IP Library Patent Application 11349566
Patent Application
App. No. 11/349,566

Method of bonding a semiconductor wafer to a support substrate

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Quick Facts
Patent No.
US None
App. No.
11/349,566
Abstract

A method of bonding a semiconductor wafer to a support substrate comprising the steps of: providing a semiconductor wafer; coating at least part of one face of the wafer with a water soluble coating layer; providing a double sided adhesive tape, at least one side of the adhesive tape comprising a thermal release adhesive; adhering the double sided adhesive tape to coating layer by means of said thermal release adhesive; adhering the reverse side of the adhesive tape to the support substrate.

Claims (24)

1 . A method of bonding a semiconductor wafer to a support substrate comprising the steps of:

providing a semiconductor wafer;

coating at least part of one face of the wafer with a water soluble coating layer;

providing a double sided adhesive tape, at least one side of the adhesive tape comprising a thermal release adhesive;

adhering the double sided adhesive tape to coating layer by means of said thermal release adhesive;

adhering the reverse side of the adhesive tape to the support substrate.

2 . A method as claimed in claim 1 , wherein the semiconductor wafer is a GaAs wafer.

3 . A method as claimed in claim 1 , wherein both sides of the tape are coated with a thermal release adhesive.

4 . A method as claimed in claim 1 , wherein one side of the tape is coated with a thermal release adhesive and the opposite side is coated with a non-thermal release adhesive.

5 . A method as claimed in claim 4 , wherein the adhesive tape is Revalpha.

6 . A method as claimed in claim 1 , wherein the coating layer is a water soluble PVA solution, preferably Emulsitone.

7 . A method as claimed in claim 1 , wherein the support substrate is sapphire.

8 . A method of de-bonding a semiconductor wafer and support structure as bonded by the method of claim 1 , comprising the steps of:

heating the wafer to separate the wafer coating layer from the adhesive tape;

rinsing the wafer to remove the water soluble coating layer.

9 . A method as claimed in claim 8 , wherein the wafer is mounted to a film frame after release from the substrate.

10 . A bonded structure comprising:

a semiconductor wafer;

a wafer soluble coating layer on one side of the wafer;

a double sided adhesive tape, at least one side of which comprises a thermal release adhesive, the adhesive tape being adhered to the coating layer by means of the thermal release adhesive; and

a substrate adhered to the opposite side of the adhesive layer.

11 . A bonded structure as claimed in claim 10 , wherein the wafer is GaAs.

12 . A bonded structure as claimed in claim 10 , wherein the coating layer is PVA, preferably Emulsitone.

13 . A bonded structure as claimed in claim 10 , wherein the adhesive tape is Revalpha.

Assignments (3)
CHANGE OF NAME Recorded Apr 16, 2009
From: FILTRONIC COMPOUND SEMICONDUCTORS LIMITED
To: RFMD (UK) LIMITED
Reel/Frame 022552/0462 →
CORRECTED COVER SHEET TO CORRECT ASSIGNEE'S NAME, PREVIOUSLY RECORDED AT REEL/FRAME 017836/0526 (ASSIGNMENT OF ASSIGNOR'S INTEREST) Recorded Jul 18, 2006
From: CULLEN, JOHN MELVYN; COMBE, SUZANNE
To: FILTRONIC COMPOUND SEMICONDUCTORS LIMITED
Reel/Frame 018114/0575 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 2, 2006
From: CULLEN, JOHN MELVYN; COMBE, SUZANNE
To: FILTRONIC COMPOUND SEMICONDUCTOR LIMITED
Reel/Frame 017836/0526 →