Method for manufacturing semiconductor device
View Patent ↗A method for manufacturing a semiconductor device effectively removes a solvent of a bottom antireflective coating film is using a porous material so as to prevent acid in a photoresist film from reacting with the solvent during a post exposure baking (PEB) process. The method includes forming a pattern formation layer on a wafer, forming a bottom antireflective coating film containing a solvent, on the pattern formation layer, arranging a porous material layer in contact with the bottom antireflective coating film, absorbing the solvent contained in the bottom antireflective coating film using the porous material layer, forming photoresist film patterns on predetermined portions of the bottom antireflective coating film, etching the bottom antireflective coating film using the photoresist film patterns as masks, and etching the pattern formation layer using the photoresist film patterns as masks to form patterns.
1. A method for manufacturing a semiconductor device comprising:
forming a pattern formation layer on a substrate;
forming a bottom antireflective coating film containing a solvent on the pattern formation layer;
positioning a porous material layer in contact with the bottom antireflective coating film;
heating the bottom antireflective coating film by positioning a hot plate below the substrate to evaporate the solvent contained in the bottom antireflective coating film;
absorbing the solvent contained in the bottom antireflective coating film by the porous material layer;
removing the porous material layer after absorbing the solvent;
forming photoresist film patterns on predetermined portions of the bottom antireflective coating film;
etching the bottom antireflective coating film using the photoresist film patterns as masks; and
etching the pattern formation layer using the photoresist film patterns as masks to form patterns.
2. The method as claimed in claim 1 , wherein forming the bottom antireflective coating film comprises coating a bottom antireflective coating material containing the solvent on the pattern formation layer and rotating the pattern formation layer.
3. The method as claimed in claim 1 , wherein the bottom antireflective coating material comprises a light-absorbing high polymer.
4. The method as claimed in claim 1 , wherein the solvent comprises an organic solvent.
5. The method as claimed in claim 4 , wherein the organic solvent comprises ethyl lactate or propylene glycol monomethyl ether acetate (PGMEA).
6. The method as claimed in claim 1 , wherein the porous material layer comprises a porous oil-absorbing high polymer.
7. The method as claimed in claim 1 , wherein the porous material layer comprises at least one of an acryl amide monomer, poly-styrene inducer, ethylene propylene (EPDM) Rubber, and polynorborne.