Dual-gate, sonos, non-volatile memory cells and arrays thereof

1. A memory cell comprising:

a semiconductor substrate having a source region and a drain region separated by a channel region;

a charge-trapping structure disposed above the channel region of the semiconductor substrate;

a first gate disposed above the charge-trapping structure and proximate to the source region; and

a second gate disposed above the charge-trapping structure and proximate to the drain region;

a dielectric material disposed under the first gate and the second gate and over the source region or the drain region, directly contacts the charge-trapping structure;

wherein the first gate and the second gate are separated by a first nanospace and the charge-trapping structure includes a first charge storage region under the first gate and a second charge storage region under the second gate.

2. The memory cell according to claim 1 , wherein the charge-trapping structure comprises two discrete charge-trapping regions separated by a second nanospace, wherein one charge-trapping region is proximate to the source region and the other charge-trapping region is proximate to the drain region.

3. The memory cell according to claim 2 , wherein the first nanospace and the second nanospace are substantially equal in width and the first nanospace is horizontally aligned above the second nanospace.

4. The memory cell according to claim 1 , wherein the first gate and the second gate each comprise a layer of polycrystalline silicon disposed above the charge-trapping structure and a metal-containing layer disposed above the polycrystalline silicon layer.

5. The memory cell according to claim 4 , wherein the charge-trapping structure comprises two discrete charge-trapping regions separated by a second nanospace, wherein one charge-trapping region is proximate to the source region and the other charge-trapping region is proximate to the drain region.

6. The memory cell according to claim 1 , wherein the charge-trapping structure comprises a multi-layer structure selected from the group consisting of an ONO tri-layer, an oxide/nitride bi-layer, a nitride/oxide bi-layer, an ONONO multilayer, an oxide/tantalum oxide bi-layer, an oxide/tantalum oxide/oxide tri-layer, an oxide/strontium titanate bi-layer, an oxide/barium strontium titanate bi-layer, an oxide/strontium titanate/oxide tri-layer, an oxide/strontium titanate/barium strontium titanate tri-layer, and an oxide/hafnium oxide/oxide tri-layer.

7. The memory cell according to claim 6 , wherein the charge-trapping structure comprises two discrete charge-trapping regions separated by a second nanospace, wherein one charge-trapping region is proximate to the source region and the other charge-trapping region is proximate to the drain region.

8. The memory cell according to claim 1 , wherein the charge-trapping structure comprises an ONO tri-layer.

9. The memory cell according to claim 8 , wherein the charge-trapping structure comprises two discrete charge-trapping regions separated by a second nanospace, wherein one charge-trapping region is proximate to the source region and the other charge-trapping region is proximate to the drain region.

10. The memory cell according to claim 1 , wherein the dielectric material comprises a high density plasma oxide.

11. The memory cell according to claim 1 , wherein the dielectric material does not extend out of the source region or the drain region.

12. The memory cell according to claim 1 , wherein the top surface of the dielectric material is higher than a top surface of the charge-trapping structure.

13. A memory array comprising a plurality of memory cells according to claim 1 .