Methods and systems to enhance multiple wave mixing process
View Patent ↗Frequency conversion methods are taught wherein non-collinear phase matching configurations may be implemented in non-linear crystals used in three wave mixing processes such that the frequency conversion efficiency is enhanced through walk-off compensation while also maximizing conversion efficiency. The harmonic conversion techniques are especially applicable to sum frequency process, and in particular to third harmonic generation.
1. A method of compensating for walkoff in a three wave interaction processes in a nonlinear crystal, comprising:
providing an optical system having a nonlinear crystal positioned therein and a first wave and second wave propagating therethrough;
irradiating the nonlinear crystal with the first and second waves;
generating a third wave within the nonlinear crystal; and
adjusting the angle of incidence of the first and second waves relative to the principal axis of the nonlinear crystal such that the first, second, and third waves substantially overlap within the nonlinear crystal to maximize the conversion efficiency.
2. The method of claim 1 wherein the first and second waves are incident at the same angle on an input surface of the nonlinear crystal.
3. The method of claim 2 wherein the first and second waves are refracted at different angles by the input surface the nonlinear crystal.
4. The method of claim 1 wherein the first and second waves are directed to the same location on the input surface.
5. The method of claim 1 wherein the first and second waves are incident at the same angle and same location on an input surface of the nonlinear crystal.
6. The method of claim 5 wherein the first and second waves are refracted at different angles by the input surface of the nonlinear crystal.
7. The method of claim 5 wherein the three wave interaction processes comprises third harmonic generation.
8. The method of claim 7 further comprising providing a LBO nonlinear crystal.
9. The method of claim 1 further comprising adjusting the position of at least one of the waves by irradiating a birefringent material with the wave.
10. The method of claim 1 further comprising adjusting the angle and position of at least one of the waves by irradiating a birefringent material with the wave.
11. The method of claim 10 wherein the birefringent material includes an angled surface configured to adjust the angle of at least one of the waves.
12. The method of claim 1 wherein the three wave interaction processes comprises second harmonic generation.
13. The method of claim 1 wherein the three wave interaction processes comprises third harmonic generation.
14. The method of claim 1 wherein the three wave interaction processes comprises fourth harmonic generation.
15. The method of claim 1 wherein the three wave interaction is selected from the group consisting of fifth harmonic generation, optical parametric oscillation, optical parametric generation, optical parametric amplification, sum frequency generation, and difference frequency generation.
16. The method of claim 1 wherein the three wave interaction is non-collinearly phase-matched.
17. The method of claim 1 wherein at least one of the waves is used for memory repair.
18. The method of claim 1 wherein at least one of the waves is used for via hole drilling.
19. The method of claim 1 wherein at least one of the waves is used for scribing.
20. The method of claim 1 wherein at least one of the waves is used for marking.
21. The method of claim 1 wherein at least one of the waves is used for ablation.
22. A device for three wave interaction processes, comprising:
at least one source providing a first wave and a second wave; and
a nonlinear crystal having an input surface and at least one principal axis and cofigured to be irradiated by the first and second waves and generate a third wave in response thereto, the first and second waves incident at the same location on the input surface of the nonlinear crystal at an oblique angle of incidence relative to surface of the nonlinear crystal such that the first, second, and third waves overlap within the nonlinear crystal so as to maximize the conversion efficiency.
23. The device of claim 22 further comprising at least one birefringent material positioned between the source and the nonlinear crystal.
24. The device of claim 23 wherein the birefringent material is configured to adjust the position of at least one of the first and second waves relative to the nonlinear crystal.
25. The device of claim 23 wherein the birefringent material is configured to adjust the angle of at least one of the first and second waves relative to the nonlinear crystal.
26. The device of claim 23 wherein the birefringent material further comprises at least one angled surface.
27. The device of claim 26 wherein the angled surface of the birefringent material is configured to adjust the angle of at least one of the first and second waves relative to the nonlinear crystal.
28. The device of claim 26 wherein the birefringent material is configured to adjust the angle and position of at least one of the first and second waves relative to the nonlinear crystal.
29. The device of claim 23 wherein the birefringent material is configured to convert the frequency of at least one of the first and second waves.
30. The device of claim 23 wherein the birefringent material is selected from the group consisting of quartz, vanadate, α-BBO, calcite, KBBF, KGW, and KYW.
31. The device of claim 22 wherein the source comprises a single light source configured to output the first and second waves, the first and second waves having the same wavelength.
32. The device of claim 22 wherein the source comprises a single light source configured to output the first and second waves, the first and second waves having different wavelengths.
33. The device of claim 22 wherein the source comprises a multiple light sources configured to output the first and second waves, the first and second waves having the same wavelength.
34. The device of claim 22 wherein the source comprises multiple light sources configured to output the first second waves, wherein the first and second waves having different wavelengths.
35. The device of claim 22 wherein the source is selected from the group consisting of a laser source, a laser oscillator, a laser amplifier, a mode-locked laser source, a Q-switched laser source, and continuous wave source.
36. The device of claim 22 wherein the source comprises a laser system selected from the group consisting of Nd:YVO4, Nd:YAG, Nd:YLF, Nd:Glass, Ti:sapphire, Cr:YAG, Cr.Forsterite, Yb:YAG, Yb:KGW, Yb:KYW, Yb:glass, KYbW, and YbAG.
37. The device of claim 22 wherein the source comprises an optical system selected from the group consisting of an apatite structure crystal, a semiconductor material, and an optical fiber.
38. The device of claim 22 wherein the nonlinear crystal is LBO.
39. The device of claim 22 wherein the three wave interaction comprises second harmonic generation.
40. The device of claim 22 wherein the three wave interaction comprises third harmonic generation.
41. The device of claim 22 wherein the three wave interation is selected from the group consisting of fourth harmonic generation, fifth harmonic generation, optical parametric oscillation, optical parametric generation, optical parametric amplification sum frequency generation, and difference frequency generation.
42. The device of claim 22 wherein at least one of the waves is used for memory repair.
43. The device of claim 22 wherein at least one of the waves is used for via hole drilling.
44. The device of claim 22 wherein at least one of the waves is used for scribing.
45. The device of claim 22 wherein at least one of the waves is used for marking.
46. The device of claim 22 wherein at least one of the waves is used for ablation.
47. A method of compensating for walkoff in a three wave interaction processes in a nonlinear crystal, comprising:
providing an optical system having a nonlinear crystal positioned therein and a first wave and second wave propagating therethrough;
irradiating an input surface of a nonlinear crystal with the first and second waves, the first and second waves incident at substantially the same angle and substantially same location on an input surface of the nonlinear crystal;
generating a third wave within the nonlinear crystal; and
maximizing a conversion efficiency by adjusting the angle of incidence of the first and second waves relative to the principal axis of the nonlinear crystal such that the first, second, and third waves overlap within the nonlinear crystal.
48. A device for three wave interaction processes, comprising:
at least one source providing a first wave and a second wave; and
a nonlinear crystal having an input surface and at least one principal axis and configured to be irradiated by the first and second waves and generate a third wave in response thereto, the first and second waves incident on the input surface of the nonlinear crystal at a same oblique angle of incidence relative to a surface of the nonlinear crystal and refracted at different angles by the input surface such that the first, second, and third waves overlap within the nonlinear crystal so as to maximize the conversion efficiency.
49. The device of claim 48 further comprising at least one birefringent material positioned between the source and the nonlinear crystal.
50. The device of claim 49 wherein the birefringent material is configured to adjust the position of at least one of the first and second waves relative to the nonlinear crystal.
51. The device of claim 49 wherein the birefringent material is configured to adjust the angle of at least one of the first and second waves relative to the nonlinear crystal.
52. The device of claim 49 wherein the birefringent material further comprises at least one angled surface.
53. The device of claim 52 wherein the angled surface of the birefringent material is configured to adjust the angle of at least one of the first and second waves relative to the nonlinear crystal.
54. The device of claim 49 wherein the birefringent material is configured to adjust the angle and position of at least one of the first and second waves relative to the nonlinear crystal.
55. The device of claim 49 wherein the birefringent material is configured to convert the frequency of at least one of the first and second waves.
56. The device of claim 49 wherein the birefringent material is selected from the group consisting of quartz, vanadate, α-BBO, calcite, KBBF, KGW, and KYW.
57. The device of claim 48 wherein the source comprises a single light source configured to output the first and second waves, the first and second waves having the same wavelength.
58. The device of claim 48 wherein the source comprises a single light source configured to output the first and second waves, the first and second waves having different wavelengths.
59. The device of claim 48 wherein the source comprises a multiple light sources configured to output the first and second waves, the first and second waves having the same wavelength.
60. The device of claim 48 wherein the source comprises multiple light sources configured to output the first second waves, wherein the first and second waves having different wavelengths.
61. The device of claim 48 wherein the source is selected from the group consisting of a laser source, a laser oscillator, a laser amplifier, a mode-locked laser source, a Q-switched laser source, and continuous wave source.
62. The device of claim 48 wherein the source comprises a laser system selected from the group consisting of Nd:YVO4, Nd:YAG, Nd:YLF, Nd:Glass, Ti:sapphire, Cr:YAG, Cr.Forsterite, Yb:YAG, Yb:KGW, Yb:KYW, Yb:glass, KYbW, and YbAG.
63. The device of claim 48 wherein the source comprises an optical system selected from the group consisting of an apatite structure crystal, a semiconductor material, and an optical fiber.
64. The device of claim 48 wherein the nonlinear crystal is LBO.
65. The device of claim 48 wherein the three wave interaction comprises second harmonic generation.
66. The device of claim 48 wherein the three wave interaction comprises third harmonic generation.
67. The device of claim 48 wherein the three wave interation is selected from the group consisting of fourth harmonic generation, fifth harmonic generation, optical parametric oscillation, optical parametric generation, optical parametric amplification sum frequency generation, and difference frequency generation.
68. The device of claim 48 wherein at least one of the waves is used for memory repair.
69. The device of claim 48 wherein at least one of the waves is used for via hole drilling.
70. The device of claim 48 wherein at least one of the waves is used for scribing.
71. The device of claim 48 wherein at least one of the waves is used for marking.
72. The device of claim 48 wherein at least one of the waves is used for ablation.