Scanning apparatus and scanning methods for inspecting a surface of a semiconductor wafer
Scanning apparatus and scanning methods are disclosed for inspecting a surface of a semiconductor wafer. A disclosed example scanning apparatus includes a wafer stage to hold a wafer, a plurality of beam irradiators to respectively irradiate beams toward a plurality of inspection points on the surface of the wafer, a plurality of beam detectors respectively combined with the plurality of beam irradiators to form a plurality of irradiator-detector sets to detect reflected beams that are reflected from the inspection points on the surface of the wafer, a feeder unit to cause relative movement between the wafer stage and the plurality of irradiator-detector sets such that the entire surface of the wafer may be traversed by the inspection points, and a synthesizer to generate an inspection signal for the surface of the wafer by combining signals output from the plurality of beam detectors, wherein the relative movement of the wafer stage and a first one irradiator-detector sets is separate from that of the wafer stage and a second one of the irradiator-detector sets.
1 . A scanning apparatus to inspect a surface of a semiconductor wafer for dust particles or defects, comprising:
a wafer stage to hold a wafer;
a plurality of beam irradiators to respectively generate irradiating beams directed toward a plurality of inspection points on the surface of the wafer;
a plurality of beam detectors combined with respective ones of the plurality of beam irradiators to form a plurality of irradiator-detector sets, each of the beam detectors being positioned to detect a reflected beam originating at a respective one of the plurality of beam irradiators and reflected from a respective one of the inspection points;
a feeder unit to cause a relative movement between the wafer stage and the plurality of irradiator-detector sets such that substantially the entire surface of the wafer may be inspected; and
a synthesizer to generate an inspection signal for the surface of the wafer by combining signals output by the plurality of beam detectors,
wherein the relative movement of the wafer stage and a first one of the irradiator-detector sets is separate from the relative movement of the wafer stage and a second one of the irradiator-detector sets.
2 . A scanning apparatus as defined in claim 1 , wherein:
the feeder unit moves the irradiator-detector sets such that the first and second ones of the irradiator-detector sets scan respective regions on the surface of the wafer, the regions being located on opposite sides of a center of the wafer; and
the synthesizer generates an inspection signal for the entire surface of the wafer.
3 . A scanning apparatus as defined in claim 2 , wherein the feeder unit moves the wafer stage in a first direction and the feeder unit moves the plurality of beam irradiator-detector sets in a second direction substantially perpendicular to the first direction, such that the inspection points traverse the surface of the wafer in a zigzag pattern.
4 . A scanning method for detecting dust particles and defects on the surface of a wafer, comprising:
irradiating beams toward the surface of the wafer at a predetermined angle with at least two beam irradiators;
moving the at least two beam irradiators and a wafer stage holding the wafer relative to one another such that the two beams simultaneously scan different regions of the wafer;
generating an inspection signal by combining signals output from the beam detectors detecting the respective beams; and
determining whether dust particles or defects exist on the wafer based on the inspection signal.