising Fe-doped indium phosphide;

a p-type semiconductor layer on the semi-insulative semiconductor substrate;

an i-type semiconductor layer on the p-type semiconductor layer;

an n-type semiconductor layer on the i-type semiconductor layer;

a p-type electrode provided on the p-type semiconductor layer; and

an n-type electrode provided on the n-type semiconductor layer,

wherein a trench is provided between two adjacent photodiodes, and

wherein the photodiode array is configured so that light incident on the p-i-n photodiodes enters from the semiconductor substrate side.

2. A photodiode array according to claim 1 , wherein the trench extends to the semi-insulative semiconductor substrate.

3. A photodiode array according to claim 1 , wherein the trench is filled with a resin which does not transmit received light.

4. A photodiode array according to claim 1 , wherein the p-type semiconductor layer comprises indium phosphide.

5. A photodiode array according to claim 1 , wherein the i-type semiconductor layer comprises indium gallium arsenide.

6. A photodiode array according to claim 1 , wherein the n-type semiconductor layer comprises indium phosphide.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 11, 2008
From: YAMAGUCHI, AKIRA; KUHARA, YOSHIKI
To: SUMITOMO ELECTRIC INDUSTRIES, LTD.
Reel/Frame 020488/0915 →
Priority Claims (1)
JP 2002-050531 · Feb 26, 2002 · national
Continuity (2)
Division 1036824600 · Feb 18, 2003
Related Publication 20050285123A1 · Dec 29, 2005