IP Library Granted Patent US 7,422,842
Granted Patent B2
US 7,422,842 · App. 11/391,486 · Granted Sep 9, 2008

Reduced loss high efficiency diffractive and associated methods

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Quick Facts
Patent No.
US 7,422,842
App. No.
11/391,486
Granted
Sep 9, 2008
Kind
B2
Abstract

A sub-wavelength anti-reflective diffractive structure is incorporated with a base diffractive structure having a small period to form a high efficiency diffractive structure. In the high efficiency diffractive structure, the anti-reflective structure and/or the base diffractive structure are altered from their ideal solo structure to provide both the desired performance and minimize reflections.

Claims (36)

1. A method for creating a diffractive structure, comprising:

designing a base diffractive structure providing a desired function at a design wavelength;

designing an anti-reflective diffractive structure having a period that is smaller than the design wavelength, wherein a depth of the anti-reflective structure is on an order of a depth of the base diffractive structure;

adding designs for the base diffractive structure and the anti-reflective diffractive structure to form a combined design;

optimizing the combined design for acceptable performance of the desired function and minimized reflection, the optimizing including altering at least one of a depth of the base diffractive structure, a depth of the anti-reflective diffractive structure, and a period of the anti-reflective diffractive structure, to determine an optimized design, the optimized design deviating from the combined design; and

creating the optimized design on a surface.

2. The method as claimed in claim 1 , wherein creating the structure includes:

using at least one mask created in accordance with the optimized design; and

patterning a resist from the at least one mask using a lithographic technique in accordance with the optimized design.

3. The method as claimed in claim 2 , wherein using at least one mask includes creating at least two masks, one of the at least two masks having information for only the base structure and another of the at least two masks having information for only the anti-reflective structure.

4. The method as claimed in claim 2 , wherein the at least one mask has information for both the base structure and the anti-reflective structure.

5. The method as claimed in claim 1 , wherein the base diffractive structure includes a one-dimensional array of steps.

6. The method as claimed in claim 5 , wherein the features of the anti-reflective diffractive structure form a one dimensional array parallel to the one dimensional array of steps.

7. The method as claimed in claim 5 , wherein the features of the anti-reflective diffractive structure form a one dimensional array orthogonal to the one dimensional array of steps.

8. The method as claimed in claim 1 , wherein the features of the anti-reflective diffractive structure form a two dimensional array.

9. The method as claimed in claim 1 , wherein creating the optimized design on the surface includes creating the base diffractive structure and the anti-reflective structure simultaneously.

10. The method as claimed in claim 1 , wherein creating the optimized design on the surface includes creating the anti-reflective structure before the base diffractive structure.

11. The method as claimed in claim 1 , wherein the base diffractive structure is a splitter.

12. The method as claimed in claim 1 , wherein features of the base diffractive structure and features of the anti-reflective diffractive structure are orthogonal to one another in an elongated dimension.

13. The method as claimed in claim 1 , wherein creating the optimized design includes etching the anti-reflective diffractive structure into the surface.

14. The method as claimed in claim 1 , wherein creating the optimized design includes etching the base diffractive structure and the anti-reflective diffractive structure into the surface.

15. The method as claimed in claim 1 , wherein creating the optimized design includes etching at least one of the base diffractive structure and the anti-reflective diffractive structure into the surface.

16. The method as claimed in claim 1 , wherein the surface having the optimized design is at least one of more efficient and less reflective than a surface having the combined design.

17. A method for creating a diffractive structure, comprising:

designing a base diffractive structure providing a desired function at a design wavelength;

designing an anti-reflective diffractive structure having a period that is smaller than the design wavelength, wherein a depth of the anti-reflective structure is on an order of a depth of the base diffractive structure;

creating an integrated diffractive structure by deviating at least one of the base diffractive structure and the anti-reflective structure from an optimal design for that structure alone; and

creating the integrated diffractive structure on a surface.

18. The method as claimed in claim 17 , wherein the base diffractive structure includes a one-dimensional array of steps.

19. The method as claimed in claim 18 , wherein the features of the anti-reflective diffractive structure form a one dimensional array parallel to the one dimensional array of steps.

20. The method as claimed in claim 17 , wherein the features of the anti-reflective diffractive structure form a two dimensional array.

21. The method as claimed in claim 17 , wherein creating the integrated diffractive structure on the surface includes creating the base diffractive structure and the anti-reflective structure simultaneously.

22. The method as claimed in claim 17 , wherein creating the integrated diffractive structure on the surface includes creating the anti-reflective structure before the base diffractive structure.

23. The method as claimed in claim 17 , wherein features of the base diffractive structure and features of the anti-reflective diffractive structure are orthogonal to one another in an elongated dimension.

24. The method as claimed in claim 17 , wherein creating the integrated diffractive structure includes etching at least one of the base diffractive structure and the anti-reflective diffractive structure into the surface.

25. The method as claimed in claim 17 , wherein the surface having the integrated diffractive structure is at least one of more efficient and less reflective than a surface having an added structure of the base diffractive structure and the anti-reflective structure.

Assignments (11)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 14, 2020
From: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
To: BROADCOM INTERNATIONAL PTE. LTD.
Reel/Frame 053771/0901 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ERROR IN RECORDING THE MERGER PREVIOUSLY RECORDED AT REEL: 047357 FRAME: 0302. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Mar 22, 2019
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 048674/0834 →
CORRECTIVE ASSIGNMENT TO CORRECT THE EFFECTIVE DATE OF MERGER PREVIOUSLY RECORDED ON REEL 047195 FRAME 0658. ASSIGNOR(S) HEREBY CONFIRMS THE THE EFFECTIVE DATE IS 09/05/2018. Recorded Oct 29, 2018
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 047357/0302 →
MERGER Recorded Oct 4, 2018
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 047195/0658 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS Recorded Feb 3, 2017
From: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 041710/0001 →
PATENT SECURITY AGREEMENT Recorded Feb 11, 2016
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Reel/Frame 037808/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE PATENT NO. 7817833 PREVIOUSLY RECORDED AT REEL: 027768 FRAME: 0541. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Oct 1, 2015
From: TESSERA NORTH AMERICA, INC.
To: DIGITALOPTICS CORPORATION EAST
Reel/Frame 036733/0896 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 16, 2015
From: FLIR SYSTEMS TRADING BELGIUM BVBA
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 036126/0092 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 5, 2014
From: DIGITALOPTICS CORPORATION EAST
To: FLIR SYSTEMS TRADING BELGIUM BVBA
Reel/Frame 032827/0362 →
CHANGE OF NAME Recorded Feb 27, 2012
From: TESSERA NORTH AMERICA, INC.
To: DIGITALOPTICS CORPORATION EAST
Reel/Frame 027768/0541 →
CHANGE OF NAME Recorded Jul 15, 2010
From: DIGITAL OPTICS CORPORATION
To: TESSERA NORTH AMERICA, INC.
Reel/Frame 024697/0727 →