IP Library Patent Application 11347238
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App. No. 11/347,238 · Confirmation No. 4934

Composition for forming low-dielectric constant film comprising fullerene, low-dielectric constant film formed from the composition and method for forming the low-dielectric constant film

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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2008-11-17 ABN Abandonment 2 View
2008-02-14 CTNF Non-Final Rejection 9 View
2008-02-14 892 List of references cited by examiner 1 View
2008-02-14 SRNT Examiner's search strategy and results 4 View
2008-02-14 1449 List of References cited by applicant and considered by examiner 2 View
2008-02-14 BIB Bibliographic Data Sheet 1 View
2008-02-14 SRFW Search information including classification, databases and other search related notes 1 View
2008-02-14 FWCLM Index of Claims 1 View
2006-04-03 PEFR Applicant Response to Pre-Exam Formalities Notice 4 View
2006-04-03 OATH Oath or Declaration filed 2 View
2006-04-03 FRPR Certified Copy of Foreign Priority Application 45 View
2006-03-21 PEFN Pre-Exam Formalities Notice 2 View
2006-02-06 TRNA Transmittal of New Application 3 View
2006-02-06 SPEC Specification 20 View
2006-02-06 CLM Claims 6 View
2006-02-06 ABST Abstract 1 View
2006-02-06 WFEE Fee Worksheet (SB06) 1 View
2006-02-06 WFEE Fee Worksheet (SB06) 1 View
2006-02-06 136A Authorization for Extension of Time all replies 1 View
2006-02-06 ADS Application Data Sheet 5 View
2006-02-06 IDS Information Disclosure Statement (IDS) Form (SB08) 2 View
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Quick Facts
App. No.
11/347,238
Filed
2006-02-06
Pub. No.
US20060175685A1
Art Unit
1796