Method of measurement accuracy improvement by control of pattern shrinkage
View Patent ↗A scanning method for a scanning electron microscope is provided which minimizes a degradation in dimension measuring accuracy caused by a shrink of a specimen. A time between the first and the second scan over the same location on the specimen is shortened by changing the scanning order of scan lines to enable the scanning to be performed successively while the shrink is small.
1. A specimen dimension measurement method comprising steps of scanning electron beam to a scanning region on the specimen, accumulating signals obtained by a plurality of scan to said scanning region, and measuring dimension of a pattern formed in said scanning region in accordance with said accumulated signal, wherein
carrying out said plurality of scanning at one scanning position of said scanning region;
then carrying out said plurality of scanning at another different scanning position other than said scanning position;
carrying out scanning to said scanning region by repeating said plurality of scanning to said another different scanning position, and
measuring dimension of said pattern in accordance with accumulated result obtained by said plurality of scanning to said scanning region.
2. A method according to claim 1 , wherein while carrying outs aid plurality of scanning in said each of scanning position, a time interval for scanning said plurality of scanning is set short compared to time interval of scanning at said each of scanning position when carrying out interlace scanning to said scanning region.
3. An electron microscope according to claim 1 , wherein said scanning deflector, while carrying a plurality of scanning at said each scanning position, a time interval for scanning among said plurality of each scanning position is set shorter compare to scanning time period at said each scanning position for carrying out interlace scanning at said scanning region.
4. A scanning electron microscope comprising, an electron beam source, a scanning deflector for scanning the electron beam emitted from said electron beam source, and measuring pattern dimension of a pattern formed on said specimen in accordance with accumulated result of signal emitted from said specimen by a plurality of scanning of said electron beam, wherein;
said scanning deflector carries out said plurality of scanning to a single scanning position of said scanning region on the specimen; then carrying out said plurality of scanning to another different scanning position other than said scanning position and carrying out scanning to said scanning region by repeating the plurality of scanning to said different scanning position.
5. An image displaying method comprising steps of scanning electron beams for each plurality of frames to a specimen, and displaying image of said scanning region at an predetermined region on said display apparatus in accordance with said scanning, wherein;
scanning said electron beam by narrowing scanning region in a perpendicular direction to said electron bean scanning line compared to displaying image in a predetermined region on said display apparatus, and measuring pattern dimension of which dimension is decreased by scanning of said electron beam in accordance with said scanning of said electron beam.