Process for the modification of substrate surfaces through the deposition of amorphous silicon layers followed by surface functionalization with organic molecules and functionalized structures
Functionalized substrates and method of passivating the surface of a substrate to improve the surface by imparting desirable surface properties to improve the performance of a surface, the method steps including exposing the substrate to a chemical vapor deposition process to coat the substrate with silicon, and functionalizing the coated surface by exposing the substrate surface to a binding reagent having at least one unsaturated hydrocarbon group.
1. A substrate having an improved surface, said substrate having a plurality of layers of silicon over the substrate, the plurality of layers of silicon including an outermost layer of silicon, the outermost layer of silicon being functionalized with an unsaturated hydrocarbon moiety which is covalently bonded thereto.
2. The substrate of claim 1 , wherein the unsaturated hydrocarbon moiety comprises —CH═CH 2 or —C≡CH.
3. The substrate of claim 1 , wherein the substrate comprises a vessel with a controllable environment, and wherein said improved surface is disposed within said controllable environment.
4. The substrate of claim 1 , the substrate comprising a ferrous metal, a non-ferrous metal, glass, carbon, quartz, a nickel containing ferrous alloy, titanium, a titanium alloy, aluminum, an aluminum alloy, or a ceramic.
5. A substrate having a coating formed thereon, the coating consisting essentially of a plurality of layers of silicon formed over the substrate, the plurality of layers of silicon including an outermost layer of silicon, the outermost layer of silicon being functionalized with an unsaturated hydrocarbon moiety which is covalently bonded thereto.
6. The substrate of claim 5 , wherein the unsaturated hydrocarbon moiety comprises —CH═CH 2 or —C≡CH.
7. A substrate having a surface and means coating the surface for imparting improved surface properties for application in corrosive, chemical, and/or vacuum environments, said means comprising a coating of a plurality of layers of hydrogenated amorphous silicon, the plurality of layers of hydrogenated amorphous silicon including an outermost layer of hydrogenated amorphous silicon, the outermost layer of hydrogenated amorphous silicon being functionalized with an unsaturated hydrocarbon moiety which is covalently bonded thereto.
8. The substrate of claim 7 , wherein the unsaturated hydrocarbon moiety comprises —CH═CH 2 or —C≡CH.