IP Library Granted Patent US 7,379,241
Granted Patent B2
US 7,379,241 · App. 11/296,890 · Granted May 27, 2008

High efficiency phase grating having a planar reflector

Assignee: Polychromix Corporation
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 7,379,241
App. No.
11/296,890
Granted
May 27, 2008
Kind
B2
Abstract

An apparatus for processing electromagnetic radiation. The apparatus comprises a dielectric reflector, a plurality of ridges disposed on the dielectric reflector and a plurality of grooves disposed intermediate adjacent ridges to form a diffraction grating. Each of the ridges comprises a first dielectric material disposed on the dielectric reflector having a first index of refraction and a second dielectric material, having a second index of refraction different than the first index of refraction, disposed on the first dielectric material.

Claims (10)

1. An apparatus for processing electromagnetic radiation, comprising:

a substrate;

a plurality of ridges each having a top surface, said ridges being disposed on the substrate and a plurality of grooves disposed intermediate adjacent ridges to form a diffraction grating, each of said ridges comprising a first dielectric material disposed on the substrate having a first index of refraction, and a second dielectric material having a second index of refraction different than the first index of refraction disposed on the first dielectric material; and

an overcoat layer having a planar surface that is coplanar with the top surfaces of said ridges;

wherein the diffraction grating is constructed and ananged such that the zeroth diffraction orders of a TM-polarized portion and a TE-polarized portion of the electromagnetic radiation are substantially canceled by destructive interference for an angle of incidence of the radiation on the diffraction grating.

2. The apparatus as claimed in claim 1 , wherein the first dielectric material and the second dielectric material are absent from the grooves.

3. The apparatus as claimed in claim 1 , wherein the substrate is a transparent substrate.

4. The apparatus as claimed in claim 1 , wherein the substrate comprises a dielectric reflector.

5. The apparatus as claimed in claim 4 , wherein the dielectric reflector comprises a dielectric stack mirror.

6. The apparatus as claimed in claim 5 , wherein the dielectric stack mirror comprises alternating layers of TiO 2 and SiO 2 .

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 13, 2010
From: POLYCHROMIX CORPORATION
To: AHURA SCIENTIFIC INC.
Reel/Frame 024672/0303 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 15, 2008
From: SMITH, MALCOLM C
To: POLYCHROMIX CORPORATION
Reel/Frame 020820/0833 →
Continuity (2)
Provisional Application 6063669200 · Dec 15, 2004
Related Publication 20060152809A1 · Jul 13, 2006