IP Library Granted Patent US 7,315,359
Granted Patent B2
US 7,315,359 · App. 11/216,270 · Granted Jan 1, 2008

Method for monitoring micro-lens curvature in-line

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Quick Facts
Patent No.
US 7,315,359
App. No.
11/216,270
Granted
Jan 1, 2008
Kind
B2
Abstract

A method and system for monitoring a curvature of a micro-lens in-line is disclosed. According to embodiments, sizes of circles (or circle images) from a top view of a micro-lens are measured and correlated to a change in focus depth of an optical scope. A method in accordance with embodiments can include the steps of: (i) measuring a diameter or area of a circle in the micro-lens when focusing a scope on a top point of the micro-lens; (ii) measuring a diameter or area of one or more second circles in the micro-lens by focusing the scope on one or more points lower than the top point of the micro-lens in stages, each stage correlated to changing a depth of focus of the scope; and (iii) calculating the curvature of the micro-lens with each diameter or area of the measured circles.

Claims (30)

1. A method for in-line monitoring a curvature of a micro-lens of a CMOS image sensor, comprising:

measuring a first diameter or area of a first circle in the micro-lens by focusing a scope substantially on a top point of the micro-lens on the CMOS image sensor;

measuring a second diameter or area of a second circle in the micro-lens by focusing the scope on a point lower than the top point of the micro-lens;

using in-line monitoring equipment, plotting a graph depicting the first and second diameters or areas of the measured circles as a function of a depth of focus of the scope; and

calculating the curvature of the micro-lens using the plotted graph.

2. The method of claim 1 , wherein focusing the scope on the lower point comprises changing a depth of focus of the scope.

3. The method of claim 1 , wherein the changed depth of focus is within a thickness range of the micro-lens.

4. The method of claim 1 , wherein the first and second circles are seen from a top view.

5. The method of claim 1 , wherein the first and second circles each have a difference of contrast from a larger circle corresponding to a diameter of the micro-lens.

6. The method of claim 1 , further comprising the step of measuring a third diameter or area of a third circle in the micro-lens by focusing a scope on a third point of the micro-lens other than the top point and the lower point, and plotting the graph further depicts the third diameter or area.

7. The method of claim 1 , comprising:

measuring the first diameter of the first circle;

measuring the second diameter of the second circle; and

plotting the graph using the first and second diameters of the measured circles.

8. The method of claim 7 , further comprising the step of measuring a third diameter of a third circle in the micro-lens by focusing a scope on a third point of the micro-lens other than the top point and the lower point, and plotting the graph further uses the third diameter.

9. The method of claim 1 , wherein the graph comprises a three-dimensional graph.

10. A computer-readable medium containing a set of instructions adapted to perform the method of claim 1 .

11. The medium of claim 10 , further comprising one or more instructions adapted to measure a third diameter or area of a third circle in the micro-lens by focusing a scope on third point other than the top point and the lower point.

12. The medium of claim 11 , further comprising one or more instructions adapted to calculate the curvature of the micro-lens further using the third diameter or area.

13. The method of claim 1 , further comprising, after calculating the curvature of the micro-lens, repeating the method on another microlens.

14. A system configured for calculating a curvature of a micro-lens of a CMOS image sensor, comprising:

a scope configured to focus light at a plurality of depths into the micro-Jens on the CMOS image sensor;

a contrast measuring device configured to measure or determine a diameter or area of a plurality of circles corresponding to the plurality of depths of the focused light;

equipment for plotting a graph depicting the first and second diameters or areas of the measured circles as a function of a depth of focus of the scope; and

a calculating device configured to calculate the curvature of the micro-lens using the plotted graph.

15. The system of claim 14 , wherein the plurality of depths includes a top point of the micro-lens and another point lower than the top point.

16. The system of claim 15 , wherein the plurality of depths includes a third point of the micro-lens other than the top point and the lower point.

17. The system of claim 14 , wherein the plurality of circles comprise a plurality of contrast circles.

18. The system of claim 14 , wherein the contrast measuring device includes a laser.

19. The system of claim 14 , configured for use in an a CMOS image sensor production flow.

Assignments (6)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 27, 2021
From: CAVIUM INTERNATIONAL
To: MARVELL ASIA PTE LTD.
Reel/Frame 057336/0873 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 25, 2021
From: MARVELL TECHNOLOGY CAYMAN I
To: CAVIUM INTERNATIONAL
Reel/Frame 057279/0519 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 23, 2021
From: INPHI CORPORATION
To: MARVELL TECHNOLOGY CAYMAN I
Reel/Frame 056649/0823 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 22, 2017
From: DONGBU HITEK, CO., LTD.
To: INPHI CORPORATION
Reel/Frame 041342/0915 →
CORRECTIVE ASSIGNMENT TO CORRECT REMOVE PATENT NO. 878209 FROM EXHIBIT B PREVIOUSLY RECORDED AT REEL: 034009 FRAME: 0157. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Oct 24, 2014
From: DONGBU HITEK, CO., LTD.
To: INPHI CORPORATION
Reel/Frame 034087/0097 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 15, 2014
From: DONGBU HITEK, CO., LTD.
To: INPHI CORPORATION
Reel/Frame 034009/0157 →