IP Library › Granted Patent US 7,860,351
Granted Patent B2
US 7,860,351 · App. 11/276,833 · Granted Dec 28, 2010

Spin-injection magnetoresistance effect element

Assignee: Sony Corporation
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Quick Facts
Patent No.
US 7,860,351
App. No.
11/276,833
Granted
Dec 28, 2010
Kind
B2
Abstract

A spin-injection magnetoresistance effect element that can avoid use of a large writing current and allows use of a large reading current. The spin-injection magnetoresistance effect element includes layers that may exhibit a tunnel magnetoresistance effect and layers that may exhibit a giant magnetoresistance effect.

Claims (28)

1. A spin-injection magnetoresistance effect element comprising:

(A) a magnetization reversal layer that has a first face and a second face opposite to the first face, and stores information;

(B) a first magnetization reference layer that is disposed near one end of the magnetization reversal layer in a manner of facing the first face of the magnetization reversal layer with intermediary of a first nonmagnetic film between the first magnetization reference layer and the magnetization reversal layer, the first magnetization reference layer being magnetized in a first direction;

(C) a second magnetization reference layer that is disposed near the other end of the magnetization reversal layer in a manner of facing the first face of the magnetization reversal layer and being separated from the first magnetization reference layer with intermediary of a second nonmagnetic film between the second magnetization reference layer and the magnetization reversal layer, the second magnetization reference layer being magnetized in a second direction that is the opposite direction of the first direction;

(D) a first electrode that is electrically coupled to the first magnetization reference layer;

(E) a second electrode that is electrically coupled to the second magnetization reference layer; and

(F) a third electrode that is disposed in a manner of facing the second face of the magnetization reversal layer with intermediary of an insulating film between the third electrode and the magnetization reversal layer.

2. The spin-injection magnetoresistance effect element according to claim 1 , wherein

injection of a spin-polarized current from the first or second electrode via the first or second magnetization reference layer, respectively, into the magnetization reversal layer sets a magnetization direction of the magnetization reversal layer to the first or second direction, to thereby write information to the magnetization reversal layer.

3. The spin-injection magnetoresistance effect element according to claim 2 , wherein

a logical value of information written to the magnetization reversal layer is controlled by a direction of a current flowing between the first and second electrodes.

4. The spin-injection magnetoresistance effect element according to claim 2 , wherein

a voltage is applied to the third electrode in writing of information to the magnetization reversal layer.

5. The spin-injection magnetoresistance effect element according to claim 4 , wherein

the magnetization reversal layer is grounded in writing of information to the magnetization reversal layer.

6. The spin-injection magnetoresistance effect element according to claim 1 , wherein

the first magnetization reference layer, the first nonmagnetic film and the magnetization reversal layer form a multi-layer structure having a tunnel magnetoresistance (TMR) effect.

7. The spin-injection magnetoresistance effect element according to claim 6 , wherein

the second magnetization reference layer, the second nonmagnetic film and the magnetization reversal layer form a multi-layer structure having a giant magnetoresistance (GMR) effect.

8. The spin-injection magnetoresistance effect element according to claim 1 , wherein

a first antiferromagnetic layer is formed between the first magnetization reference layer and the first electrode, and

a second antiferromagnetic layer is formed between the second magnetization reference layer and the second electrode.

9. The spin-injection magnetoresistance effect element according to claim 1 , wherein

either one of the first and second magnetization reference layers has a synthetic ferri-magnetic structure.

10. The spin-injection magnetoresistance effect element according to claim 1 , wherein

either one of the first and second magnetization reference layers has a magnetostatically coupled structure.

11. The spin-injection magnetoresistance effect element according to claim 1 , wherein

the first magnetization reference layer has a synthetic ferri-magnetic structure, and the second magnetization reference layer has a synthetic ferro-magnetic structure.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 14, 2006
From: YAGAMI, KOJIRO
To: SONY CORPORATION
Reel/Frame 017472/0510 →
Priority Claims (1)
JP P2005-087950 · Mar 25, 2005 · national
Continuity (1)
Related Publication 20060227466A1 · Oct 12, 2006