IP Library Granted Patent US 7,180,773
Granted Patent B2
US 7,180,773 · App. 11/253,696 · Granted Feb 20, 2007

Magnetic memory device

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Quick Facts
Patent No.
US 7,180,773
App. No.
11/253,696
Granted
Feb 20, 2007
Kind
B2
Abstract

A width and a thickness of a bit line are represented as W 1 and T 1 , respectively, a thickness of a digit line is represented as T 2 , and a distance from a center of the digit line in a thickness direction to a center of a free layer of an MTJ element in the thickness direction is represented as L 1 . A width of the digit line is represented as W 2 , and a distance from a center of the bit line in the thickness direction to the center of the free layer of the MTJ element in the thickness direction is represented as L 2 . The distances L 1 and L 2 and the cross-sectional areas S 1 and S 2 are set in such a manner that when L 1 /L 2 ≧1, a relation of (⅓)·(L 1 /L 2 )≦S 2 /S 1 ≦1 is satisfied and when L 1 /L 2 ≦1, a relation of 1≦S 2 /S 1 ≦3(L 1 /L 2 ) is satisfied.

Claims (23)

1. A magnetic memory device comprising:

first and second write wires that intersect each other in a non-contact manner; and

a magnetic tunnel junction element which is arranged in an intersection of said first and second write wires and includes a magnetic tunnel junction, wherein

said magnetic tunnel junction element has a free layer consisting of a ferromagnetic material in which a magnetization direction is variable with a magnetic field generated by current flowing through said first and second write wires, and

in the case where a distance between a center of said first write wire in a thickness direction and a center of said free layer in the thickness direction is represented as L 1 ,

a distance between a center of said second write wire in the thickness direction and a center of said free layer in the thickness direction is represented as L 2 ,

a cross-sectional area of said first write wire in a width direction is represented as S 2 and

a cross-sectional area of said second write wire in a width direction is referred to as S 1 ,

said distance L 1 , said distance L 2 , said cross-sectional area S 1 , and said cross-sectional area S 2 are set in such a manner that

when a ratio of said distance L 1 to said distance L 2 is L 1 /L 2 ≧1,

a relation of (⅓)·(L 1 /L 2 )≦S 2 /S 1 ≦1 is satisfied and

when the ratio of said distance L 1 to said distance L 2 is L 1 /L 2 ≦1,

a relation of 1≦S 2 /S 1 ≦3(L 1 /L 2 ) is satisfied.

2. The magnetic memory device according to claim 1 , wherein

when a relation between said distance L 1 and said distant L 2 is L 1 >L 2 ,

said second write wire is made of a metal material having higher melting point than a melting point of a material for said first write wire, and

when the relation between said distance L 1 and said distant L 2 is L 1 <L 2 ,

said first write wire is made of a metal material having higher melting point than a melting point of a material for said second write wire.

3. The magnetic memory device according to claim 1 , wherein

when a relation between said cross-sectional area S 1 and said cross-sectional area S 2 is S 1 >S 2 ,

said first write wire is made of a metal material having higher melting point than a melting point of a material for said second write wire, and

when the relation between said cross-sectional area S 1 and said cross-sectional area S 2 is S 1 <S 2 ,

said second write wire is made of a metal material having higher melting point than a melting point of a material for said first write wire.

Assignments (2)
CHANGE OF NAME Recorded Sep 9, 2010
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 025008/0390 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 20, 2005
From: OKUMURA, YOSHINORI; UENO, SHUICHI; FURUTA, HARUO
To: RENESAS TECHNOLOGY CORP.
Reel/Frame 017140/0714 →