Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same
View Patent ↗A process for preparing a blocked derivatized poly(4-hydroxystryrene)-DPHS having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer; and (iv) reacting said polymer with a vinyl ether, a dialkyl dicarbonate, or a mixture of vinyl ether and a dialkyl dicarbonate to form the blocked DPHS. New compositions of matter which comprise the blocked derivatized poly(4-hydroxystyrene) prepared in the above manner and which have application in the electronic chemicals market such as in a photoresist composition and MEMS, and in other areas such as in varnishes, printing inks, epoxy resins, copying paper, tackifiers for rubber, crude oil separators, toner resins for photocopying, antireflective coatings, and the like.
1. A photoresist composition comprising a blocked derivatized poly (4-hydroxystyrene) characterized by having from about 5% to about 40% linearity, a polydispersity of less than about 2.0, and a molecular weight of less than about 10,000, with the proviso that said blocking is up to 95 mole % of the derivatized poly(4-hydroxystyrene).
2. A composition of matter having the following structure:
wherein n is from about 1 to about 10.
3. A composition of matter comprising a blocked derivatized poly(4-hydroxystyrene) (DPHS) characterized by having from about 5% to about 40% linearity, a polydispersity of less than about 2.0, and a molecular weight of less than about 10,000 with the proviso that said blocking is up to 95 mole % of the derivatized poly(4-hydroxystyrene).
4. The composition of matter as set forth in claim 3 wherein the DPHS is blocked by the reaction of the DPHS with a vinyl ether, a dialkyl dicarbonate, or a mixture of vinyl ether and dialkyl dicarbonate.
5. A photoresist composition containing the composition of matter as set forth in claim 2 .