Method of manufacturing semiconductor apparatus and method of forming viscous liquid layer
View Patent ↗A method of manufacturing a semiconductor apparatus including a process of applying viscous liquid. The method applies viscous liquid onto a principal surface of a substrate, coats the viscous liquid closely with flexible coating material having a higher bonding strength with molecules of the viscous liquid than an intermolecular bonding strength of molecules of the viscous liquid, and then strips away the coating material together with part of the viscous liquid.
1. A method of manufacturing a semiconductor apparatus, comprising:
disposing flux on a surface of a semiconductor substrate having plural electrodes formed thereon so that said flux goes between ones of said plural electrodes and overlies said plural electrodes;
placing a film comprising flexible material on the flux after disposing said flux;
stripping away the film together with part of the flux to reduce a thickness of the flux overlying the plural electrodes; and
forming a respective bump on a surface of a corresponding one of the plural electrodes after stripping away the film,
wherein said forming a respective bump comprises heat treating a solder ball to form said respective bump, said heat treating vaporizing said flux wherein said flux is intentionally thicker in the step of disposing flux than desired in the step of forming said respective bump.
2. The method of manufacturing a semiconductor apparatus according to claim 1 , wherein the film is stripped substantially horizontally with respect to the surface of the substrate.
3. A method of forming a flux layer on a semiconductor substrate having a plurality of bumps, comprising in order:
disposing flux on a surface of a substrate having plural electrodes formed thereon so that said flux goes between ones of said plural electrodes and overlies said plural electrodes;
placing a film comprising flexible material on the flux;
stripping away the film together with part of the flux, so that part of the flux is left on the substrate with a reduced thickness of the flux overlying the plural electrodes; and
forming a bump on the surface of a corresponding one of the plural electrodes where the flux is disposed by heat treating a solder ball to form said bump, said heat treating vaporizing said flux that is left on the substrate wherein said flux is intentionally thicker in the step of disposing flux than desired in the step of forming said respective bump.
4. The method of forming a flux layer on a substrate according to claim 3 , wherein the film has a higher bonding strength with molecules of the flux than an intermolecular bonding strength of molecules of the flux.
5. The method of manufacturing a semiconductor substrate according to claim 1 , wherein the film has a higher bonding strength with molecules of the flux than an intermolecular bonding strength of molecules of the flux.
6. A method of manufacturing a semiconductor apparatus, comprising:
disposing flux through a mask onto a surface of a semiconductor substrate having plural electrodes formed thereon so that said flux goes between ones of said plural electrodes and overlies said plural electrodes;
placing a film comprising flexible material on the flux overlying the plural electrodes, the film having a higher bonding strength with molecules of the flux than an intermolecular bonding strength of molecules of the flux;
stripping away the film together with part of the flux to reduce a thickness of the flux overlying the plural electrodes; and
forming a respective bump on a surface of a corresponding one of the plural electrodes after stripping away the film,
wherein said forming a respective bump comprises heat treating a solder ball to form said respective bump, said heat treating vaporizing said flux wherein said flux is intentionally thicker in the step of disposing flux than desired in the step of forming said respective bump.
7. The method of manufacturing a semiconductor apparatus according to claim 6 , wherein the film is peeled back on itself and stripped substantially horizontally with respect to the surface of the substrate.