Patent Assignment
Reel/Frame 017821/0670
Corrective Assignment to Correct the Assignor Previously Recorded on Reel 017749 Frame 0335. Assignor(S) Hereby Confirms the Assignor Should Be "Dongbuanam Semiconductor Inc.".
Recorded: 2006-06-21
Pages: 35
Assignor
DONGBUANAM SEMICONDUCTOR INC.
Executed: 2006-03-28
Assignee
DONGBU ELECTRONICS CO., LTD.
891-10 DAECHI-DONG, KANGNAM-GU, SEOUL, KOREA, REPUBLIC OF
Covered Properties
(158)
Semiconductor Device Having a Pad Over a Copper Line and Fabrication Method Thereof
Application:
10/676,645 →
Publication:
US 2004/0099949
Apparatus and method for manufacturing a semiconductor
Application:
10/704,414 →
Publication:
US 2004/0152315
Semiconductor Device and Method of Fabricating the Same
Method of Forming Trench in Semiconductor Device Using Polish Stop Layer and Anti-Reflection Coating
Bonding Pad of a Semiconductor Device and Formation Method Thereof
Trench in Semiconductor Device and Formation Method Thereof
Method for Fabricating Metal Line of Semiconductor Device
Methods for fabricating a semiconductor device with etch end point detection
Methods and Apparatus to Form Gates in Semiconductor Devices
Methods of Manufacturing Flash Memory Semiconductor Devices
Methods to Fabricate Semiconductor Devices
Methods of Forming Metal Wiring of Semiconductor Devices Including Sintering the Wiring Layers and Forming a via Hole with a Barrier Metal
Method for Fabricating a Capacitor Using a Metal Insulator Metal Structure
Method of Manufacturing a Semiconductor Device
Semiconductor Devices and Methods of Forming a Trench in a Semiconductor Device
Semiconductor Devices and Methods to Form Trenches in Semiconductor Devices
Mos Transistor and Fabrication Method Thereof
Semiconductor Devices and Methods for Fabricating the Same
Method of Forming a Trench in a Semiconductor Device
Methods of Forming a Contact Hole in a Semiconductor Device
Methods of Fabricating Non-Volatile Memory Devices
Methods of Forming Metal Lines in Semiconductor Devices
Method for Manufacturing Silicide and Semiconductor with the Silicide
Semiconductor Device and a Fabrication Method Thereof
Semiconductor Devices and Fabrication Methods Thereof
Deposition Stop Time Detection Apparatus and Methods for Fabricating Copper Wiring Using the Same
Rapid Thermal Processing Apparatus and Methods
Method for Forming a Bonding Pad of a Semiconductor Device Including a Plasma Treatment
Semiconductor Device Employing Soi Substrate and Method of Manufacturing the Same
Semiconductor Device Having Void Free Contact and Method for Fabricating the Contact
Method for Fabricating Metal Wiring and Semiconductor Device Having the Same
Mos Transistor and Fabrication Method Thereof
Methods of Forming Silicon Quantum Dots and Methods of Fabricating Semiconductor Memory Devices Using the Same
Mos Transistor and Method of Manufacturing the Same
Flash Memories and Methods of Fabricating the Same
Semiconductor Devices and Methods of Fabricating the Same
Method for Fabricating a Semiconductor Device Having Salicide
Semiconductor Devices and Methods of Forming a Barrier Metal in Semiconductor Devices
Electrostatic Chuck of Semiconductor Fabrication Equipment and Method for Chucking Wafer Using the Same
Semiconductior Device Having Improved Contact Hole Structure and Method for Fabricating the Same
Methods for Planarizing a Metal Layer
Semiconductor Devices Having Diffusion Barrier Regions and Halo Implant Regions and Methods of Fabricating the Same
Methods for fabricating semiconductor devices
Application:
10/946,155 →
Publication:
US 2005/0064688
Method for Fabricating a Semiconductor Device Having Self Aligned Source (Sas) Crossing Trench
Exposure Apparatus and Method for Forming Fine Patterns of Semiconductor Device Using the Same
Back Grinding Methods for Fabricating an Image Sensor
Cmos Image Sensor and Manufacturing Method Thereof
Etching apparatus, semiconductor devices and methods of fabricating semiconductor devices
Application:
10/956,607 →
Publication:
US 2005/0085089
Inductors in semiconductor devices and methods of manufacturing the same
Application:
10/956,612 →
Publication:
US 2005/0074905
Semiconductor Devices Having a Capacitor and Methods of Manufacturing the Same
High density plasma apparatus and methods of operating the same
Application:
10/960,556 →
Publication:
US 2005/0109459
Semiconductor devices and methods to form trenches in semiconductor devices
Application:
10/969,552 →
Publication:
US 2005/0145979
Flash Memory and Methods of Fabricating the Same
Cmos Image Sensor with Dark Current Reduction
Mos Transistor
Semiconductor Devices Having Dual Spacers and Methods of Fabricating the Same
Non-Volatile Memory Devices and Methods of Fabricating the Same
Semiconductor Devices and Methods of Manufacturing the Same
Flash Memory Cell and Method for Manufacturing the Same
Chemical Mechanical Polishing Apparatus
Semiconductor Device and Manufacturing Method Thereof
Methods of Forming Halo Regions in Nmos Transistors
Method for Fabricating Semiconductor Device
Methods of Forming Metal Interconnection Lines in Semiconductor Devices
Metal Interconnection Lines of Semiconductor Devices and Methods of Forming the Same
Semiconductor Device and Fabrication Method Thereof
Methods of Forming a Pattern for a Semiconductor Device
Mos Transistors and Methods of Manufacturing the Same
Masks for Fabricating Semiconductor Devices and Methods of Forming Mask Patterns
Non-Volatile Memory Element with Oxide Stack and Non-Volatile Sram Using the Same
Masks of Semiconductor Devices and Methods of Forming Mask Patterns
Polymer removal method for use in manufacturing semiconductor devices
Application:
11/023,065 →
Publication:
US 2005/0142880
Semiconductor Devices and Manufacturing Methods Thereof
Mos Transistor and Method of Manufacturing the Same
Methods of fabricating semiconductor devices
Application:
11/023,109 →
Publication:
US 2005/0142798
Non-Volatile Static Random Access Memory
Masks of Semiconductor Devices and Methods of Forming Patterns Thereof
Self-Aligned Element Isolation Film Structure in a Flash Cell and Forming Method Thereof
Method for Forming Mask Pattern of Semiconductor Device
Nonvolatile Semiconductor Memory Devices and Methods of Manufacturing the Same
Method of Manufacturing Mos Transistor
Method of Manufacturing Semiconductor Device
Semiconductor Device and Method of Manufacturing the Same
Methods of Manufacturing a Mos Transistor
Method of forming fine pattern for semiconductor device
Application:
11/026,572 →
Publication:
US 2005/0142872
Semiconductor Interconnection Line and Method of Forming the Same
Method for Forming Dual Damascene Pattern
Method for forming trench isolation in semiconductor device
Application:
11/026,915 →
Publication:
US 2005/0142803
Method for forming copper wiring of semiconductor device
Application:
11/026,927 →
Publication:
US 2005/0140012
Device Isolation Structures of Semiconductor Devices and Manufacturing Methods Thereof
Methods of Manufacturing Multi-Level Metal Lines in Semiconductor Devices
Semiconductor Devices and Methods of Manufacturing the Same
Transistors and Manufacturing Methods Thereof
Method of Forming Plug of Semiconductor Device
Methods of Forming Silicon Quantum Dots and Methods of Fabricating Semiconductor Memory Device Using the Same
Methods for Fabricating an Sti Film of a Semiconductor Device
Semiconductor Devices and Methods for Fabricating the Same
Mos Transistor and Method of Manufacturing the Same
Semiconductor devices and methods of forming a trench in a semiconductor device
Application:
11/047,337 →
Publication:
US 2005/0136619
Semiconductor Devices and Methods of Manufacturing the Same
Method for Manufacturing Semiconductor Device
Gate Electrodes of Semiconductor Devices and Methods of Manufacturing the Same
Method of Manufacturing Thin Film Capacitor
Semiconductor Devices and Methods of Manufacturing the Same
Method for Fabricating Metal Line in a Semiconductor
Semiconductor Device and Method for Manufacturing the Same
Method for Forming an Interconnection Line in a Semiconductor Device
Semiconductor Device and Method for Manufacturing the Same
Semiconductor Device and Method for Manufacturing the Same
Semiconductor Devices and Methods for Manufacturing the Same
Methods and systems for supplying deionized water in a wet station
Application:
11/205,417 →
Publication:
US 2006/0037629
Method for Manufacturing a Non-Volatile Memory Device
Apparatus for Ion Implantation
Semiconductor Device and Method for Forming a Metal Line in the Semiconductor Device
Method for Manufacturing a Semiconductor Device
Method for manufacturing a semiconductor device
Application:
11/213,395 →
Publication:
US 2006/0046465
X-Ray Detecting Devices and Apparatus for Analyzing a Sample Using the Same
Scanning apparatus and scanning methods for inspecting a surface of a semiconductor wafer
Application:
11/214,319 →
Publication:
US 2006/0054818
Apparatus for Chemical Mechanical Polishing
Manufacturing Method of a Semiconductor Device
Semiconductor device and manufacturing method thereof
Application:
11/228,992 →
Publication:
US 2006/0063337
Methods of Manufacturing a Metal-Insulator-Metal Capacitor
Semiconductor Devices and Methods for Manufacturing the Same
Methods of Forming a Metal Line in a Semiconductor Device
Method of Forming a Contact in a Semiconductor Device
Methods of Fabricating Metal Wiring in Semiconductor Devices
Chemical Mechanical Polishing Apparatus and Chemical Mechanical Polishing Method Using the Same
Semiconductor Device Having Improved Contact Hole Structure and Method for Fabricating the Same
Chemical mechanical polishing apparatus
Application:
11/282,759 →
Publication:
US 2006/0141909
Capacitors Having a Horizontally Folded Dielectric Layer and Methods for Manufacturing the Same
Semiconductor Devices and Methods of Forming Interconnection Lines Therein
Method of Forming Contact Holes in a Semiconductor Device Having First and Second Metal Layers
Methods for Forming a P-Type Polysilicon Layer in a Semiconductor Device
Methods of manufacturing semiconductor devices
Application:
11/292,249 →
Publication:
US 2006/0121656
Method of Forming a Gate Pattern in a Semiconductor Device
Method of Manufacturing a Semiconductor Device
Apparatus and method for removing photoresist in a semiconductor device
Application:
11/303,466 →
Publication:
US 2006/0124589
Device and Method of Performing a Seasoning Process for a Semiconductor Device Manufacturing Apparatus
Semiconductor Device and Method of Manufacturing the Same
Methods of Manufacturing a Metal-Insulator-Metal Capacitor
Methods for patterning a layer of a semiconductor device
Application:
11/315,617 →
Publication:
US 2006/0141777
Semiconductor device with shallow trench isolation and a manufacturing method thereof
Application:
11/316,543 →
Publication:
US 2006/0141740
Method for Forming a Mim Capacitor in a Semiconductor Device
Method for forming a metal contact in a semiconductor device having a barrier metal layer formed by homogeneous deposition
Application:
11/316,632 →
Publication:
US 2006/0134930
Semiconductor Device and Manufacturing Method Thereof
Inter-Metal Dielectric of Semiconductor Device and Manufacturing Method Thereof Including Plasma Treating a Plasma Enhanced Fluorosilicate Glass
Method of Manufacturing a Semiconductor Device
Method of Forming a Diffusion Barrier Layer Using a Tasin Layer and Method of Forming a Metal Interconnection Line Using the Same
Shield unit for TiN sputtering apparatus, method of coating the same, and sputtering method
Application:
11/317,703 →
Publication:
US 2006/0137970
Methods of Forming Interconnection Lines in Semiconductor Devices
CVD apparatus and manufacturing method of semiconductor device using the same
Application:
11/317,772 →
Publication:
US 2006/0141152
Semiconductor Device and Manufacturing Method Thereof
Semiconductor Devices and Methods of Manufacturing the Same
Mehods of Fabricating Mim Capacitors
Method for Manufacturing a Semiconductor Device
Method of Manufacturing a Semiconductor Device
Method of Manufacturing a Semiconductor Device
Trench in semiconductor device and formation method thereof
Application:
11/326,792 →
Publication:
US 2006/0118883
Related Assignments
(25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Oct 27, 2003
From: CHO, GYUNG-SU
To: ANAM SEMICONDUCTOR INC.
Reel/Frame 014621/0883 →
Assignment of Assignor's Interest
Nov 25, 2003
From: SEO, YOUNG-HUN
To: ANAM SEMICONDUCTOR, INC.
Reel/Frame 014752/0180 →
Assignment of Assignor's Interest
Nov 25, 2003
From: LEE, DATE-GUN
To: ANAM SEMICONDUCTOR, INC.
Reel/Frame 014758/0425 →
Assignment of Assignor's Interest
Dec 5, 2003
From: LEE, KANG-HYUN
To: DONGBU ELECTRONICS CO., LTD.
Reel/Frame 014777/0438 →
Assignment of Assignor's Interest
Dec 5, 2003
From: SEO, YOUNG-HUN
To: ANAM SEMICONDUCTOR INC.
Reel/Frame 014772/0917 →
Assignment of Assignor's Interest
Dec 11, 2003
From: OH, SANG-HUN
To: ANAM SEMICONDUCTOR INC.
Reel/Frame 014781/0352 →
Assignment of Assignor's Interest
Jan 15, 2004
From: LEE, DATE-GUN
To: ANAM SEMICONDUCTOR, INC.
Reel/Frame 014883/0375 →
Assignment of Assignor's Interest
Jan 15, 2004
From: PARK, GEON-OOK
To: ANAM SEMICONDUCTOR, INC
Reel/Frame 014883/0336 →
Assignment of Assignor's Interest
Jan 20, 2004
From: SEO, YOUNG-HUN
To: ANAM SEMICONDUCTOR INC.
Reel/Frame 014891/0188 →
Assignment of Assignor's Interest
Jan 20, 2004
From: HAN, JAE-WON; JEON, DONG-KI
To: ANAM SEMICONDUCTOR, INC.
Reel/Frame 014883/0333 →
Assignment of Assignor's Interest
Jan 26, 2004
From: PARK, GEON-OOK
To: ANAM SEMICONDUCTOR, INC.
Reel/Frame 014916/0267 →
Assignment of Assignor's Interest
Feb 2, 2004
From: SEO, YOUNG-HUN
To: ANAM SEMICONDUCTOR INC.
Reel/Frame 014941/0458 →
Assignment of Assignor's Interest
Feb 2, 2004
From: SEO, YOUNG-HUN
To: ANAM SEMICONDUCTOR INC.
Reel/Frame 014941/0507 →
Assignment of Assignor's Interest
Feb 2, 2004
From: KOH, KWAN-JU
To: ANAM SEMICONDUCTOR INC.
Reel/Frame 014961/0808 →
Assignment of Assignor's Interest
Mar 29, 2004
From: LEE, DATE-GUN
To: ANAM SEMICONDUCTOR INC.
Reel/Frame 015146/0236 →
Assignment of Assignor's Interest
Apr 27, 2004
From: JO, BO-YEOUN
To: DONGBU ELECTRONICS CO., LTD.
Reel/Frame 015266/0397 →
Assignment of Assignor's Interest
May 20, 2004
From: KOH, KWAN-JU
To: ANAM SEMICONDUCTOR, INC.
Reel/Frame 015350/0479 →
Assignment of Assignor's Interest
Jul 12, 2004
From: LEE, KI-MIN
To: DONGBU ELECTRONICS CO., LTD
Reel/Frame 015558/0138 →
Merger
May 31, 2005
From: ANAM SEMICONDUCTOR INC.; ANAM SEMICONDUCTOR INC.
To: DONGBUANAM SEMICONDUCTOR, INC., A KOREAN CORPORATION
Reel/Frame 016593/0917 →
Merger
May 31, 2005
From: DONGBU SEMICONDUCTOR INC.
To: DONGBUANAM SEMICONDUCTOR, INC.
Reel/Frame 016593/0667 →
Merger
May 31, 2005
From: DONGBU ELECTRONICS CO., LTD
To: DONGBUANAM SEMICONDUCTOR INC.
Reel/Frame 016292/0146 →
Change of Name
Jul 11, 2005
From: ANAM SEMICONDUCTOR INC.
To: DONGBUANAM SEMICONDUCTOR INC.
Reel/Frame 016504/0609 →
Change of Name
Jul 11, 2005
From: ANAM SEMICONDUCTOR INC.
To: DONGBUANAM SEMICONDUCTOR INC.
Reel/Frame 016504/0576 →
Change of Name
Jun 8, 2006
From: DONGANAM SEMICONDUCTOR INC.
To: DONGBU ELECTRONICS CO., LTD.
Reel/Frame 017749/0335 →
Assignment of Assignor's Interest
May 28, 2014
From: DONGBU HITEK CO., LTD.
To: DSS TECHNOLOGY MANAGEMENT, INC.
Reel/Frame 033035/0680 →