Method and process for design of integrated circuits using regular geometry patterns to obtain geometrically consistent component features
View Patent ↗The invention provides a method and process for designing an integrated circuit based on using the results from both 1) a specific set of silicon test structure characterizations and 2) the decomposition of logic into combinations of simple logic primitives, from which a set of logic bricks are derived that can be assembled for a manufacturable-by-construction design. This implementation of logic is compatible with the lithography settings that are used for implementation of the memory blocks and other components on the integrated circuit, particularly by implementing geometrically consistent component features. The invention provides the ability to recompile a design comprised of logic and memory blocks onto a new geometry fabric to implement a set of technology-specific design changes, without requiring a complete redesign of the entire integrated circuit.
1. A method of creating a plurality of logic brick representations used in representing different portion of an integrated circuit design, the method comprising the steps of:
obtaining a set of uniform patterns of geometrical shapes based upon regular patterns from a compiled memory block representation; and
determining a plurality of logic brick representations, each logic brick representation representing a different desired logic structure and having logic components that have geometrically consistent component features that are unique patterns that derive from the set of uniform patterns of geometrical shapes.
2. The method according to claim 1 wherein the step of determining the plurality of logic brick representations differ only in via placements therein.
3. The method according to claim 1 further including the step of using the plurality of logic brick representations in designing an integrated circuit device.
4. The method according to claim 3 further including the step of using the plurality of logic brick representations to create masks for the integrated circuit device.
5. The method according to claim 4 wherein the step of using uses a same fabric for each of the plurality of logic brick representations.
6. The method according to claim 4 wherein the plurality of logic brick representations have associated therewith a common set of lithography control settings used during the fabrication of the geometrically consistent logic component features.
7. The method according to claim 6 wherein the common set of lithography control settings include a common set of illumination control settings.
8. The method according to claim 6 wherein the lithography control settings are obtained from memory lithography control settings used with the uniform patterns of geometrical shapes based upon regular patterns from the compiled memory block representation.
9. The method according to claim 1 wherein sizes of the geometrically consistent logic component features are substantially less than wavelengths of light used in a lithography process during fabrication of the integrated circuit device.
10. The method according to claim 1 wherein the plurality of logic brick representations have associated therewith a common set of lithography control settings used during fabrication of the geometrically consistent logic component features.
11. The method according to claim 10 wherein the common set of lithography control settings include a common set of illumination control settings.
12. A method of creating a plurality of logic brick representations used in representing different portion of an integrated circuit desigm the method comprising the steps of:
obtaining a set of uniform patterns of geometrical shapes based upon regular patterns from a compiled memory block representation, and
determining a plurality of logic brick representations that are formed from a logic fabric, each logic brick representation representing a different desired logic structure and having logic components that have geometrically consistent component features that are unique patterns that derive from the set of uniform patterns of geometrical shapes wherein lithography control settings used on the logic fabric are obtained from memory lithography control settings used with the uniform patterns of geometrical shapes based upon regular patterns from the compiled memory block representation.
13. The method according to claim 12 wherein lithography control settings used on the logic fabric are obtained from memory lithography control settings used with the uniform patterns of geometrical shapes based upon regular patterns from the compiled memory block representation.
14. The method according to claim 13 wherein the lithography control settings are illumination control settings that are obtained from memory illumination control settings.
15. A method of creating a plurality of logic brick representations used in representing different portion of an integrated circuit design, the method comprising the steps of:
obtaining a set of uniform patterns of geometrical shapes based upon regular patterns from a compiled memory block representation;
determining a plurality of logic brick representations, each logic brick representation representing a different desired logic structure and having logic components that have geometrically consistent component features that are unique patterns that derive from the set of uniform patterns of geometrical shapes;
using the plurality of logic brick representations to create masks for the integrated circuit device, wherein the plurality of logic brick representations have associated therewith a common set of lithography control settings used during the fabrication of the geometrically consistent logic component features.
16. The method according to claim 15 wherein sizes of the geometrically consistent logic component features are substantially less than wavelengths of light used in a lithography process during fabrication of the integrated circuit device.
17. The method according to claim 15 wherein the lithography control settings are obtained from memory lithography control settings used with the uniform patterns of geometrical shapes based upon regular patterns from the compiled memory block representation.
18. A method of creating a plurality of logic brick representations used in representing different portion of an integrated circuit design, the method comprising the steps of:
obtaining a set of uniform patterns of geometrical shapes based upon regular patterns from a compiled memory block representation; and
determining a plurality of logic brick representations, each logic brick representation representing a different desired logic structure and having logic components that have geometrically consistent component features that are unique patterns that derive from the set of uniform patterns of geometrical shapes,
wherein the plurality of logic brick representations have associated therewith a common set of lithography control settings used during fabrication of the geometrically consistent logic component features.
19. The method according to claim 18 wherein the lithography control settings are obtained from memory lithography control settings used with the uniform patterns of geometrical shapes based upon regular patterns from the compiled memory block representation.
20. The method according to claim 19 wherein the lithography control settings include illumination control settings.
21. The method according to claim 20 wherein a number of the patterns in the set of uniform patterns of geometrical shapes is less than 200.
22. The method according to claim 19 wherein a number of the patterns in the set of uniform patterns of geometrical shapes is less than 200.
23. The method according to claim 18 wherein the lithography control settings include illumination control settings.
24. The method according to claim 18 further including the step of using the plurality of logic brick representations to create masks for the integrated circuit device.
25. The method according to claim 24 wherein the lithography control settings are obtained from memory lithography control settings used with the uniform patterns of geometrical shapes based upon regular patterns from the compiled memory block representation.
26. The method according to claim 24 wherein the lithography control settings include illumination control settings.
27. The method according to claim 24 wherein the step of using uses a same fabric for each of the plurality of logic brick representations.
28. The method according to claim 27 wherein a number of the patterns in the set of uniform patterns of geometrical shapes is less than 200.
29. The method according to claim 18 wherein a number of the patterns in the set of uniform patterns of geometrical shapes is less than 200.
30. The method according to claim 18 wherein the step of determining the plurality of logic brick representations differ only in via placements therein.
31. A method of creating a plurality of logic brick representations used in representing different portion of an integrated circuit design, the method comprising the steps of:
obtaining a set of uniform patterns of geometrical shapes based upon regular patterns from a memory block representation, wherein a number of the patterns in the set of uniform patterns of geometrical shapes is less than 200;
determining a plurality of logic brick representations, each logic brick representation representing a different desired logic structure and having logic components that have geometrically consistent component features that are unique patterns that derive from the set of uniform patterns of geometrical shapes, and
using the plurality of logic brick representations to create masks for the integrated circuit device.